Download or read book Phase shifting Point Diffraction Interferometer Focus aid Enhanced Mask written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Phase shifting Point Diffraction Interferometer Mask Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In a phase-shifting point diffraction interferometer, different image-plane mask designs can improve the operation of the interferometer. By keeping the test beam window of the mask small compared to the separation distance between the beams, the problem of energy from the reference beam leaking through the test beam window is reduced. By rotating the grating and mask 45.degree., only a single one-dimensional translation stage is required for phase-shifting. By keeping two reference pinholes in the same orientation about the test beam window, only a single grating orientation, and thus a single one-dimensional translation stage, is required. The use of a two-dimensional grating allows for a multiplicity of pinholes to be used about the pattern of diffracted orders of the grating at the mask. Orientation marks on the mask can be used to orient the device and indicate the position of the reference pinholes.
Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 2000 with total page 1392 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Phase shifting Point Diffraction Interferometer Grating Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order diffraction to the test beam window of the mask, the test and reference beam intensities can be balanced and the fringe contrast improved. Additionally, using a duty cycle of the diffraction grating other than 50%, the fringe contrast can also be improved.
Download or read book Phase shifting Point Diffraction Interferometer Phase Grating Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Diffraction phase gratings are employed in phase-shifting point diffraction interferometers to improve the interferometric fringe contrast. The diffraction phase grating diffracts a zeroth-order diffraction of light at a first power level to the test-beam window of a mask that is positioned at the image plane and a first-order diffraction at a second power to the reference-beam pinhole. The diffraction phase grating is preferably selected to yield a desired ratio of the first power level to second power level.
Download or read book Defocus Measurement Using a Liquid Crystal Point Diffraction Interferometer written by and published by . This book was released on 1994 with total page 10 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Accuracy of Phase shifting Point Diffraction Interferometry to Test EUV Lithographic Optics written by Sang Hun Lee and published by . This book was released on 1998 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Australian Official Journal of Patents written by and published by . This book was released on 2001 with total page 898 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Shop Testing written by Daniel Malacara and published by John Wiley & Sons. This book was released on 2007-07-16 with total page 882 pages. Available in PDF, EPUB and Kindle. Book excerpt: The purpose of this third edition is to bring together in a single book descriptions of all tests carried out in the optical shop that are applicable to optical components and systems. This book is intended for the specialist as well as the non-specialist engaged in optical shop testing. There is currently a great deal of research being done in optical engineering. Making this new edition very timely.
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2000 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Interferogram Analysis For Optical Testing written by Zacarias Malacara and published by CRC Press. This book was released on 2018-10-03 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this day of digitalization, you can work within the technology of optics without having to fully understand the science behind it. However, for those who wish to master the science, rather than merely be its servant, it's essential to learn the nuances, such as those involved with studying fringe patterns produced by optical testing interferometers. When Interferogram Analysis for Optical Testing originally came to print, it filled the need for an authoritative reference on this aspect of fringe analysis. That it was also exceptionally current and highly accessible made its arrival even more relevant. Of course, any book on something as cutting edge as interferogram analysis, no matter how insightful, isn't going to stay relevant forever. The second edition of Interferogram Analysis for Optical Testing is designed to meet the needs of all those involved or wanting to become involved in this area of advanced optical engineering. For those new to the science, it provides the necessary fundamentals, including basic computational methods for studying fringe patterns. For those with deeper experience, it fills in the gaps and adds the information necessary to complete and update one's education. Written by the most experienced researchers in optical testing, this text discusses classical and innovative fringe analysis, principles of Fourier theory, digital image filtering, phase detection algorithms, and aspheric wavelength testing. It also explains how to assess wavefront deformation by calculating slope and local average curvature.
Download or read book Optical Testing written by Joseph M. Geary and published by Willmann-Bell. This book was released on 2012 with total page 588 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Femtosecond Optical Frequency Comb Principle Operation and Applications written by Jun Ye and published by Springer Science & Business Media. This book was released on 2006-06-15 with total page 373 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last few years, there has been a convergence between the fields of ultrafast science, nonlinear optics, optical frequency metrology, and precision laser spectroscopy. These fields have been developing largely independently since the birth of the laser, reaching remarkable levels of performance. On the ultrafast frontier, pulses of only a few cycles long have been produced, while in optical spectroscopy, the precision and resolution have reached one part in Although these two achievements appear to be completely disconnected, advances in nonlinear optics provided the essential link between them. The resulting convergence has enabled unprecedented advances in the control of the electric field of the pulses produced by femtosecond mode-locked lasers. The corresponding spectrum consists of a comb of sharp spectral lines with well-defined frequencies. These new techniques and capabilities are generally known as “femtosecond comb technology. ” They have had dramatic impact on the diverse fields of precision measurement and extreme nonlinear optical physics. The historical background for these developments is provided in the Foreword by two of the pioneers of laser spectroscopy, John Hall and Theodor Hänsch. Indeed the developments described in this book were foreshadowed by Hänsch’s early work in the 1970s when he used picosecond pulses to demonstrate the connection between the time and frequency domains in laser spectroscopy. This work complemented the advances in precision laser stabilization developed by Hall.
Download or read book Interferometry and Synthesis in Radio Astronomy written by A. Richard Thompson and published by Wiley-Interscience. This book was released on 1986-04-28 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: A unified description of the theory and practice of radio interferometry and synthesis mapping techniques as they apply to astronomy and geology. Beginning with an historical review, it goes on to provide a detailed description of all aspects of radio inferometry, from basic principles through instrumental design to data reduction. Over 450 original papers and monographs are cited.
Download or read book Nanolithography written by M. Gentili and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Download or read book Index to Theses with Abstracts Accepted for Higher Degrees by the Universities of Great Britain and Ireland and the Council for National Academic Awards written by and published by . This book was released on 2005 with total page 706 pages. Available in PDF, EPUB and Kindle. Book excerpt:
