Download or read book Low Frequency Noise as a Characterization and Reliability Tool for the Evaluation of Advanced MOSFETS written by Paul Lim and published by . This book was released on 2009 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Frequency Noise in Advanced MOS Devices written by Martin Haartman and published by Springer Science & Business Media. This book was released on 2007-08-23 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is an introduction to noise, describing fundamental noise sources and basic circuit analysis, discussing characterization of low-frequency noise and offering practical advice that bridges concepts of noise theory and modelling, characterization, CMOS technology and circuits. The text offers the latest research, reviewing the most recent publications and conference presentations. The book concludes with an introduction to noise in analog/RF circuits and describes how low-frequency noise can affect these circuits.
Download or read book Low Frequency Noise in Advanced MOS Devices written by Martin von Haartman and published by Springer. This book was released on 2009-09-03 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is an introduction to noise, describing fundamental noise sources and basic circuit analysis, discussing characterization of low-frequency noise and offering practical advice that bridges concepts of noise theory and modelling, characterization, CMOS technology and circuits. The text offers the latest research, reviewing the most recent publications and conference presentations. The book concludes with an introduction to noise in analog/RF circuits and describes how low-frequency noise can affect these circuits.
Download or read book High frequency Small signal and Noise Characterization for Advanced MOSFETs Considering Temperature Dependence written by Sheng-Chun Wang and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Strain Engineered MOSFETs written by C.K. Maiti and published by CRC Press. This book was released on 2018-10-03 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: Currently strain engineering is the main technique used to enhance the performance of advanced silicon-based metal-oxide-semiconductor field-effect transistors (MOSFETs). Written from an engineering application standpoint, Strain-Engineered MOSFETs introduces promising strain techniques to fabricate strain-engineered MOSFETs and to methods to assess the applications of these techniques. The book provides the background and physical insight needed to understand new and future developments in the modeling and design of n- and p-MOSFETs at nanoscale. This book focuses on recent developments in strain-engineered MOSFETS implemented in high-mobility substrates such as, Ge, SiGe, strained-Si, ultrathin germanium-on-insulator platforms, combined with high-k insulators and metal-gate. It covers the materials aspects, principles, and design of advanced devices, fabrication, and applications. It also presents a full technology computer aided design (TCAD) methodology for strain-engineering in Si-CMOS technology involving data flow from process simulation to process variability simulation via device simulation and generation of SPICE process compact models for manufacturing for yield optimization. Microelectronics fabrication is facing serious challenges due to the introduction of new materials in manufacturing and fundamental limitations of nanoscale devices that result in increasing unpredictability in the characteristics of the devices. The down scaling of CMOS technologies has brought about the increased variability of key parameters affecting the performance of integrated circuits. This book provides a single text that combines coverage of the strain-engineered MOSFETS and their modeling using TCAD, making it a tool for process technology development and the design of strain-engineered MOSFETs.
Download or read book Low Frequency Noise Characterization System of Advanced Electronics Devices written by and published by . This book was released on 2002 with total page 32 pages. Available in PDF, EPUB and Kindle. Book excerpt: To date, a rising need for high-speed low-noise electronic devices is observed for a wide variety of applications, including wireless or fiber communications. Low frequency noise poses a lower limit on the signal level in broadband circuits. Noise sources are related to various kinds of materials imperfections such as point or line defects, but also to interface interface defects or defects at contacts. As device dimensions decrease, the noise introduced by trapping-detrapping of carriers at deep defects becomes increasingly important. Therefore, the analysis of low frequency electrical noise can be a useful tool not only for the qualification of device performance, but also for the characterization of noise-generating deep level defects in semiconductor materials. The advantages of this technique include the possibility of measuring fully processed device structures and the direct relevance of the measured defect characteristics to device performance Reduction of the noise level frequently requires the correct identification of noise sources. However, difficulties can arise in the interpretation of often-indistinct noise spectrum features.
