Download or read book Ion Solid Interactions written by Michael Nastasi and published by Cambridge University Press. This book was released on 1996-03-29 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive guide to an important materials science technique for students and researchers.
Download or read book Computer Simulation of Ion Solid Interactions written by Wolfgang Eckstein and published by Springer Science & Business Media. This book was released on 2013-03-12 with total page 303 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book the author discusses the investigation of ion bombardment of solids by computer simulation, with the aim of demonstrating the usefulness of this approach to the problem of interactions of ions with solids. The various chapters present the basic physics behind the simulation programs, their structure and many applications to different topics. The two main streams, the binary collision model and the classical dynamics model, are discussed, as are interaction potentials and electronic energy losses. The main topics investigated are backscattering, sputtering and implantation for incident atomic particles with energies from the eV to the MeV range. An extensive overview of the literature is given, making this book of interest to the active reseacher as well to students entering the field.
Download or read book Ion Bombardment of Solids written by George Carter and published by . This book was released on 1968 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Sputtering by Particle Bombardment III written by Rainer Behrisch and published by Springer. This book was released on 1991-09-10 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.
Download or read book Low Energy Ion Irradiation of Solid Surfaces written by Hubert Gnaser and published by Springer. This book was released on 2014-01-15 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book An Introduction to Time of Flight Secondary Ion Mass Spectrometry ToF SIMS and its Application to Materials Science written by Sarah Fearn and published by Morgan & Claypool Publishers. This book was released on 2015-10-16 with total page 67 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.
Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-12-31 with total page 657 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Download or read book Atomic and Ion Collisions in Solids and at Surfaces written by Roger Smith and published by Cambridge University Press. This book was released on 1997-01-13 with total page 323 pages. Available in PDF, EPUB and Kindle. Book excerpt: A 1997 monograph on simulation for condensed matter physicists, materials scientists, chemists and electrical engineers.
Download or read book Sputtering by Particle Bombardment written by Rainer Behrisch and published by Springer Science & Business Media. This book was released on 2007-07-26 with total page 527 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a long-needed survey of new results. Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems. The book offers a critical review of computational methods for calculating sputtering yields and also includes molecular dynamics calculations.
Download or read book Ion Implantation and Beam Processing written by J. S. Williams and published by Academic Press. This book was released on 2014-06-28 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.
Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
Download or read book Erosion and Growth of Solids Stimulated by Atom and Ion Beams written by G. Kiriakidis and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt: The members of the organising Committee and their colleagues have, for many years been investigating the evol ution of the fas'cinating surface features which develop during sputtering erosion of solids. Such experimental, theoretical and computational studies have also been carried out in many international laboratories and, as well as much cow~onality and agreement, substantial disagreements were unresolved. In view of the increasing importance of such processes in technological applications such as microlitho graphic etching for the patterning of solid state devices and in fusion technology it was felt opportune to hold a meeting in this area. Furthermore the use of energetic atomic and ion fluxes is also becoming of increasing importance in assisting or modifying the growth of thin films in a number of important industrial processes and it was therefore rational to combine the, study of both erosional and growth processes in a single meeting. These proceedings include 16 invited review and 15 oral or poster presented contributions to the NATO Advanced Study Institute on the "Erosion and Growth of Solids Stimulated by Atom and Ion Beams". The review contributions span the range from the fundamental concepts of ballistic sputtering, and how this influences surface morphology evolution, through processes involving entrapment of incident species to mechanisms involved in'the use of chemically reactive ion species. Further reviews outline the influence of energetic irradiation upon surface growth by atomic deposition whilst others discuss technologkal applications of both areas of growth and erosion.
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes
Download or read book Field Ionization Mass Spectrometry written by Hans-D. Beckey and published by . This book was released on 1971 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt: Field Ionization Mass Spectrometry focuses on developments in field ionization (FI) mass spectrometry and describes its applications in physical chemistry, with emphasis on mass spectrometric problems. Physico-chemical problems as well as problems of chemical analysis are considered based on issues such as the probability of field ionization; field dissociation and charge distribution; kinetics of ion decomposition in high fields; negative ions; surface diffusion; activation of FI emitters; and elucidation of the structures of organic compounds. This book is comprised of four chapters and beg.
Download or read book Ion Formation from Organic Solids IFOS III written by Alfred Benninghoven and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt: The 3rd International Conference on Ion Formation from Organic Solids (IFOS III) was held at the University of Munster, September 16-18, 1985. The conference was attended by 60 invited scientists from all over the world. Of the 43 papers which were presented, 40 are included in these proceedings. The aim of IFOS III was to promote the exchange of results and new ideas between scientists actively working in the field of mass spectrometry of involatile materials. Various aspects of the ion formation process - realization and optimization, theoretical understanding and analytical application -were treated, as well as instrumental developments. Some emphasis was placed on recent developments in time-of-flight and Fourier transform ion cyclotron resonance mass spectrometry, and its impact on the mass spectrometry of involatile materials. The most important goal of the conference was to combine facets of the understanding of the most complex ion formation processes with the many different aspects of its analytical application. The participants came from a wide variety of different fields, including pure and applied physics and chemistry, medicine, pharmacy, and space research. Finally, on behalf of all the conference participants, I would like to thank Dr. W. Sichtermann and :\1iss I. Bekemeier for the perfect preparation and technical organization of the conference. The next conference in this series, IFOS IV, is planned for the autumn of 1987, in Munster.
Download or read book Materials Surface Processing by Directed Energy Techniques written by Yves Pauleau and published by Elsevier. This book was released on 2006-04-25 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: The current status of the science and technology related to coatings, thin films and surface modifications produced by directed energy techniques is assessed in Materials Surface Processing by Directed Energy Techniques. The subject matter is divided into 20 chapters - each presented at a tutorial level – rich with fundamental science and experimental results. New trends and new results are also evoked to give an overview of future developments and applications. - Provides a broad overview on modern coating and thin film deposition techniques, and their applications - Presents and discusses various problems of physics and chemistry involved in the production, characterization and applications of coatings and thin films - Each chapter includes experimental results illustrating various models, mechanisms or theories
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1976 with total page 612 pages. Available in PDF, EPUB and Kindle. Book excerpt:
