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Book The Bonding Modes and Optical Characteristics of Annealed Silicon Oxide Thin Films Prepared by Plasma Enhanced CVD

Download or read book The Bonding Modes and Optical Characteristics of Annealed Silicon Oxide Thin Films Prepared by Plasma Enhanced CVD written by K. H. Tan and published by . This book was released on 1993 with total page 81 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon oxide (SiOx,O

Book On the Changes in the Structural and Optical Properties Accompanying the Athermal Photovitrification Phenomenon in As50Se50 Thin Films

Download or read book On the Changes in the Structural and Optical Properties Accompanying the Athermal Photovitrification Phenomenon in As50Se50 Thin Films written by R. Prieto-Alcon and published by . This book was released on 2001 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: The effect of successive annealing illumination cycles on the structural and optical properties of wedge-shaped As50Se50 amorphous chalcogenide thin films, has been studied. It is observed that illumination increases the thickness and shrinks the bandgap. Annealing of the chalcogenide films, before or after illumination, decreases the thickness. However, although annealing after illumination increases the bandgap, when this treatment is carried out upon the as-evaporated films, the bandgap decreases. The photostructural changes have been explained in terms of two different mechanisms, which can coexist. One of them involving the repulsion and slip motion of the 2D structural layers comprising the pyramidal' network, as a consequence of the negative charging of these structural layers, by electron accumulation in conduction-band tails, and the other, involving the As4Se4 molecules, typical of thermally evaporated As-rich chalcogenides films, and forming particularly the crystalline form of medium-thickness (1+2 %m) AssoSe50 films.

Book Preparation and Post Annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films

Download or read book Preparation and Post Annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films written by Rongxin Wang and published by Open Dissertation Press. This book was released on 2017-01-26 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This dissertation, "Preparation and Post-annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films" by Rongxin, Wang, 王榮新, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: Abstract of thesis entitled PREPARATION AND POST-ANNEALING EFFECTS ON THE OPTICAL PROPERTIES OF INDIUM TIN OXIDE THIN FILMS Submitted by WANG Rong Xin for the degree of Doctor of Philosophy at The University of Hong Kong in April 2005 Many opto-electronic devices, such as III-V compound devices, liquid crystal displays, solar cells, organic and inorganic light emitting devices, and ultraviolet photodetectors, demand transparent electrode materials simultaneously having high electrical conductance. To meet the requirements for particular applications, a great deal of basic research and studies have been carried out on the electrical and optical properties of these materials. As a most promising candidate for such materials, indium tin oxide (ITO) has attracted interest in recent years. Furthermore, ITO has many unique properties such as excellent adhesion on the substrate, thermal stability and ease of patterning. The deposition of high-quality ITO thin films is a key step for successful application of ITO thin films as transparent electrode materials. To obtain optimal electrical and optical properties of ITO films, the growth parameters and conditions must be determined. Moreover, the optical and electrical properties of ITO contact layers, which can either be on the top side or the bottom side of a device, are influenced by various post-deposition treatments. For the present work, ITO thin films were deposited on glass and quartz substrates using e-beam evaporation with different deposition rates. The influence of substrate material, deposition rate, deposition gas environment and post-deposition annealing on the optical properties of the films was investigated in detail. Atomic force microscopy, X-ray diffraction and X-ray photoemission spectroscopy was employed to obtain information on the chemical state and crystallization of the films. Analysis of these data suggests that the substrate material, deposition rate, deposition gas environment and post-deposition annealing conditions strongly affect the chemical composition and the microstructure of the ITO films and these in turn influence the optical properties of the film. Oxygen incorporation transfers the In O phase to the In O phase and removes metallic In to form both indium oxide 2 3-x 2 3 phases. Both of these reactions are beneficial for the optical transmittance of ITO thin films. Moreover, it was found that the incorporation and decomposition reactions of oxygen can be controlled so as to change the optical properties of the ITO thin films reversibly. DOI: 10.5353/th_b3154617 Subjects: Thin films - Optical properties Indium compounds Annealing of metals

Book Thin Films on Silicon

Download or read book Thin Films on Silicon written by Vijay Narayanan and published by . This book was released on 2016 with total page 550 pages. Available in PDF, EPUB and Kindle. Book excerpt: "This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted."--Publisher's website.

Book Optical and Structural Properties of Europium Doped Silicon Oxide Thin Films

Download or read book Optical and Structural Properties of Europium Doped Silicon Oxide Thin Films written by Rashin Basiri Namin and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rare earth doping is one of the main approaches to enhance the optical properties of silicon-based materials. In this work, a set of europium doped silicon oxide (Eu[subscript x]Si[subscript y]O[subscript z]) thin films are fabricated using an integrated magnetron sputtering electron cyclotron resonance plasma enhanced chemical vapor deposition (IMS-ECR-PECVD) system. The thin film composition was studied by Rutherford backscattering spectrometry (RBS) and elastic recoil detection (ERD) measurements verifying high control over the Eu content by changing the sputtering power. Variable Angle spectroscopic ellipsometry (VASE) was conducted, delivering the refractive index and thickness. Using a UV laser (325 nm) excitation source, Photoluminescence (PL) measurements were performed, and it was confirmed that Eu[superscript 3+] transition which is associated with the red light emission is successfully achieved even at annealing temperatures as low as 300°C. Performing X-ray diffraction (XRD) analysis, the structural properties of the thin films were studied and the formation of Eu[subscript x]Si[subscript y]O[subscript z] crystals was confirmed for the samples annealed at elevated temperatures.

Book Optical Properties of Silicon Based Amorphous Thin Films

Download or read book Optical Properties of Silicon Based Amorphous Thin Films written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Production-characterization-improved growth conditions”.

Book The Optical Properties of Copper Oxide Thin Films

Download or read book The Optical Properties of Copper Oxide Thin Films written by Robert H. Mason and published by . This book was released on 1997 with total page 66 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Physics Briefs

Download or read book Physics Briefs written by and published by . This book was released on 1986 with total page 896 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Atomic Layer Deposition for Semiconductors

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.