Download or read book Preparation and Properties of Thin Films of Aluminum Oxide and Iron Oxide on Silicon Substrates written by Carolyn Hannigan and published by . This book was released on 1991 with total page 32 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Properties of Aluminum Oxide and Aluminum Oxide Alloys and Their Interfaces with Silicon and Silicon Dioxide written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A remote plasma enhanced chemical vapor deposition method, RPECVD, was utilized to deposit thin films of aluminum oxide, tantalum oxide, tantalum aluminates, and hafnium aluminates. These films were analyzed using auger electron spectroscopy, AES, Fourier transform infrared spectroscopy, FTIR, X-ray diffraction, XRD, nuclear resonance profiling, NRP, capacitance versus voltage, C-V, and current versus voltage, J-V. FTIR indicated the alloys were homogeneous and pseudobinary in character. Combined with XRD the crystallization temperatures for films>100 nm were measured. The alloys displayed an increased temperature stability with the crystallization points being raise by>100 & deg;C above the end point values. In-situ AES analysis provided a study of the initial formation of the films' interface with the silicon substrate. For Al2O3 these results were correlated to NRP results and indicated a thin, ~0.6 nm, interfacial layer formed during deposition. C-V characteristics indicated a layer of fixed negative charge associated with Al2O3. For Ta2O5 the C-V and J-V results displayed high levels of leakage current, due to a low conduction band offset with silicon. Both aluminates were dominated by electron trapping states. These states were determined to be due to (i) a network 'break-up' component and (ii) localized atomic d-states of hafnium and tantalum atoms.

Download or read book Structural Characterization of Aluminum Oxide Thin Films Using Solid state NMR written by Yvonne Afriyie and published by . This book was released on 2018 with total page 66 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum is an ideal metal for solution-processed oxide dielectrics because it can form polymerized hydroxo networks in aqueous solution and dense amorphous oxide dielectrics by vacuum methods. Atomic layer deposition (ALD) is one of the traditional vacuum methods for thin film deposition, however, ALD is not the most economically feasible method for thin film fabrication due to high operational cost and limitations in large surface-area applications. Solution deposition is a more economical deposition method which is more cost-saving and ideal for large surface area thin film fabrication. The behavior of the solution-solid structural conversion remains an enigma; thus, this research seeks to understand the structural transformation of thin films from solution to solid in order to fabricate films with optimal properties.Aluminum oxide (AlxOy) thin films prepared from aqueous solution-deposited cluster precursors have been proposed for use in devices such as high-k dielectrics in solar cell materials. The films are fabricated with different aluminum-derived precursors, spin-coated on a substrate and annealed at a range of temperatures. The low temperature range of these films are amorphous, therefore lack long range order. Solid-state nuclear magnetic resonance (ssNMR) can be used to determine the amorphous structure of these materials. Herein, a combination of X-ray diffraction (XRD), and NMR techniques are used to elucidate the transformation of these thin films as they are annealed to high temperatures.

Download or read book Oxide Ultrathin Films written by Gianfranco Pacchioni and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt: A wealth of information in one accessible book. Written by international experts from multidisciplinary fields, this in-depth exploration of oxide ultrathin films covers all aspects of these systems, starting with preparation and characterization, and going on to geometrical and electronic structure, as well as applications in current and future systems and devices. From the Contents: Synthesis and Preparation of Oxide Ultrathin Films Characterization Tools of Oxide Ultrathin Films Ordered Oxide Nanostructures on Metal Surfaces Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit Silica and High-K Dielectrics Thin Films in Microelectronics Oxide Passive Films and Corrosion Protection Oxide Films as Catalytic Materials and as Models of Real Catalysts Oxide Films in Spintronics Oxide Ultrathin Films in Solid Oxide Fuel Cells Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials Oxide Ultrathin Films in Sensor Applications Ferroelectricity in Ultrathin Film Capacitors Titania Thin Films in Biocompatible Materials and Medical Implants Oxide Nanowires for New Chemical Sensor Devices

Download or read book Thin Film Metal Oxides written by Shriram Ramanathan and published by Springer Science & Business Media. This book was released on 2009-12-03 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.

