Download or read book Chemical Abstracts written by and published by . This book was released on 1991 with total page 2682 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by Elsevier. This book was released on 2019-08-30 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1420 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Film Deposition by Plasma Techniques written by Mitsuharu Konuma and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.
Download or read book Fusion Energy Update written by and published by . This book was released on 1986 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Surface Interactions and Processing of Materials written by O. Auciello and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt: An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Download or read book Plasma Engineering written by Michael Keidar and published by Academic Press. This book was released on 2018-08-06 with total page 587 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. - Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine - Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas - Provides a technical treatment of the fundamental and engineering principles used in plasma applications
Download or read book Diamond and Diamond like Films and Coatings written by Robert E. Clausing and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 894 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond films grown by activated chemical vapor deposition have superlative thermal, mechanical, optical, and electronic properties combined with a very high degree of chemical inertness to most environments. These properties, together with the ability to fabricate films and shapes of considerable size, promise an exciting new material with many applications. Some applications are on the verge of commercialization but many await a few more technological developments. Diamond-like films are already employed in both commercial and military applications. The popular press, as well as the scientific and technological and industrial communities, are increasingly interested in the potential for future development of these materials. Although there are many technical papers and review articles published, there is no Single comprehensive introduction to these technologies. The Scientific Affairs Division of NATO recognized the need and the future importance of these technologies and authorized an Advanced Study Institute on diamond and diamond-like films. NATO Advanced Study Institutes are high level teaching activities at which a carefully defined subject is presented in a systematic and coherently structured program. The subject is treated in considerable depth by lecturers eminent in their fields and of international standing. The presentations are made to students who are scientists in the field or who possess an advanced general scientific background.
Download or read book Laser Induced Damage in Optical Materials written by and published by . This book was released on 1994 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Non Thermal Plasma Technology for Polymeric Materials written by Sabu Thomas and published by Elsevier. This book was released on 2018-10-08 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt: Non-Thermal Plasma Technology for Polymeric Materials: Applications in Composites, Nanostructured Materials and Biomedical Fields provides both an introduction and practical guide to plasma synthesis, modification and processing of polymers, their composites, nancomposites, blends, IPNs and gels. It examines the current state-of-the-art and new challenges in the field, including the use of plasma treatment to enhance adhesion, characterization techniques, and the environmental aspects of the process. Particular attention is paid to the effects on the final properties of composites and the characterization of fiber/polymer surface interactions. This book helps demystify the process of plasma polymerization, providing a thorough grounding in the fundamentals of plasma technology as they relate to polymers. It is ideal for materials scientists, polymer chemists, and engineers, acting as a guide to further research into new applications of this technology in the real world. - Enables materials scientists and engineers to deploy plasma technology for surface treatment, characterization and analysis of polymeric materials - Reviews the state-of-the-art in plasma technology for polymer synthesis and processing - Presents detailed coverage of the most advanced applications for plasma polymerization, particularly in medicine and biomedical engineering, areas such as implants, biosensors and tissue engineering
Download or read book Handbook of Vacuum Science and Technology written by Dorothy Hoffman and published by Elsevier. This book was released on 1997-10-29 with total page 861 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Vacuum Technology consists of the latest innovations in vacuum science and technology with a strong orientation towards the vacuum practitioner. It covers many of the new vacuum pumps, materials, equipment, and applications. It also details the design and maintenance of modern vacuum systems. The authors are well known experts in their individual fields with the emphasis on performance, limitations, and applications rather than theory. There aremany useful tables, charts, and figures that will be of use to the practitioner. - User oriented with many useful tables, charts, and figures of use to the practitioner - Reviews new vacuum materials and equipment - Illustrates the design and maintenance of modern vacuum systems - Includes well referenced chapters
Download or read book Dry Etching for VLSI written by A.J. van Roosmalen and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 247 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Issues in Nuclear and Plasma Science and Technology 2011 Edition written by and published by ScholarlyEditions. This book was released on 2012-01-09 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt: Issues in Nuclear and Plasma Science and Technology: 2011 Edition is a ScholarlyEditions™ eBook that delivers timely, authoritative, and comprehensive information about Nuclear and Plasma Science and Technology. The editors have built Issues in Nuclear and Plasma Science and Technology: 2011 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Nuclear and Plasma Science and Technology in this eBook to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Issues in Nuclear and Plasma Science and Technology: 2011 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Download or read book Inorganic Mass Spectrometry written by Sabine Becker and published by John Wiley & Sons. This book was released on 2008-02-28 with total page 514 pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing an exhaustive review of this topic, Inorganic Mass Spectrometry: Principles and Applications provides details on all aspects of inorganic mass spectrometry, from a historical overview of the topic to the principles and functions of mass separation and ion detection systems. Offering a comprehensive treatment of inorganic mass spectrometry, topics covered include: Recent developments in instrumentation Developing analytical techniques for measurements of trace and ultratrace impurities in different materials This broad textbook in inorganic mass spectrometry, presents the most important mass spectrometric techniques used in all fields of analytical chemistry. By covering recent developments and advances in all fields of inorganic mass spectrometry, this text provides researchers and students with information to answer any questions on this topic as well as providing the basic fundamentals for understanding this potentially complex, but increasingly relevant subject.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1993-02 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemistry of the Semiconductor Industry written by S.J. Moss and published by Springer Science & Business Media. This book was released on 1989-02-28 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers the chemistry of the major processes involved in the manufacture of integrated circuits. The authors describe all the major processes in use, together with some interesting processes which are currently being developed and hold future promise. Each chapter covers the current state of knowledge of the underlying chemistry of a particular process, and identifies areas of uncertainty requiring further research.
