Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Download or read book Nanoliquid Processes for Electronic Devices written by Tatsuya Shimoda and published by Springer. This book was released on 2019-02-05 with total page 594 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book summarizes the results of the research on how to make small electronic devices with high properties by using simple liquid processes such as coating, self-assembling and printing, especially focusing on devices composed of silicon and oxide materials. It describes syntheses and analyses of solution materials, formations of solid thin films from solutions, newly developed patterning methods to make devices, and characterization of the developed devices. In the first part of the book, the research on liquid silicon (Si) materials is described. Because the use of a liquid material is a quite new idea for Si devices, this book is the first one to describe liquid Si materials for electronic devices. Si devices as typified by MOS-FET have been produced by using solid and gas materials. This volume precisely describes a series of processes from material synthesis to device fabrication for those who are interested and are/will be engaged in liquid Si-related work. In the latter part of the book, a general method of how to make good oxide films from solutions and a new imprinting method to make nanosized patterns are introduced. For making oxide films with high quality, the designing of the solution is crucial. If a solution is designed properly, a gel material called "cluster gel" can be formed which is able to be imprinted to form nanosized patterns. The anticipated readers of this book are researchers, engineers, and students who are interested in solution and printing processes for making devices. More generally, this book will also provide guidelines for corporate managers and executives who are responsible for making strategies for future manufacturing processes.

Download or read book Copper Interconnect Technology written by Tapan Gupta and published by Springer Science & Business Media. This book was released on 2010-01-22 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transistors as well. During the last decade, however, the parasitic resistance, capacitance, and inductance associated with interconnections began to influence circuit performance and will be the primary factors in the evolution of nanoscale ULSI technology. Because metallic conductivity and resistance to electromigration of bulk copper (Cu) are better than aluminum, use of copper and low-k materials is now prevalent in the international microelectronics industry. As the feature size of the Cu-lines forming interconnects is scaled, resistivity of the lines increases. At the same time electromigration and stress-induced voids due to increased current density become significant reliability issues. Although copper/low-k technology has become fairly mature, there is no single book available on the promise and challenges of these next-generation technologies. In this book, a leader in the field describes advanced laser systems with lower radiation wavelengths, photolithography materials, and mathematical modeling approaches to address the challenges of Cu-interconnect technology.

Download or read book Defects in HIgh k Gate Dielectric Stacks written by Evgeni Gusev and published by Springer Science & Business Media. This book was released on 2006-02-15 with total page 495 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of this NATO Advanced Research Workshop (ARW) entitled “Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices”, which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. The special feature of this workshop was focus on an important issue of defects in this novel class of materials. One of the key obstacles to high-k integration into Si nano-technology are the electronic defects in high-k materials. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. However, very little is known about the nature of the defects or about possible techniques to eliminate, or at least minimize them. Given the absence of a feasible alternative in the near future, well-focused scientific research and aggressive development programs on high-k gate dielectrics and related devices must continue for semiconductor electronics to remain a competitive income producing force in the global market.

Download or read book Thermionic Electron Sources written by George A. Haas and published by . This book was released on 1961 with total page 38 pages. Available in PDF, EPUB and Kindle. Book excerpt: A survey of the emission characteristics of modern thermionic electron sources is presented. In addition to a discussion of recent advances among the more commonly used emitters such as oxide cathodes, thoriated cathodes, and metal c thodes, a tabulation of the thermionic properties of over one hundred various new matrix and refractory-coated cathodes is given. (Author).

Download or read book Germanium Based Technologies written by Cor Claeys and published by Elsevier. This book was released on 2011-07-28 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt: Germanium is a semiconductor material that formed the basis for the development of transistor technology. Although the breakthrough of planar technology and integrated circuits put silicon in the foreground, in recent years there has been a renewed interest in germanium, which has been triggered by its strong potential for deep submicron (sub 45 nm) technologies. Germanium-Based technologies: From Materials to Devices is the first book to provide a broad, in-depth coverage of the field, including recent advances in Ge-technology and the fundamentals in material science, device physics and semiconductor processing. The contributing authors are international experts with a world-wide recognition and involved in the leading research in the field. The book also covers applications and the use of Ge for optoelectronics, detectors and solar cells. An ideal reference work for students and scientists working in the field of physics of semiconductor devices and materials, as well as for engineers in research centres and industry. Both the newcomer and the expert should benefit from this unique book. - State-of-the-art information available for the first time as an all-in-source - Extensive reference list making it an indispensable reference book - Broad coverage from fundamental aspects up to industrial applications

Download or read book Handbook Of Solid State Batteries Second Edition written by Nancy J Dudney and published by World Scientific. This book was released on 2015-07-09 with total page 835 pages. Available in PDF, EPUB and Kindle. Book excerpt: Solid-state batteries hold the promise of providing energy storage with high volumetric and gravimetric energy densities at high power densities, yet with far less safety issues relative to those associated with conventional liquid or gel-based lithium-ion batteries. Solid-state batteries are envisioned to be useful for a broad spectrum of energy storage applications, including powering automobiles and portable electronic devices, as well as stationary storage and load-leveling of renewably generated energy. This comprehensive handbook covers a wide range of topics related to solid-state batteries, including advanced enabling characterization techniques, fundamentals of solid-state systems, novel solid electrolyte systems, interfaces, cell-level studies, and three-dimensional architectures. It is directed at physicists, chemists, materials scientists, electrochemists, electrical engineers, battery technologists, and evaluators of present and future generations of power sources. This handbook serves as a reference text providing state-of-the-art reviews on solid-state battery technologies, as well as providing insights into likely future developments in the field. It is extensively annotated with comprehensive references useful to the student and practitioners in the field.

