Download or read book The Deposition of Pure Boron written by and published by . This book was released on 1947 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Deposition of Pure Boron written by and published by . This book was released on 1947 with total page 20 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Deposition of Pure Boron written by Hermann Irving Schlesinger and published by . This book was released on 1947 with total page 32 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Low Temperature Pure Boron Layer Deposition for Silicon Diode and Micromachining Applications written by Xingyu Liu and published by . This book was released on 2021 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Deposition of Boron from the Hydrides of Boron and from Boron Tribromide written by Robert Lewis Brandaur and published by . This book was released on 1938 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Preparing Boron by Fused salt Electrolysis written by D. Z. Hobbs and published by . This book was released on 1961 with total page 26 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Preparation of Thin Boron Films written by R. W. Dodson and published by . This book was released on 1944 with total page 10 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Abstracts of Declassified Documents written by U.S. Atomic Energy Commission and published by . This book was released on 1947 with total page 820 pages. Available in PDF, EPUB and Kindle. Book excerpt: Consists of AECD 1-2023 (no. 1-1779 called MDDC).

Download or read book Deposition by Electron Bombardment and Weighing Under Vacuum of Thin High Purity Boron Layers written by J. van Audenhove and published by . This book was released on 1964 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Seventh International Conference on Chemical Vapor Deposition 1979 written by Thomas O. Sedgwick and published by . This book was released on 1979 with total page 696 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Boron and Boron Carbide by Vapor Deposition written by James G. Donaldson and published by . This book was released on 1968 with total page 24 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Boron Deposition from Fused Salts Final Report written by and published by . This book was released on 1980 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A partial evaluation of the feasibility of a process to electrodeposit pure coherent coatings of elemental boron from molten fluorides has been performed. The deposit produced was powdery and acicular, unless the fluoride melt was purified to have very low oxygen concentration. When the oxygen activity was reduced in the melt by addition of crystalline elemental boron, dense, amorphous boron deposit was produced. The boron deposits produced had cracks but were otherwise pure and dense and ranged up to 0.35 mm thick. Information derived during this project suggests that similar deposits might be obtained crack-free up to 1.00 mm thick by process modifications and improvements.

Download or read book Deposition of Boron Carbide Thin Films by Supersonic Plasma Jet Chemical Vapor Deposition written by Olivier Postel and published by . This book was released on 1998 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Methods Used in Preparing Boron written by Dale Z. Hobbs and published by . This book was released on 1964 with total page 24 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Progress in Boron Chemistry written by R. J. Brotherton and published by Elsevier. This book was released on 2016-10-12 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt: Progress in Boron Chemistry, Volume 2 presents the chemistry and applications of boron and its compounds. This book provides a critical treatment of six areas of boron chemistry, including polyhedral borane ions, carboranes, polymers, hydrogen, metal borides, and elemental boron. Organized into six chapters, this volume begins with an overview of the structures as well as the synthesis of polyhedral borane anions. This text then examines the various types of classes and series of the carboranes. Other chapters consider the relatively intramolecular rearrangements and intramolecular exchange reactions concerning the various closo-carboranes and nido-carboranes. This book discusses as well the formation and the historical significance of a higher boron hydride polymer. The final chapter deals with the structural utilization of boron filaments, which promises to be the first large-scale use for comparatively high purity elemental boron. This book is intended to be suitable for boron chemists, chemical engineers, scientists, and research workers.

Download or read book Chemical Vapour Deposition of sp2 Hybridised Boron Nitride written by Mikhail Chubarov and published by Linköping University Electronic Press. This book was released on 2014-12-04 with total page 54 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of this work was to develop a chemical vapour deposition process and understand the growth of sp2 hybridised Boron Nitride (sp2-BN). Thus, the growth on different substrates together with the variation of growth parameters was investigated in details and is presented in the papers included in this thesis. Deposited films of sp2-BN were characterised with the purpose to determine optimal deposition process parameters for the growth of high crystal quality thin films with further investigations of chemical composition, morphology and other properties important for the implementation of this material towards electronic, optoelectronic devices and devices based on graphene/BN heterostructures. For the growth of sp2-BN triethyl boron and ammonia were employed as B and N precursors, respectively. Pure H2 as carrier gas is found to be necessary for the growth of crystalline sp2-BN. Addition of small amount of silane to the gas mixture improves the crystalline quality of the growing sp2-BN film. It was observed that for the growth of crystalline sp2-BN on c-axis oriented ?-Al2O3 a thin and strained AlN buffer layer is needed to support epitaxial growth of sp2-BN, while it was possible to deposit rhombohedral BN (r-BN) on various polytypes of SiC without the need for a buffer layer. The growth temperature suitable for the growth of crystalline sp2-BN is 1500 °C. Nevertheless, the growth of crystalline sp2-BN was also observed on ?-Al2O3 with an AlN buffer layer at a lower temperature of 1200 °C. Growth at this low temperature was found to be hardly controllable due to the low amount of Si that is necessary at this temperature and its accumulation in the reaction cell. When SiC was used as a substrate at the growth temperature of 1200 °C, no crystalline sp2-BN was formed, according to X-ray diffraction. Crystalline structure investigations of the deposited films showed formation of twinned r-BN on both substrates used. Additionally, it was found that the growth on ?-Al2O3 with an AlN buffer layer starts with the formation of hexagonal BN (h-BN) for a thickness of around 4 nm. The formation of h-BN was observed at growth temperatures of 1200 °C and 1500 °C on ?-Al2O3 with AlN buffer layer while there were no traces of h-BN found in the films deposited on SiC substrates in the temperature range between 1200 °C and 1700 °C. As an explanation for such growth behaviour, reproduction of the substrate crystal stacking is suggested. Nucleation and growth mechanism are investigated and presented in the papers included in this thesis.

Download or read book The Preparation of High purity Boron Via the Iodide written by A. F. Armington and published by . This book was released on 1964 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this paper the present methods of boron preparation are discussed with emphasis on the iodide intermediate. Several methods of boron triiodide preparation were investigated, the most satisfactory method being the preparation from the elements. A yield of 60 pct based on iodine is found for this method. Zone-refining, sublimation, distillation, and fractionalrecrystallization results are given for the boron triiodide, with distillation producing the best results. Several methods of decomposition are also discussed. The purity of the resulting iodide boron approximates the purity of the best available bromide boron. (Author).