Download or read book A Study of the Microstructure and Growth of Ultra thin Film Amorphous Hydrogenated Carbon a C H Prepared by Plasma Enhanced Chemical Vapour Deposition PECVD written by Robert William Lamberton and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Structural and Optical Properties of Hydrogenated Amorphous Carbon a C H Thin Films Deposited Using a Direct Current plasma Enhanced Chemical Vapour Deposition DC PECVD Technique written by Suriani Abu Bakar and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Jarvis Conklin Mortgage Trust Compamy Kansas City Mo written by and published by . This book was released on with total page 18 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Study of Optical Properties Hydrogenated Amorphous Carbon a C H Thin Film Prepared by DC PECVD written by ld Nurulnisa Rosli and published by . This book was released on 2010 with total page 50 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Properties and Characterization of Amorphous Carbon Films written by J.J. Pouch and published by Trans Tech Publications Ltd. This book was released on 1991-01-01 with total page 714 pages. Available in PDF, EPUB and Kindle. Book excerpt: Amorphous, hydrogenated carbon (AHC) films can be deposited on various substrates using several techniques, e.g. plasma deposition and ion beam deposition. The resulting films can be hard, wear resistant and transparent.
Download or read book Tetrahedrally Bonded Amorphous Carbon Films I written by Bernd Schultrich and published by Springer. This book was released on 2018-03-10 with total page 769 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the status quo of the structure, preparation, properties and applications of tetrahedrally bonded amorphous carbon (ta-C) films and compares them with related film systems. Tetrahedrally bonded amorphous carbon films (ta-C) combine some of the outstanding properties of diamond with the versatility of amorphous materials. The book compares experimental results with the predictions of theoretical analyses, condensing them to practicable rules. It is strictly application oriented, emphasizing the exceptional potential of ta-C for tribological coatings of tools and components.
Download or read book Synthesis Characterization and Molecular Dynamics Analysis of Ultrathin Amorphous Carbon Films written by Na Wang and published by . This book was released on 2013 with total page 133 pages. Available in PDF, EPUB and Kindle. Book excerpt: Increasing demands for high magnetic storage capacity have led to the increase of the recording area density by more than 100,000 times over the past 30 years. Among all the approaches considered to increase the area density, reducing the magnetic spacing is an effective solution that directly impacts the thickness and quality of the carbon overcoat. One of the methods of carbon overcoat deposition is chemical vapor deposition, which uses carbon-containing precursor gases as the source of carbon radicals and atoms to form the carbon overcoat. The produced carbon film is characterized by high hydrogen content (20%-50%), depending on the carbon-to-hydrogen ratio of the precursor gas and process parameters. Because of the hydrogen content, CVD-deposited hydrogenated amorphous carbon (a-C:H) deposited by CVD exhibit density of 1.7-2.2 g/cm3, which is much lower than the density (~3 g/cm3) of hydrogen-free amorphous carbon (a-C) films deposited by filtered cathodic vacuum arc (FCVA). The superior nanomechanical/tribological properties of FCVA-deposited a-C films have been widely-reported; however, most studies have examined relatively thick (tens of nanometers) a-C films, while current demands require much thinner films of thickness in the range of 1-4 nm. FCVA-deposited a-C films overcoats are desirable protective overcoats for HDDs provided they can maintain their demonstrated high quality even for thickness as low as 1 nm. In this dissertation, an in-depth study of the structure of FCVA-deposited a-C films deposited on silicon was carried out using high-resolution transmission electron microscopy (HRTEM) and analytical electron energy loss spectroscopy (EELS). Both low- and high (core)-loss EELS spectra of Si and C were analyzed to determine the elemental content and through-thickness structure of ~20-nm-thick a-C films. Calculations of atomic carbon hybridization based on EELS spectra were used to track the film structure evolution. The average content of carbon hybridization in the top few nanometers of the a-C film, determined from EELS analysis, was found to be ~50%, much less than 73% of the bulk film. This multilayer structure was also validated by X-ray photoelectron spectroscopy (XPS). Results indicate that the minimum thickness of a-C films deposited by the FCVA method under conditions of optimum substrate bias ( -100 V) should be equal to 3-3.5 nm, which is the total thickness of the buffer and surface layers. The effects of other important FCVA process parameters on film growth were also investigated to explore the prospect of further decreasing the a-C film thickness. The incidence angle effect of energetic C+ ions bombarding onto the growing film surface was studied in terms of the deposition rate, topography, and film structure. Cross-section TEM measurements combined with Monte Carlo (T-DYN) simulations revealed that the deposition yield (rate) is independent of the ion fluence but varies with the incidence angle according to a relationship derived from sputtering theory. XPS and atomic force microscopy (AFM) studies were also performed to examine carbon hybridization and film topography. The optimum incidence angle for FCVA deposition was found equal to 45o. A relatively new technology that shows potential for further breakthroughs in magnetic recording is heat-assisted magnetic recording (HAMR). This technology utilizes a tightly focused laser beam to heat and temporarily reduce the coercivity of magnetic nanodomains below that of the magnetic field applied by the magnetic head. Impulsive laser heating (typically
Download or read book Characterization of Amorphous Hydrogenated Carbon a C H from Plasma Assisted Chemical Vapor Deposition written by Karen Margaret Carr and published by . This book was released on 1989 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Atmospheric Pressure Plasma CVD of Amorphous Hydrogenated Silicon Carbonitride a SiCN written by and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Amorphous hydrogenated silicon carbonitride (a-SiCN:H) thin films are synthesized by atmospheric pressure plasma enhanced chemical vapor (AP-PECVD) deposition using the Surfx Atomflow{trademark} 250D APPJ source with triethylsilane (HSiEt3, TES) and nitrogen as the precursor and the reactive gases, respectively. The effect of the substrate temperature (T{sub s}) on the growth characteristics and the properties of a-SiCN:H films was evaluated. The properties of the films were investigated via scanning electron microscopy (SEM), atomic force microscopy (AFM) for surface morphological analyses, Fourier transform infrared spectroscopy (FTIR), and X-ray photoelectron spectroscopy (XPS) for chemical and compositional analyses; spectroscopic ellipsometry for optical properties and thickness determination and nanoindentation to determine the mechanical properties of the a-SiCN:H films. Films deposited at low T{sub s} depict organic like features, while the films deposited at high T{sub s} depict ceramic like features. FTIR and XPS studies reveal that an increases in T{sub s} helps in the elimination of organic moieties and incorporation of nitrogen in the film. Films deposited at T{sub s} of 425 C have an index of refraction (n) of 1.84 and hardness (H) of 14.8 GPa. A decrease in the deposition rate between T{sub s} of 25 and 250 C and increase in deposition rate between T{sub s} of 250 and 425 C indicate that the growth of a-SiCN:H films at lower T{sub s} are surface reaction controlled, while at high temperatures film growth is mass-transport controlled. Based on the experimental results, a potential route for film growth is proposed.
Download or read book Amorphous Hydrogenated Carbon Films with Diamond Like and Polymer Like Properties written by Elena A Konshina and published by . This book was released on 2016 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Results of the study of structural features and optical properties of thin films of amorphous hydrogenated carbon (a-C:H) films prepared by plasma-activated chemical vapor deposition of various hydrocarbon precursors are reviewed. The effect of different factors on the rate of a-C:H films deposition in a DC glow discharge with the magnetron plasma localized near the anode such as voltage, discharge power, gas pressure, relative content of an inert gas in the mixture with a hydrocarbon and other is analyzed. It is shown that the refractive index of a-C:H films can be changed in the interval 2.35-1.55 by increasing the deposition rate and the choice of the appropriate hydrocarbon precursor. The features of the vibration spectra of the diamond-like and polymer-like films are discussed. The correlations of the structural peculiarities and of the optical absorption edge, gap width, and conductivity as well as the absorption spectra in visible region and the ratio of the fundamental bands in Raman scattering spectra are estimated. Examples of using the optical properties of the a-C:H films are given.
Download or read book Plasma deposited Amorphous Hydrogenated Carbon Films and Their Tribological Properties written by and published by . This book was released on 1989 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films with Nanocrystalline Inclusions written by Siri Suzanne Thompson and published by . This book was released on 2003 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High Growth Rate Deposition of Hydrogenated Amorphous Silicon Germanium Films and Devices Using ECR PECVD written by and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Hydrogenated amorphous silicon germanium films (a-SiGe:H) and devices have been extensively studied because of the tunable band gap for matching the solar spectrum and mature the fabrication techniques. a-SiGe:H thin film solar cells have great potential for commercial manufacture because of very low cost and adaptability to large-scale manufacturing. Although it has been demonstrated that a-SiGe:H thin films and devices with good quality can be produced successfully, some issues regarding growth chemistry have remained yet unexplored, such as the hydrogen and inert-gas dilution, bombardment effect, and chemical annealing, to name a few. The alloying of the SiGe introduces above an order-of-magnitude higher defect density, which degrades the performance of the a-SiGe:H thin film solar cells. This degradation becomes worse when high growth-rate deposition is required. Preferential attachment of hydrogen to silicon, clustering of Ge and Si, and columnar structure and buried dihydride radicals make the film intolerably bad. The work presented here uses the Electron-Cyclotron-Resonance Plasma-Enhanced Chemical Vapor Deposition (ECR-PECVD) technique to fabricate a-SiGe:H films and devices with high growth rates. Helium gas, together with a small amount of H[sub 2], was used as the plasma species. Thickness, optical band gap, conductivity, Urbach energy, mobility-lifetime product, I-V curve, and quantum efficiency were characterized during the process of pursuing good materials. The microstructure of the a-(Si, Ge):H material was probed by Fourier-Transform Infrared spectroscopy. They found that the advantages of using helium as the main plasma species are: (1) high growth rate--the energetic helium ions break the reactive gas more efficiently than hydrogen ions; (2) homogeneous growth--heavy helium ions impinging on the surface promote the surface mobility of the reactive radicals, so that heteroepitaxy growth as clustering of Ge and Si, columnar structure are reduced; (3) surface hydrogen removal--heavier and more energetic helium ions break the Si-H much easier than hydrogen ions. The preferential attachment of Si-H to Ge-H is reduced. They also found that with the small amount of hydrogen put into the plasma, the superior properties of a-(Si, Ge):H made from pure hydrogen dilution plasma were still maintained. These hydrogen ions help to remove the subsurface weakly bonded hydrogen and buried hydrogen. They also help to passivate the Ge-dangling bond.
Download or read book PECVD Hydrogenated Amorphous Carbon Films written by Rozidawati Awang and published by . This book was released on 2008 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Study of the Chemical Mechanical and Surface Properties of Thin Films of Hydrogenated Amorphous Carbon written by Gilroy John Vandentop and published by Ann Arbor, Mich. : University Microfilms International. This book was released on 1990 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Properties of Hydrogenated Amorphous Carbon a C H Prepared by DC PECVD written by Kai Fuu Yong (ld) and published by . This book was released on 2009 with total page 55 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Properties of Hydrogenated Amorphous Carbon a C H Thin Film Deposited by DC PECVD Method written by Mohd. Firdaus Md. Shah and published by . This book was released on 2008 with total page 65 pages. Available in PDF, EPUB and Kindle. Book excerpt:
