Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Download or read book Focused Ion Beam Systems written by Nan Yao and published by Cambridge University Press. This book was released on 2007-09-13 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt: The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
Download or read book Nanotechnologies The Physics of Nanomaterials written by David Schmool and published by CRC Press. This book was released on 2021-07-09 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt: Provides a broad introduction to nanophysics and nanotechnologies, and the importance of low-dimensional and surface physics is discussed indepth. Chapters in Volume 1 covers the large range of physical preparation techniques available for the production of nanomaterials and nanostructuring.
Download or read book Semiconductor Lithography written by Wayne M. Moreau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 937 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.
Download or read book Technology of Si Ge and SiC Technologie Von Si Ge und SiC written by W. Dietze and published by Springer Science & Business Media. This book was released on 1983-12 with total page 680 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1991 with total page 1102 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 2001 with total page 1448 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1989 with total page 1148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Implantation Technology 92 written by D.F. Downey and published by Elsevier. This book was released on 2012-12-02 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
Download or read book Ion Optics Design for a Maskless Ion Projection Lithography System written by Vinh Van Ngo and published by . This book was released on 2000 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Cyclotrons and Their Applications written by John Christopher Cornell and published by World Scientific. This book was released on 1996 with total page 894 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Cyclotrons And Their Applications Proceedings Of The 14th International Conference written by John Christopher Cornell and published by World Scientific. This book was released on 1996-06-12 with total page 894 pages. Available in PDF, EPUB and Kindle. Book excerpt: These conference proceedings will be of interest to all accelerator scientists and engineers, as well as those concerned with the application of cyclotrons in various fields. The conference covers the latest developments in the science, technology and use of cyclotrons, and includes more than 25 invited talks by specialists in their respective fields. Contributions include papers on newly operating cyclotrons and facilities under construction, compact cyclotrons, cooler rings and post-accelerators, ion sources, beam dynamics, beam diagnostics, cyclotron components, systems and technologies, as well as medical applications — including radiotherapy and radioisotope production — non-medical applications, radioactive beam facilities and new projects and proposals.
Download or read book EPAC 92 written by H. Henke and published by Atlantica Séguier Frontières. This book was released on 1992 with total page 942 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Beyond Si Based CMOS Devices written by Sangeeta Singh and published by Springer Nature. This book was released on with total page 331 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Engineering Index Annual written by and published by . This book was released on 1992 with total page 2264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.
Download or read book Nanostructured Materials for Advanced Technological Applications written by Johann Reithmaier and published by Springer Science & Business Media. This book was released on 2009-03-08 with total page 531 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoscience and Nanotechnology are experiencing a rapid development in many aspects, like real-space atomic-scale imaging, atomic and molecular manipulation, nano-fabrication, etc. , which will have a profound impact not only in every field of research, but also on everyday life in the twenty-first century. The common efforts of researchers from different countries and fields of science can bring complementary expertise to solve the rising problems in order to take advantage of the nanoscale approaches in Materials Science. Nanostructured materials, i. e. materials made with atomic accuracy, show unique properties as a consequence of nanoscale size confinement, predominance of interfacial phenomena and quantum effects. Therefore, by reducing the dimensions of a structure to nanosize, many inconceivable properties will appear and may lead to different novel applications from na- electronics and nanophotonics to nanobiological systems and nanomedicine. All this requires the contribution of multidisciplinary teams of physicists, chemists, materials scientists, engineers and biologists to work together on the synthesis and processing of nanomaterials and nanostructures, und- standing the properties related to the nanoscale, the design of nano-devices as well as of new tools for the characterization of nano-structured materials. The first objective of the NATO ASI on Nanostructured Materials for Advanced Technological Applications was to assess the up-to-date achie- ments and future perspectives of application of novel nanostructured materials, focusing on the relationships material structure ? functional properties ? possible applications.