Download or read book Chemical Solution Deposition of Functional Oxide Thin Films written by Theodor Schneller and published by Springer Science & Business Media. This book was released on 2014-01-24 with total page 801 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.

Download or read book Preparation of Thin Films written by Joy George and published by CRC Press. This book was released on 1992-02-26 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Preparation of Thin Films provides a comprehensive account of various deposition techniques for the preparation of thin films of elements, compounds, alloys, ceramics, and semiconductors - emphasizing inorganic compound thin films and discussing high vacuum and chemical deposition methods used for preparing high temperature superconducting oxide thin films. "

Download or read book Thin Films and Heterostructures for Oxide Electronics written by Satishchandra B. Ogale and published by Springer Science & Business Media. This book was released on 2005-11-21 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.

Download or read book The Preparation of Al2O3 x SiO2 y Thin Films Using Al OSiEt3 3 2 as a Single Source Precursor written by and published by . This book was released on 1992 with total page 34 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum silicates, (Al2O3)x(SiO2)y, are attractive candidates as corrosion and wear-resistant coatings for metals and other substrates, due to their superior properties of creep resistance, thermal expansion, and chemical stability. Recently, it has been proposed that amorphous alumina-silica films would find application as insulators in multilevel interconnections, and as encapsulants for active devices and thin film components, because they do not suffer the temperature instability of alumina films while retaining the desirable insulating characteristics. Thin films of aluminum silicates have been previously prepared by either sol-gel techniques or the pyrolysis of aluminum-silicon containing polymers. However, there remain some difficulties in obtaining homogeneous and continuous films. Metal-organic chemical vapor deposition (MOCVD) offers and attractive alternative to these methods, since contiguous, homogeneous thin films can be deposited at low temperatures with high growth rates.

Download or read book Structural and Morphological Properties of Zine Oxide Thin Films Grown on Silicon Substrates written by S.S. Ng and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Preparation and Characterization of Iron III Oxide Films by an Novel Spray Pyrolysis Method written by and published by . This book was released on 1990 with total page 17 pages. Available in PDF, EPUB and Kindle. Book excerpt: Alpha-Fe203 thin films were deposited on silicon substrates by nebulization of a 0.01 M solution of iron acetylacetonate in a 50% methanol/ water mixture followed by pyrolysis and annealing in flowing oxygen. The resulting films were characterized by x-ray diffraction, scanning electron microscopy, and their electrical transport behavior. The IR transmission spectrum of alpha-Fe203 recorded from such films agreed with published theoretical analysis based on the crystal structure.

Download or read book Analysis of Aluminum Oxide Films on Silicon written by Mototaka Kamoshida and published by . This book was released on 1972 with total page 56 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum oxide exhibits novel and useful properties as a passivating layer on silicon surfaces. The study was concerned with the properties of hydrolytically grown aluminum oxide films on silicon. The study covered the influence of deposition temperature, of subsequent heat treatment and of anodization. The principal tool of measurement was MeV He(+) ion backscattering technique; in addition etch rates were measured and electron diffraction patterns were taken. Aluminum oxide films deposited onto silicon substrates by hydrolysis of AlCl3 show marked differences in etch rates, electron diffraction patterns and chlorine content between films grown below 700C and above 800C. However, both film types are stoichiometric. (Author).

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Formation Characterization and Application of Sputtered Aluminum Oxide and Gamma iron Oxide Thin Films written by Ga-Lane Chen and published by . This book was released on 1987 with total page 504 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Oxide Thin Films Multilayers and Nanocomposites written by Paolo Mele and published by Springer. This book was released on 2015-03-26 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive overview of the science of nanostructured oxides. It details the fundamental techniques and methodologies involved in oxides thin film and bulk growth, characterization and device processing, as well as heterostructures. Both, experts in oxide nanostructures and experts in thin film heteroepitaxy, contribute the interactions described within this book.

Download or read book Metal Oxide Based Thin Film Structures written by Nini Pryds and published by Elsevier. This book was released on 2017-09-07 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. - Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field - Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation - Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike

Download or read book Preparation and Characterization of Acicular Particles and Thin Films of Aluminum Oxide written by Raymond M. Brusasco and published by . This book was released on 1987 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt: