Download or read book Hybrid Shearing and Phase shifting Point Diffraction Interferometer written by and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A new interferometry configuration combines the strengths of two existing interferometry methods, improving the quality and extending the dynamic range of both. On the same patterned mask, placed near the image-plane of an optical system under test, patterns for phase-shifting point diffraction interferometry and lateral shearing interferometry coexist. The former giving verifiable high accuracy for the measurement of nearly diffraction-limited optical systems. The latter enabling the measurement of optical systems with more than one wave of aberration in the system wavefront. The interferometry configuration is a hybrid shearing and point diffraction interferometer system for testing an optical element that is positioned along an optical path including: a source of electromagnetic energy in the optical path; a first beam splitter that is secured to a device that includes means for maneuvering the first beam splitter in a first position wherein the first beam splitter is in the optical path dividing light from the source into a reference beam and a test beam and in a second position wherein the first beam splitter is outside the optical path: a hybrid mask which includes a first section that defines a test window and at least one reference pinhole and a second section that defines a second beam splitter wherein the hybrid mask is secured to a device that includes means for maneuvering either the first section or the second section into the optical path positioned in an image plane that is created by the optical element, with the proviso that the first section of the hybrid mask is positioned in the optical path when first beam splitter is positioned in the optical path; and a detector positioned after the hybrid mask along the optical path.
Download or read book Polarization Phase shifting Point diffraction Interferometer PHD written by Robert Mark Neal and published by . This book was released on with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Dual domain Lateral Shearing Interferometer written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The phase-shifting point diffraction interferometer (PS/PDI) was developed to address the problem of at-wavelength metrology of extreme ultraviolet (EUV) optical systems. Although extremely accurate, the fact that the PS/PDI is limited to use with coherent EUV sources, such as undulator radiation, is a drawback for its widespread use. An alternative to the PS/PDI, with relaxed coherence requirements, is lateral shearing interferometry (LSI). The use of a cross-grating, carrier-frequency configuration to characterize a large-field 4.times.-reduction EUV lithography optic is demonstrated. The results obtained are directly compared with PS/PDI measurements. A defocused implementation of the lateral shearing interferometer in which an image-plane filter allows both phase-shifting and Fourier wavefront recovery. The two wavefront recovery methods can be combined in a dual-domain technique providing suppression of noise added by self-interference of high-frequency components in the test-optic wavefront.
Download or read book Selected Topics on Optical Fiber Technology written by Moh Yasin and published by IntechOpen. This book was released on 2012-02-22 with total page 682 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents a comprehensive account of the recent advances and research in optical fiber technology. It covers a broad spectrum of topics in special areas of optical fiber technology. The book highlights the development of fiber lasers, optical fiber applications in medical, imaging, spectroscopy and measurement, new optical fibers and sensors. This is an essential reference for researchers working in optical fiber researches and for industrial users who need to be aware of current developments in fiber lasers, sensors and other optical fiber applications.
Download or read book Dual domain Point Diffraction Interferometer written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI is provided. The dual-domain PS/PDI combines the separate noise-suppression capabilities of the widely-used phase-shifting and Fourier-transform fringe pattern analysis methods. The dual-domain PS/PDI relies on both a more restrictive implementation of the image plane PS/PDI mask and a new analysis method to be applied to the interferograms generated and recorded by the modified PS/PDI. The more restrictive PS/PDI mask guarantees the elimination of spatial-frequency crosstalk between the signal and the scattered-light noise arising from scattered-reference-light interfering with the test beam. The new dual-domain analysis method is then used to eliminate scattered-light noise arising from both the scattered-reference-light interfering with the test beam and the scattered-reference-light interfering with the "true" pinhole-diffracted reference light. The dual-domain analysis method has also been demonstrated to provide performance enhancement when using the non-optimized standard PS/PDI design. The dual-domain PS/PDI is essentially a three-tiered filtering system composed of lowpass spatial-filtering the test-beam electric field using the more restrictive PS/PDI mask, bandpass spatial-filtering the individual interferogram irradiance frames making up the phase-shifting series, and bandpass temporal-filtering the phase-shifting series as a whole.
Download or read book Phase shifting Point Diffraction Interferometer Focus aid Enhanced Mask written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.
