Download or read book Proceedings of the International Symposium on Thin Film Materials Processes Reliability and Applications Thin Film Processes written by G. S. Mathad and published by The Electrochemical Society. This book was released on 1998 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt:

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Download or read book Micro Nano Integrated Fabrication Technology and Its Applications in Microenergy Harvesting written by Xiao-Sheng Zhang and published by Springer. This book was released on 2015-12-01 with total page 137 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents a universal mass-production micro/nano integrated fabrication technology, which can be used to realize micro/nano hierarchical structures on Si-based materials and flexible polymeric materials. This fabrication technology has been systematically investigated by using experimental measurements, mechanism analyses, theoretical simulations and so on. Three common materials (i.e., silicon, PDMS and Parylene-C) with micro/nano hierarchical structures have been successfully fabricated, which also show several attractive properties. Furthermore, this book introduces this fabrication technology into microenergy field, and proposes several high-performance nanogenerators, of which practical applications have also been studied in commercial electronic device and biomedical microsystem.

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Download or read book Plasma Deposition of Amorphous Silicon Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices

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