Download or read book Characterization and Modeling of Low Frequency Noise and Dielectric Traps in Scaled MOSFET Devices written by Xiaochen Zhang and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Characterization on SiON MOSFET devices are performed including I-V (Current-Voltage), C-V (Capacitance-Voltage), charge pumping etc. NMOS transistors exhibit a higher interface trap density (9.7E10 cm-2eV-1) than PMOS (5.8E10 cm-2eV-1). The mean capture cross sections are comparable in these devices: 3.3E-17 cm2 and 9.1E-17 cm2, receptively, for CMOS devices. Different mobility extraction methods are presented and the results indicate strong surface roughness scattering in these devices. The effects of channel carbon ion implantation (Cii) on advanced high-K metal gate low-power CMOS devices have been studies. Cii improves the device performance, especially for NMOS. The improvement comes mainly from an improvement in electron mobility, where Coulomb scattering is reduced due to retarded boron diffusion with carbon.
Download or read book Semiconductor Material and Device Characterization written by Dieter K. Schroder and published by John Wiley & Sons. This book was released on 2015-06-29 with total page 800 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Third Edition updates a landmark text with the latest findings The Third Edition of the internationally lauded Semiconductor Material and Device Characterization brings the text fully up-to-date with the latest developments in the field and includes new pedagogical tools to assist readers. Not only does the Third Edition set forth all the latest measurement techniques, but it also examines new interpretations and new applications of existing techniques. Semiconductor Material and Device Characterization remains the sole text dedicated to characterization techniques for measuring semiconductor materials and devices. Coverage includes the full range of electrical and optical characterization methods, including the more specialized chemical and physical techniques. Readers familiar with the previous two editions will discover a thoroughly revised and updated Third Edition, including: Updated and revised figures and examples reflecting the most current data and information 260 new references offering access to the latest research and discussions in specialized topics New problems and review questions at the end of each chapter to test readers' understanding of the material In addition, readers will find fully updated and revised sections in each chapter. Plus, two new chapters have been added: Charge-Based and Probe Characterization introduces charge-based measurement and Kelvin probes. This chapter also examines probe-based measurements, including scanning capacitance, scanning Kelvin force, scanning spreading resistance, and ballistic electron emission microscopy. Reliability and Failure Analysis examines failure times and distribution functions, and discusses electromigration, hot carriers, gate oxide integrity, negative bias temperature instability, stress-induced leakage current, and electrostatic discharge. Written by an internationally recognized authority in the field, Semiconductor Material and Device Characterization remains essential reading for graduate students as well as for professionals working in the field of semiconductor devices and materials. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.
Download or read book Low Frequency Noise Characterization of Si SiO2 Interface Properties in Strained MOSFETs written by 郭正聞 and published by . This book was released on 2011 with total page 128 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Advanced Experimental Methods for Noise Research in Nanoscale Electronic Devices written by Josef Sikula and published by Springer Science & Business Media. This book was released on 2006-02-21 with total page 371 pages. Available in PDF, EPUB and Kindle. Book excerpt: A discussion of recently developed experimental methods for noise research in nanoscale electronic devices, conducted by specialists in transport and stochastic phenomena in nanoscale physics. The approach described is to create methods for experimental observations of noise sources, their localization and their frequency spectrum, voltage-current and thermal dependences. Our current knowledge of measurement methods for mesoscopic devices is summarized to identify directions for future research, related to downscaling effects. The directions for future research into fluctuation phenomena in quantum dot and quantum wire devices are specified. Nanoscale electronic devices will be the basic components for electronics of the 21st century. From this point of view the signal-to-noise ratio is a very important parameter for the device application. Since the noise is also a quality and reliability indicator, experimental methods will have a wide application in the future.
