Download or read book Variability of Closed box Diffusion of Boron Into Silicon written by E. P. DUDLEY and published by . This book was released on 1965 with total page 2 pages. Available in PDF, EPUB and Kindle. Book excerpt: A study of the variability of the closed-box diffusion of boron into silicon has been made, using boric acid and silicic acid mixtures as boron sources. Two dilute sources (0.1 wt-pct boric acid and 10 wt-pct boric acid) have been examined in detail to determine how well junction depths, sheet resistivities, and surface concentrations could be reproduced. The experiments were designed to emphasize the contribution of the mass transfer and methods of measurement to the error, and to deemphasize the effect of source-to-source variations. In general, the 10 wt-pct source provided the more reproducible performance, allowing the placement of junctions to within =1/3 microns, control of sheet resistivities to within roughly =30 pct and control of surface concentrations to within a factor of 5 at the level of 3x10 to the 19th power atoms/cu cm. Diffusion coefficients and activation energies for the diffusion of boron in silicon calculated from the two sets of data were in acceptable agreement with the published values. (Author).

Download or read book U S Government Research and Development Reports written by and published by . This book was released on 1965 with total page 1776 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Technical Abstract Bulletin written by and published by . This book was released on with total page 684 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Government wide Index to Federal Research Development Reports written by and published by . This book was released on 1965 with total page 1794 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book U S Government Research Development Reports written by and published by . This book was released on 1965 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Diffusion of Boron in Silicon written by Colin Graham Hart and published by . This book was released on 1971 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Diffusion of Boron Into Silicon from an Oxide Source written by P. J. Gregory and published by . This book was released on 1970 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Government Reports Announcements written by and published by . This book was released on 1965 with total page 1300 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Journal of the Electrochemical Society written by and published by . This book was released on 1963 with total page 772 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Bibliography of Scientific and Industrial Reports written by and published by . This book was released on 1962 with total page 1722 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book U S Government Research Reports written by and published by . This book was released on 1962 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The effects of making oxide on the diffusion of boron into silicon written by Shuja Ahmad Abbasi and published by . This book was released on 1980 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Technology Computer Aided Design for Si SiGe and GaAs Integrated Circuits written by G.A. Armstrong and published by IET. This book was released on 2007-11-30 with total page 457 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first book to deal with a broad spectrum of process and device design, and modeling issues related to semiconductor devices, bridging the gap between device modelling and process design using TCAD. Presents a comprehensive perspective of emerging fields and covers topics ranging from materials to fabrication, devices, modelling and applications. Aimed at research-and-development engineers and scientists involved in microelectronics technology and device design via Technology CAD, and TCAD engineers and developers.

Download or read book Science and Technology of Defects in Silicon written by C.A.J. Ammerlaan and published by Elsevier. This book was released on 2014-01-01 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume reviews recent developments in the materials science of silicon. The topics discussed range from the fundamental characterization of the physical properties to the assessment of materials for device applications, and include: crystal growth; process-induced defects; topography; hydrogenation of silicon; impurities; and complexes and interactions between impurities.In view of its key position within the conference scope, several papers examine process induced defects: defects due to ion implantation, silicidation and dry etching, with emphasis being placed on the device aspects. Special attention is also paid to recent developments in characterization techniques on epitaxially grown silicon, and silicon-on-insulators.

Download or read book Boron Diffusion in Silicon written by Richard M. Chapman and published by . This book was released on 1962 with total page 26 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Government Reports Annual Index written by and published by . This book was released on 1965 with total page 834 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Bell Telephone System Technical Publications written by Bell Telephone Laboratories and published by . This book was released on 1960 with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt: