Download or read book Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition written by Kyle William Johnson and published by . This book was released on 2011 with total page 189 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atmospheric Pressure Plasma enhanced Chemical Vapor Deposition of Functional Coatings on Metals written by Angela Marie Ladwig and published by . This book was released on 2008 with total page 114 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atmospheric pressure Plasma enhanced Chemical Vapor Deposition of A SiCN written by and published by . This book was released on 2012 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atmospheric pressure plasma enhanced chemical vapor deposition (AP-PECVD) using Surfx AtomflowTM 250D APPJ was utilized to synthesize amorphous silicon carbonitride coatings using tetramethyldisilizane (TMDZ) and hexamethyldisilizane (HMDZ) as the single source precursors. The effect of precursor chemistry and the substrate temperature (Ts) on the properties of a-SiCN:H films were evaluated, while nitrogen was used as the reactive gas. Surface morphology of the films was evaluated using atomic force microscopy (AFM); chemical properties were determined using Fourier transform infrared spectroscopy (FTIR); thickness and optical properties were determined using spectroscopic ellipsometry and mechanical properties were determined using nano-indentation. In general films deposited at substrate temperature (Ts) 200 °C contained organic moieties, while the films deposited at Ts200 oC depicted strong Si-N and Si-CN absorption. Refractive indices (n) of the thin films showed values between 1.5 -2.0 depending on the deposition parameters. Mechanical properties of the films determined using nano-indentation revealed that these films have hardness between 0.5 GPa to 15 GPa depending on the Ts. AFM evaluation of the films showed high roughness (Ra) values of 2-3 nm for the films grown at low Ts (

Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Download or read book Atmospheric Pressure Plasma written by Anton Nikiforov and published by BoD – Books on Demand. This book was released on 2019-04-24 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.

Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1999-09-01 with total page 507 pages. Available in PDF, EPUB and Kindle. Book excerpt: Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Download or read book Chemical Vapor Deposition for Nanotechnology written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2019-01-10 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

Download or read book The Foundations of Vacuum Coating Technology written by Donald M. Mattox and published by William Andrew. This book was released on 2018-08-21 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating

Download or read book Studies of Atmospheric Pressure Plasma Enhanced CVD of Silicon Oxide Films written by Neil McSporran and published by . This book was released on 2004 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atmospheric Pressure Glow Discharge Plasma Enhanced Chemical Vapour Deposition of Titania and Aluminium Based Thin Films written by John L. Hodgkinson and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Principles of Chemical Vapor Deposition written by Daniel Dobkin and published by Springer Science & Business Media. This book was released on 2003-04-30 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Download or read book Advances in Chemical Vapor Deposition written by Dimitra Vernardou and published by MDPI. This book was released on 2021-01-15 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.

Download or read book CVD Polymers written by Karen K. Gleason and published by John Wiley & Sons. This book was released on 2015-04-01 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers.

Download or read book Infrared and Raman Characteristic Group Frequencies written by George Socrates and published by John Wiley & Sons. This book was released on 2004-06-18 with total page 386 pages. Available in PDF, EPUB and Kindle. Book excerpt: Auf dieses Nachschlagewerk wird niemand verzichten wollen, der routinemäßig IR-Spektroskopie betreibt! In die 3. Auflage wurden Moleküle und Verbindungen aufgenommen, deren Daten erst seit kurzem verfügbar sind. Erstmals finden Sie auch Raman-Daten. Erweitert wurden vor allem die Kapitel zu Makromolekülen (Polymeren und Biomolekülen), zu anorganischen Verbindungen und zum NIR. Alle Diagramme wurden neu gezeichnet. (11/00)

Download or read book Atmospheric Pressure Plasma for Surface Modification written by Rory A. Wolf and published by John Wiley & Sons. This book was released on 2012-11-08 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Book's focus and intent is to impart an understanding of the practical application of atmospheric plasma for the advancement of a wide range of current and emerging technologies. The primary key feature of this book is the introduction of over thirteen years of practical experimental evidence of successful surface modifications by atmospheric plasma methods. It offers a handbook-based approach for leveraging and optimizing atmospheric plasma technologies which are currently in commercial use. It also offers a complete treatment of both basic plasma physics and industrial plasma processing with the intention of becoming a primary reference for students and professionals. The reader will learn the mechanisms which control and operate atmospheric plasma technologies and how these technologies can be leveraged to develop in-line continuous processing of a wide variety of substrates. Readers will gain an understanding of specific surface modification effects by atmospheric plasmas, and how to best characterize those modifications to optimize surface cleaning and functionalization for adhesion promotion. The book also features a series of chapters written to address practical surface modification effects of atmospheric plasmas within specific application markets, and a commercially-focused assessment of those effects.

Download or read book Experimental Investigation of Atmospheric Pressure Nonequilibrium Plasma Chemistry for Plasma Assisted Chemical Vapor Deposition PACVD of Diamond Thin Films written by Scott Keith Baldwin and published by . This book was released on 1996 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Carbon Nanowalls written by Mineo Hiramatsu and published by Springer Science & Business Media. This book was released on 2010-07-23 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: Representing the first text to cover this exciting new area of research, this book will describe synthesis techniques of CNWs, their characterization and various expected applications using CNWs. Carbon-nanowalls (CNWs) can be described as two-dimensional graphite nanostructures with edges comprised of stacks of plane graphene sheets standing almost vertically on the substrate. These sheets form a wall structure with a high aspect ratio. The thickness of CNWs ranges from a few nm to a few tens of nm. The large surface area and sharp edges of CNWs may prove useful for a number of applications such as electrochemical devices, field electron emitters, storage materials for hydrogen gas, catalyst support. In particular, vertically standing CNWs with a high surface-to-volume ratio, serve as an ideal material for catalyst support for fuel cells and in gas storage materials.