Download or read book Integrated Silicon Device Technology written by and published by . This book was released on 1964 with total page 211 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Integrated Silicon Device Technology Diffusion written by Research Triangle Institute and published by . This book was released on 1964 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Integrated Silicon Device Technology Volume Iv Diffusion written by A. M. Smith and published by . This book was released on 1964 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt: Both the theoretical and the practical aspects of impurity diffusion in silicon are discussed. Fick's second law is solved for a number of boundary conditions; the solutions obtained are compared with the measured data and shown to be valid only under certain experimental conditions. The experimentally determined values of the diffusion coefficients of 28 impurities in silicon are listed. Concentration, both of background impurity and diffusion impurity, can influence the value of the diffusion coefficient. This influence is illustrated by data from boron and phosphorus diffusions. Some typical, practical diffusion systems are described, emphasizing the techniques of open-tube diffusion of boron and phosphorus. (Author).
Download or read book Integrated Silicon Device Technology written by Research Triangle Institute and published by . This book was released on 1963 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Silicon Device Processing written by Charles P. Marsden and published by . This book was released on 1970 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of the Symposium was to provide an opportunity for engineers and applied scientists actively engaged in the silicon device technology field to discuss the most advanced measurement methods for process control and materials characterization.The basic theme of the meeting was to stress the interdependence of measurements techniques, facilities, and materials as they relate to the overall problems of improving and advancing silicon device sciences and technologies.(Author).
Download or read book Integrated Silicon Device Technology Photoengraving written by Research Triangle Institute and published by . This book was released on 1963 with total page 40 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Integrated Silicon Device Technology written by and published by . This book was released on 1963 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Integrated Silicon Device Technology Oxidation written by Research Triangle Institute and published by . This book was released on 1963 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamentals of Silicon Integrated Device Technology written by Mikhail Mikhailovich Lavrentiev and published by . This book was released on 1967 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamentals of Silicon Integrated Device Technology Oxidation diffusion and epitaxy v 2 Bipolar and unipolar transistors written by Robert M. Burger and published by . This book was released on 1967 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Integrated Silicon Optoelectronics written by Horst Zimmermann and published by Springer. This book was released on 2009-10-03 with total page 397 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated Silicon Optoelectronics synthesizes topics from optoelectronics and microelectronics. The book concentrates on silicon as the major base of modern semiconductor devices and circuits. Starting from the basics of optical emission and absorption, as well as from the device physics of photodetectors, the aspects of the integration of photodetectors in modern bipolar, CMOS, and BiCMOS technologies are discussed. Detailed descriptions of fabrication technologies and applications of optoelectronic integrated circuits are included. The book, furthermore, contains a review of the newest state of research on eagerly anticipated silicon light emitters. In order to cover the topics comprehensively, also included are integrated waveguides, gratings, and optoelectronic power devices. Numerous elaborate illustrations facilitate and enhance comprehension. This extended edition will be of value to engineers, physicists, and scientists in industry and at universities. The book is also recommended to graduate students specializing on microelectronics or optoelectronics.
Download or read book Silicon Devices and Process Integration written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2009-01-09 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author’s industrial and academic lecture notes and reflects years of experience in the development of silicon devices. Features include: A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon; State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS; CMOS-only applications, such as subthreshold current and parasitic latch-up; Advanced Enabling processes and process integration. This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science.
Download or read book Integrated Silicon Device Technology written by and published by . This book was released on 1965 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Integrated Silicon Device Technology Volume Vii Oxidation written by RESEARCH TRIANGLE INST DURHAM N C. and published by . This book was released on 1965 with total page 285 pages. Available in PDF, EPUB and Kindle. Book excerpt: The common methods of growing oxide layers on silicon use either the high temperature reactions of silicon with steam (either in an open tube or a high pressure bomb), dry oxygen, wet oxygen, or the anodic reaction of silicon with various electrolytes or plasmas at room temperature or thereabout. The kinetics of each of these reactions is discussed and the results from typical experimental systems are presented. Oxide layers may also be deposited on the silicon surface by pyrolytic decomposition, reactive sputtering or vacuum evaporation. The effect of impurities upon the bulk physical and electrical properties of commercial glasses is discussed to suggest the type of variations in properties that might be anticipated with similar variations of the impurity content of oxide layers. Oxides in silicon device technology are used for impurity masking during diffusion, surface protection and passivation, electrical isolation, and as regions of active and passive components probably for all applications in which the density of surface charge at the oxide-silicon interface is critical. Procedures for obtaining high quality thermal oxides and for measuring the thickness of any oxide layer on silicon conclude the report.
Download or read book Integrated Silicon Device Technology Capacitance written by Research Triangle Institute and published by . This book was released on 1963 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Silicon Integrated Circuits written by Dawon Kahng and published by Academic Press. This book was released on 2013-10-22 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon Integrated Circuits, Part B covers the special considerations needed to achieve high-power Si-integrated circuits. The book presents articles about the most important operations needed for the high-power circuitry, namely impurity diffusion and oxidation; crystal defects under thermal equilibrium in silicon and the development of high-power device physics; and associated technology. The text also describes the ever-evolving processing technology and the most promising approaches, along with the understanding of processing-related areas of physics and chemistry. Physicists, chemists, and engineers involved in silicon integrated circuits will find the book invaluable.
Download or read book Silicon Compatible Materials Processes and Technologies for Advanced Integrated Circuits and Emerging Applications 7 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2017 with total page 279 pages. Available in PDF, EPUB and Kindle. Book excerpt:
