Download or read book Phase Shifting Diffraction Interferometer written by and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An interferometer which has the capability of measuring optical elements and systems with an accuracy of .lambda./1000 where .lambda. is the wavelength of visible light. Whereas current interferometers employ a reference surface, which inherently limits the accuracy of the measurement to about .lambda./50, this interferometer uses an essentially perfect spherical reference wavefront generated by the fundamental process of diffraction. This interferometer is adjustable to give unity fringe visibility, which maximizes the signal-to-noise, and has the means to introduce a controlled prescribed relative phase shift between the reference wavefront and the wavefront from the optics under test, which permits analysis of the interference fringe pattern using standard phase extraction algorithms.

Download or read book Phase shifting Point Diffraction Interferometer written by and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Disclosed is a point diffraction interferometer for evaluating the quality of a test optic. In operation, the point diffraction interferometer includes a source of radiation, the test optic, a beam divider, a reference wave pinhole located at an image plane downstream from the test optic, and a detector for detecting an interference pattern produced between a reference wave emitted by the pinhole and a test wave emitted from the test optic. The beam divider produces separate reference and test beams which focus at different laterally separated positions on the image plane. The reference wave pinhole is placed at a region of high intensity (e.g., the focal point) for the reference beam. This allows reference wave to be produced at a relatively high intensity. Also, the beam divider may include elements for phase shifting one or both of the reference and test beams.

Download or read book Phase shifting Point diffraction Interferometry at EUV Wavelengths written by and published by . This book was released on 1997 with total page 2 pages. Available in PDF, EPUB and Kindle. Book excerpt: A novel phase-shifting point-diffraction interferometer (PS/PDI) operating at the Advanced Light Source (ALS) is being used to perform wavefront-measuring metrology at 13.4-nm wavelength to characterize aberrations in a multilayer-coated 10x Schwarzschild objective designed for extreme ultraviolet (EUV) projection lithography experiments. To achieve 0.1-micron critical dimension pattern transfer with EUV projection lithography at 13.4-nm wavelength, nearly diffraction-limited all-reflective multilayer-coated optical systems with 0.1 numerical aperture are required. The EUV wavefront, determined by the mirror surfaces and the reflective multilayer coatings, is measurable only at the operational wavelength of the system. The authors goal is to measure the EUV wavefront to an accuracy of 0.01 waves rms (0.13 nm). The PS/PDI is a type of point-diffraction interferometer, modified for significantly improved throughput and phase-shifting capability. The interferometer design utilizes a grating beamsplitter and pinhole spatial filters in the object and image planes of the optical system under test. The 10x-reduction Schwarzschild objective, with image-side numerical aperture of 0.08, is illuminated by a sub-micron pinhole in the object plane. A coarse, 20-micron pitch grating placed between the illumination pinhole and the Schwarzschild system serves a dual role as a small-angle beam-splitter and a phase-shifting element. The first-order diffracted beam from the grating is spatially filtered in the image plane of the Schwarzschild with a sub-100-nm pinhole and becomes the `D reference` wave in the interferometer. The zero-order beam is the `test` wave, and it passes unobstructed through a 4.5-[mu]m window in the image plane. The test and reference beams are separated by several microns in the image plane to minimize beam overlap. The interference fringes are recorded with a CCD detector placed about 12 cm from the Schwarzschild image plane.

Download or read book Phase shifting Point Diffraction Interferometer Focus aid Enhanced Mask written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.

Download or read book Phase shifting Point Diffraction Interferometer Phase Grating Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Diffraction phase gratings are employed in phase-shifting point diffraction interferometers to improve the interferometric fringe contrast. The diffraction phase grating diffracts a zeroth-order diffraction of light at a first power level to the test-beam window of a mask that is positioned at the image plane and a first-order diffraction at a second power to the reference-beam pinhole. The diffraction phase grating is preferably selected to yield a desired ratio of the first power level to second power level.

Download or read book Polarization Phase shifting Point diffraction Interferometer PHD written by Robert Mark Neal and published by . This book was released on with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Phase shifting Point Diffraction Interferometer Grating Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order diffraction to the test beam window of the mask, the test and reference beam intensities can be balanced and the fringe contrast improved. Additionally, using a duty cycle of the diffraction grating other than 50%, the fringe contrast can also be improved.

Download or read book Selected Topics on Optical Fiber Technology written by Moh Yasin and published by IntechOpen. This book was released on 2012-02-22 with total page 682 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents a comprehensive account of the recent advances and research in optical fiber technology. It covers a broad spectrum of topics in special areas of optical fiber technology. The book highlights the development of fiber lasers, optical fiber applications in medical, imaging, spectroscopy and measurement, new optical fibers and sensors. This is an essential reference for researchers working in optical fiber researches and for industrial users who need to be aware of current developments in fiber lasers, sensors and other optical fiber applications.

Download or read book Optical Shop Testing written by Daniel Malacara and published by John Wiley & Sons. This book was released on 2007-07-16 with total page 882 pages. Available in PDF, EPUB and Kindle. Book excerpt: The purpose of this third edition is to bring together in a single book descriptions of all tests carried out in the optical shop that are applicable to optical components and systems. This book is intended for the specialist as well as the non-specialist engaged in optical shop testing. There is currently a great deal of research being done in optical engineering. Making this new edition very timely.

Download or read book Phase Shifting Diffraction Interferometry for Measuring Extreme Ultraviolet Optics written by and published by . This book was released on 1996 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: Extreme ultraviolet projection lithography operating at a wavelength of 13nm requires surface figure accuracy on each mirror to be better than 0.25nm rms. A new type of interferometry, based on the fundamental process of diffraction, is described that can intrinsically achieve the required accuracy. Applying this principle, two independent spherical wavefronts are generated - one serves as the measurement wavefront and is incident on the optic or optical system under test and the other serves as the reference wavefront. Since they are generated independently their relative amplitude and phase can be controlled, providing contrast adjustment and phase shifting capability. Using diffraction from a single mode optical fiber, different interferometers can be configured to measure individual mirrors or entire imaging systems. Measurement of an EUV projection system is described. 5 refs., 4 figs.

Download or read book In Situ Alignment System for Phase shifting Point diffraction Interferometry written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A device and method to facilitate the gross alignment of patterned object- and image-plane masks in optical systems such as the phase-shifting point diffraction interferometer are provided. When an array of similar pinholes or discreet mask fields is used, confusion can occur over the alignment of the focused beams within the field. Adding to the mask pattern a circumscribed or inscribed set of symbols that are identifiable in situ facilitates the unambiguous gross alignment of the object- and/or image-plane masks. Alternatively, a system of markings can be encoded directly into the window shape to accomplish this same task.

Download or read book Application Of The Phase Shifting Diffraction Interferometer For Measuring Convex Mirrors And Negative Lenses written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: To measure a convex mirror, a reference beam and a measurement beam are both provided through a single optical fiber. A positive auxiliary lens is placed in the system to give a converging wavefront onto the convex mirror under test. A measurement is taken that includes the aberrations of the convex mirror as well as the errors due to two transmissions through the positive auxiliary lens. A second measurement provides the information to eliminate this error. A negative lens can also be measured in a similar way. Again, there are two measurement set-ups. A reference beam is provided from a first optical fiber and a measurement beam is provided from a second optical fiber. A positive auxiliary lens is placed in the system to provide a converging wavefront from the reference beam onto the negative lens under test. The measurement beam is combined with the reference wavefront and is analyzed by standard methods. This measurement includes the aberrations of the negative lens, as well as the errors due to a single transmission through the positive auxiliary lens. A second measurement provides the information to eliminate this error.