Download or read book Nanomaterials for Sustainable Energy written by Quan Li and published by Springer. This book was released on 2016-05-12 with total page 602 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the unique mechanical, electrical, and optical properties of nanomaterials, which play an important role in the recent advances of energy-related applications. Different nanomaterials have been employed in energy saving, generation, harvest, conversion, storage, and transport processes very effectively and efficiently. Recent progress in the preparation, characterization and usage of 1D, 2D nanomaterials and hybrid architectures for energy-related applications and relevant technologies and devices, such as solar cells, thermoelectronics, piezoelectronics, solar water splitting, hydrogen production/storage, fuel cells, batteries, and supercapacitors is covered. Moreover, the book also highlights novel approaches in nanomaterials design and synthesis and evaluating materials sustainability issues. Contributions from active and leading experts regarding important aspects like the synthesis, assembly, and properties of nanomaterials for energy-related applications are compiled into a reference book. As evident from the diverse topics, the book will be very valuable to researchers working in the intersection of physics, chemistry, biology, materials science and engineering. It may set the standard and stimulates future developments in this rapidly emerging fertile frontier of nanomaterials for energy.

Download or read book Metal Oxide Nanocomposites written by B. Raneesh and published by John Wiley & Sons. This book was released on 2021-02-17 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal Oxide Nanocomposites: Synthesis and Applications summarizes many of the recent research accomplishments in the area of metal oxide-based nanocomposites. This book focussing on the following topics: Nanocomposites preparation and characterization of metal oxide nanocomposites; synthesis of core/shell metal oxide nanocomposites; multilayer thin films; sequential assembly of nanocomposite materials; semiconducting polymer metal oxide nanocomposites; graphene-based metal and metal oxide nanocomposites; carbon nanotube–metal–oxide nanocomposites; silicon mixed oxide nanocomposites; gas semiconducting sensors based on metal oxide nanocomposites; metal ]organic framework nanocomposite for hydrogen production and nanocomposites application towards photovoltaic and photocatalytic.

Download or read book Sensors and Microsystems written by Piero Malcovati and published by Springer Science & Business Media. This book was released on 2010-03-14 with total page 435 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sensors and Microsystems contains a selection of papers presented at the 14th Italian conference on sensors and microsystems. It provides a unique perspective on the research and development of sensors, microsystems and related technologies in Italy. The scientific values of the papers also offers an invaluable source to analyists intending to survey the Italian situation about sensors and microsystems. In an interdisciplinary approachm many aspects of the disciplines are covered, ranging from materials science, chemistry, applied physics, electronic engineering and biotechnologies. Further details of the conference and its full program at the website http://www.microelectronicsevents.com/AISEM

Download or read book Silicon Non Volatile Memories written by Barbara de Salvo and published by John Wiley & Sons. This book was released on 2013-05-10 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor flash memory is an indispensable component of modern electronic systems which has gained a strategic position in recent decades due to the progressive shift from computing to consumer (and particularly mobile) products as revenue drivers for Integrated Circuits (IC) companies. This book provides a comprehensive overview of the different technological approaches currently being studied to fulfill future memory requirements. Two main research paths are identified and discussed. Different "evolutionary paths" based on the use of new materials (such as silicon nanocrystals for storage nodes and high-k insulators for active dielectrics) and of new transistor structures (such as multi-gate devices) are investigated in order to extend classical floating gate technology to the 32 nm node. "Disruptive paths" based on new storage mechanisms or new technologies (such as phase-change devices, polymer or molecular cross-bar memories) are also covered in order to address 22 nm and smaller IC generations. Finally, the main factors at the origin of these phenomena are identified and analyzed, providing pointers on future research activities and developments in this area.

Download or read book High k Gate Dielectrics for CMOS Technology written by Gang He and published by John Wiley & Sons. This book was released on 2012-08-10 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt: A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Download or read book Plasma Processing of Nanomaterials written by R. Mohan Sankaran and published by CRC Press. This book was released on 2017-12-19 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

Download or read book High k Gate Dielectric Materials written by Niladri Pratap Maity and published by CRC Press. This book was released on 2020-12-18 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

Download or read book Thin Film Processes II written by Werner Kern and published by Elsevier. This book was released on 2012-12-02 with total page 881 pages. Available in PDF, EPUB and Kindle. Book excerpt: This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. - Provides an all-new sequel to the 1978 classic, Thin Film Processes - Introduces new topics, and several key topics presented in the original volume are updated - Emphasizes practical applications of major thin film deposition and etching processes - Helps readers find the appropriate technology for a particular application

Download or read book Fluid Dynamics and Transport of Droplets and Sprays written by W. A. Sirignano and published by Cambridge University Press. This book was released on 2010-01-11 with total page 481 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book discusses the theoretical foundations of spray and droplet applications relevant to the technology for active control of sprays applied to new products and applications, improved product performance, cost reductions, and improved environmental outcomes. It also covers theory related to power and propulsion; materials processing and manufacturing technologies including droplet-based net form processing, coating, and painting; medication; pesticides and insecticides; and other consumer uses.