Download or read book A Phase stepped Point Diffraction Interferometer Using Liquid Crystals written by and published by . This book was released on 1995 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Accuracy of Phase shifting Point Diffraction Interferometry to Test EUV Lithographic Optics written by Sang Hun Lee and published by . This book was released on 1998 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Phase shifting Point Diffraction Interferometer Phase Grating Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Diffraction phase gratings are employed in phase-shifting point diffraction interferometers to improve the interferometric fringe contrast. The diffraction phase grating diffracts a zeroth-order diffraction of light at a first power level to the test-beam window of a mask that is positioned at the image plane and a first-order diffraction at a second power to the reference-beam pinhole. The diffraction phase grating is preferably selected to yield a desired ratio of the first power level to second power level.
Download or read book Adding Static Printing Capabilities to the EUV Phase shifting Point Diffraction Interferometer written by and published by . This book was released on 2001 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: While interferometry is routinely used for the characterization and alignment of lithographic optics, the ultimate performance metric for these optics is printing in photoresist. Direct comparison of imaging and wavefront performance is also useful for verifying and improving the predictive power of wavefront metrology under actual printing conditions. To address these issues, static, small-field printing capabilities are being added to the extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory. This Sub-field Exposure Station (SES) will enable the earliest possible imaging characterization of the upcoming Engineering Test Stand (ETS) Set-2 projection optics. Relevant printing studies with the ETS projection optics require illumination partial coherence with [sigma] of approximately 0.7. This [sigma] value is very different from the coherent illumination requirements of the EUV PS/PDI and the coherence properties naturally provided by synchrotron undulator beamline illumination. Adding printing capabilities to the PS/PDI experimental system thus necessitates the development of an alternative illumination system capable of destroying the inherent coherence of the beamline. The SES is being implemented with two independent illuminators: the first is based on a novel EUV diffuser currently under development and the second is based on a scanning mirror design. Here we describe the design and implementation of the new SES, including a discussion of the illuminators and the fabrication of the EUV diffuser.
Download or read book Phase Shifting Diffraction Interferometer written by and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An interferometer which has the capability of measuring optical elements and systems with an accuracy of .lambda./1000 where .lambda. is the wavelength of visible light. Whereas current interferometers employ a reference surface, which inherently limits the accuracy of the measurement to about .lambda./50, this interferometer uses an essentially perfect spherical reference wavefront generated by the fundamental process of diffraction. This interferometer is adjustable to give unity fringe visibility, which maximizes the signal-to-noise, and has the means to introduce a controlled prescribed relative phase shift between the reference wavefront and the wavefront from the optics under test, which permits analysis of the interference fringe pattern using standard phase extraction algorithms.
Download or read book Simultaneous Phase Shifting Shearing Interferometry for Measurement of Static and Dynamic Phase Objects written by Noel-Ivan Toto-Arellano and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Simultaneous Phase Shifting Shearing Interferometry for Measurement of Static and Dynamic Phase Objects.
Download or read book Phase shifting Point Diffraction Interferometer Grating Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order diffraction to the test beam window of the mask, the test and reference beam intensities can be balanced and the fringe contrast improved. Additionally, using a duty cycle of the diffraction grating other than 50%, the fringe contrast can also be improved.
Download or read book Analyzing Algorithms for Nonlinear and Spatially Nonuniform Phase Shifts in the Liquid Crystal Point Diffraction Interferometer 1998 Summer Research Program for High School Juniors at the University of Rochester s Laboratory for Laser Energetics written by and published by . This book was released on 1999 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: Phase-shifting interferometry has many advantages, and the phase shifting nature of the Liquid Crystal Point Diffraction Interferometer (LCPDI) promises to provide significant improvement over other current OMEGA wavefront sensors. However, while phase-shifting capabilities improve its accuracy as an interferometer, phase-shifting itself introduces errors. Phase-shifting algorithms are designed to eliminate certain types of phase-shift errors, and it is important to chose an algorithm that is best suited for use with the LCPDI. Using polarization microscopy, the authors have observed a correlation between LC alignment around the microsphere and fringe behavior. After designing a procedure to compare phase-shifting algorithms, they were able to predict the accuracy of two particular algorithms through computer modeling of device-specific phase shift-errors.
Download or read book Liquid Crystal Point Diffraction Interferometer written by Carolyn Regan Mercer and published by . This book was released on 1995 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Digital Shearography written by Wolfgang Steinchen and published by SPIE-International Society for Optical Engineering. This book was released on 2003 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Steinchen and Yang, for whom credentials are not cited, present the principle and procedure of the technique and its application in nondestructive testing, strain measurement, and vibration analysis. Aiming to meet the requirements of both beginning and experienced researchers, they emphasize the quantitative evaluation of shearographic interferograms, and offer examples of applications using it in quantifying heat flow rate, and analyzing deviations. Annotation (c)2003 Book News, Inc., Portland, OR (booknews.com).