Download or read book Defects in Microelectronic Materials and Devices written by Daniel M. Fleetwood and published by CRC Press. This book was released on 2008-11-19 with total page 772 pages. Available in PDF, EPUB and Kindle. Book excerpt: Uncover the Defects that Compromise Performance and ReliabilityAs microelectronics features and devices become smaller and more complex, it is critical that engineers and technologists completely understand how components can be damaged during the increasingly complicated fabrication processes required to produce them.A comprehensive survey of defe
Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2668 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Reliability of MEMS written by Osamu Tabata and published by John Wiley & Sons. This book was released on 2008-02-04 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first book to cover exclusively and in detail the principles, tools and methods for determining the reliability of microelectromechanical materials, components and devices covers both component materials as well as entire MEMS devices. Divided into two major parts, following a general introductory chapter to reliability issues, the first part looks at the mechanical properties of the materials used in MEMS, explaining in detail the necessary measuring technologies -- nanoindenters, bulge methods, bending tests, tensile tests, and others. Part Two treats the actual devices, organized by important device categories such as pressure sensors, inertial sensors, RF MEMS, and optical MEMS.
Download or read book Noise in Physical Systems and 1 f Fluctuations written by T. Musha and published by IOS Press. This book was released on 1992 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents and discusses fundamental aspects and key implications of noise and fluctuations in various fields of science, technology and sociology, with special emphasis in 1/f fluctuations in biology. There are contributions from leading international experts.
Download or read book Noise in Nanoscale Semiconductor Devices written by Tibor Grasser and published by Springer Nature. This book was released on 2020-04-26 with total page 724 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book summarizes the state-of-the-art, regarding noise in nanometer semiconductor devices. Readers will benefit from this leading-edge research, aimed at increasing reliability based on physical microscopic models. Authors discuss the most recent developments in the understanding of point defects, e.g. via ab initio calculations or intricate measurements, which have paved the way to more physics-based noise models which are applicable to a wider range of materials and features, e.g. III-V materials, 2D materials, and multi-state defects. Describes the state-of-the-art, regarding noise in nanometer semiconductor devices; Enables readers to design more reliable semiconductor devices; Offers the most up-to-date information on point defects, based on physical microscopic models.
Download or read book Noise in Physical Systems and 1 f Fluctuations written by Gijs Bosman and published by World Scientific. This book was released on 2001 with total page 850 pages. Available in PDF, EPUB and Kindle. Book excerpt: The International Conference on Noise in Physical Systems and 1/f Fluctuations brings together physicists and engineers interested in all aspects of noise and fluctuations in materials, devices, circuits, and physical and biological systems. The experimental research on novel devices and systems and the theoretical studies included in this volume provide the reader with a comprehensive, in-depth treatment of present noise research activities worldwide. Contents: Noise in Nanoscale Devices (S Bandyopadhyay et al.); 1/f Voltage Noise Induced by Magnetic Flux Flow in Granular Superconductors (O V Gerashchenko); Low Frequency Noise Analysis of Different Types of Polysilicon Resistors (A Penarier et al.); Low Frequency Noise in CMOS Transistors: An Experimental and Comparative Study on Different Technologies (P Fantini et al.); Modeling of Current Transport and 1/f Noise in GaN Based HBTs (H Unlu); Low Frequency Noise in CdSe Thin Film Transistors (M J Deen & S Rumyanstsev); NIST Program on Relative Intensity Noise Standards for Optical Fiber Sources Near 1550 nm (G Obarski); Physical Model of the Current Noise Spectral Density Versus Dark Current in CdTe Detectors (A Imad et al.); Time and Frequency Study of RTS in Bipolar Transistors (A Penarier et al.); Neural Network Based Adaptive Processing of Electrogastrogram (S Selvan); Shot Noise as a Test of Entanglement and Nonlocality of Electrons in Mesoscopic Systems (E V Sukhorukov et al.); The Readout of Time, Continued Fractions and 1/f Noise (M Planat & J Cresson); Longitudinal and Transverse Noise of Hot Electrons in 2DEG Channels (J Liberis et al.); 1/f Noise, Intermittency and Clustering Poisson Process (F Gruneis); Noise Modeling for PDE Based Device Simulations (F Bonani & G Ghione); Methods of Slope Estimation of Noise Power Spectral Density (J Smulko); and other papers. Readership: Researchers, academics and graduate students in electrical and electronic engineering, biophysics, nanoscience, applied physics, statistical physics and semiconductor science.