Download or read book A Phase stepped Point Diffraction Interferometer Using Liquid Crystals written by and published by . This book was released on 1995 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Phase Shifting Interferometer written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An interferometer which has the capability of measuring optical elements and systems with an accuracy of .lambda./1000 where .lambda. is the wavelength of visible light. Whereas current interferometers employ a reference surface, which inherently limits the accuracy of the measurement to about .lambda./50, this interferometer uses an essentially perfect spherical reference wavefront generated by the fundamental process of diffraction. Whereas current interferometers illuminate the optic to be tested with an aberrated wavefront which also limits the accuracy of the measurement, this interferometer uses an essentially perfect spherical measurement wavefront generated by the fundamental process of diffraction. This interferometer is adjustable to give unity fringe visibility, which maximizes the signal-to-noise, and has the means to introduce a controlled prescribed relative phase shift between the reference wavefront and the wavefront from the optics under test, which permits analysis of the interference fringe pattern using standard phase extraction algorithms.

Download or read book Optical Interferometry written by Alexandr Banishev and published by BoD – Books on Demand. This book was released on 2017-02-15 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical methods of measurements are the most sensitive techniques of noncontact investigations, and at the same time, they are fast as well as accurate which increases reproducibility of observed results. In recent years, the importance of optical interferometry methods for research has dramatically increased, and applications range from precise surface testing to finding extrasolar planets. This book covers various aspects of optical interferometry including descriptions of novel apparatuses and methods, application interferometry for studying biological objects, surface qualities, materials characterization, and optical testing. The book includes a series of chapters in which experts share recent progress in interferometry through original research and literature reviews.

Download or read book Hybrid Shearing and Phase shifting Point Diffraction Interferometer written by and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A new interferometry configuration combines the strengths of two existing interferometry methods, improving the quality and extending the dynamic range of both. On the same patterned mask, placed near the image-plane of an optical system under test, patterns for phase-shifting point diffraction interferometry and lateral shearing interferometry coexist. The former giving verifiable high accuracy for the measurement of nearly diffraction-limited optical systems. The latter enabling the measurement of optical systems with more than one wave of aberration in the system wavefront. The interferometry configuration is a hybrid shearing and point diffraction interferometer system for testing an optical element that is positioned along an optical path including: a source of electromagnetic energy in the optical path; a first beam splitter that is secured to a device that includes means for maneuvering the first beam splitter in a first position wherein the first beam splitter is in the optical path dividing light from the source into a reference beam and a test beam and in a second position wherein the first beam splitter is outside the optical path: a hybrid mask which includes a first section that defines a test window and at least one reference pinhole and a second section that defines a second beam splitter wherein the hybrid mask is secured to a device that includes means for maneuvering either the first section or the second section into the optical path positioned in an image plane that is created by the optical element, with the proviso that the first section of the hybrid mask is positioned in the optical path when first beam splitter is positioned in the optical path; and a detector positioned after the hybrid mask along the optical path.

Download or read book Adding Static Printing Capabilities to the EUV Phase shifting Point Diffraction Interferometer written by and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: While interferometry is routinely used for the characterization and alignment of lithographic optics, the ultimate performance metric for these optics is printing in photoresist. Direct comparison of imaging and wavefront performance is also useful for verifying and improving the predictive power of wavefront metrology under actual printing conditions. To address these issues, static, small-field printing capabilities are being added to the extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory. This Sub-field Exposure Station (SES) will enable the earliest possible imaging characterization of the upcoming Engineering Test Stand (ETS) Set-2 projection optics. Relevant printing studies with the ETS projection optics require illumination partial coherence with[sigma] of approximately 0.7. This[sigma] value is very different from the coherent illumination requirements of the EUV PS/PDI and the coherence properties naturally provided by synchrotron undulator beamline illumination. Adding printing capabilities to the PS/PDI experimental system thus necessitates the development of an alternative illumination system capable of destroying the inherent coherence of the beamline. The SES is being implemented with two independent illuminators: the first is based on a novel EUV diffuser currently under development and the second is based on a scanning mirror design. Here we describe the design and implementation of the new SES, including a discussion of the illuminators and the fabrication of the EUV diffuser.