Download or read book Growth and Analysis of Titanium Dioxide Thin Film Using Reactive Magnetron Sputtering System written by Sharifah Amirah Amir Shariffuddin and published by . This book was released on 2012 with total page 68 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Advanced Strategies in Thin Film Engineering by Magnetron Sputtering written by Alberto Palmero and published by MDPI. This book was released on 2020-12-10 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.

Download or read book Structural Changes of Titanium Dioxide Thin Films Deposited by Reactive Magnetron Sputtering through Nitrogen Incorporation written by and published by . This book was released on 2016 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Reactive Sputtering of Titanium Oxides Target Oxidation Phenomena and Thin Film Characterization written by Kenneth George Geraghty and published by . This book was released on 1974 with total page 174 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Growth and Characterization of Ito Thin Film by Magnetron Sputtering written by Öcal Tuna and published by LAP Lambert Academic Publishing. This book was released on 2010-05 with total page 100 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this study Indium Tin Oxide (ITO) thin films were grown by both DC and RF magnetron sputtering techniques. To know deposition rate of ITO, system was calibrated for both DCMS and RFMS and then ITO were grown on glass substrate with the thickness of 70 nm and 40 nm by changing substrate temperature. The effect of substrate temperature, film thickness and sputtering method on structural, electrical and optical properties were investigated. The results show that substrate temperature and film thickness substantially affects the film properties, especially crystallization and resistivity. The thin films grown at the lower than 150 oC showed amorphous structure. However, crystallization was detected with the furtherincrease of substrate temperature. Band gap of ITO was calculated to be about 3.64eV at the substrate temperature of 150 oC, and itwidened with substrate temperature increment. From electrical measurements the resistivity at room temperature was obtained 1.28x10-4 and 1.29x10-4 D-cm, for DC and RF sputtered films, respectively. We also measured temperature dependence resistivity and the Hall coefficient of the films, and we calculated carrier concentration and Hall mobility."

Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by . This book was released on 2019-09-13 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

Download or read book Optical Thin Films written by James D. Rancourt and published by SPIE Press. This book was released on 1996 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt: Practical, user-oriented reference for engineers who must incorporate and specify coatings for filters, antiglare effects, polarization, or other purposes in optical or electro-optical systems design. It focuses on preparation techniques and characteristics of commercially available products and provides information needed to determine what type of filter is needed to solve a particular problem, what its limitations are, and how to care for it.

Download or read book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films written by Polly Wanda Chu and published by . This book was released on 1994 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.

Download or read book Growth and Oxidation of Metastable Ti0 5al0 5n Thin Films Deposited by Reactive Magnetron Sputtering written by Greger Håkansson and published by . This book was released on 1989 with total page 80 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Surface Modifications and Growth of Titanium Dioxide for Photo Electrochemical Water Splitting written by John Alexander and published by Springer. This book was released on 2016-05-21 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: This outstanding thesis provides a wide-ranging overview of the growth of titanium dioxide thin films and its use in photo-electrochemicals such as water splitting. The context for water splitting is introduced with the theory of semiconductor-liquid junctions, which are dealt with in detail. In particular plasmonic enhancement of TiO2 by the addition of gold nanoparticles is considered in depth, including a thorough and critical review of the literature, which discusses the possible mechanisms that may be at work. Plasmonic enhancement is demonstrated with gold nanoparticles on Nb-doped TiO2. Finally, the use of temperature and pressure to control the phase and morphology of thin films grown by pulsed laser deposition is presented.

Download or read book Titanium Titanium Dioxide written by Reg Adams and published by . This book was released on 1984 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Oxidation of Tungsten written by Vincent David Barth and published by . This book was released on 1961 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt: The report presents a detailed review of available information on the oxidation of W and its alloys. W is relatively inert below 700 C. As the temperature is increased above this level, however, oxidation becomes progressively more rapid, reaching catastrophic rates at temperatures around 1200 C and above. Various theories for the mechanism and rates of W oxidation at different temperatures are reviewed, and the effect of pressure and water vapor on the stability of W oxides is discussed in detail. The elevatedtemperature reactions of W with other materials, such as refractory oxides, and with gases other than oxygen also are covered. Information on the protection of W by alloying and coating is included. (Author).

Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-12-31 with total page 657 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere

Download or read book Modified Reactive Sputter Deposition of Titanium Nitride Thin Films Via HiPIMS with Kick pulse and Improvement of the Structure zone Model written by Andrew J. Miceli and published by . This book was released on 2023 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Direct current (DC) and radio frequency (RF) sputtering methods have been commonplace in industry for several decades and widely studied in literature. Hard films of nitrides, such as titanium nitride (TiN), have been deposited using reactive DC sputtering onto cutting tools and medical devices extensively as well. For these applications, the films require excellent adhesion, high density, and high hardness. High-Power Impulse Magnetron Sputtering (HIPIMS) has emerged over the last several years as a method to produce films with increased density and mechanical properties. Process-structure-property relationships for reactive HIPIMS are not yet well developed. Additionally, conventional HIPIMS suffers from relatively low deposition rates, which becomes a challenge or barrier of adoption for applied TiN coatings that are typically greater than several microns in thickness. This work aims to look at increasing this deposition rate while maintaining the beneficial effects of HIPIMS by utilizing the short duration "kick-pulse" in the voltage/current cycle, leading to higher instantaneous deposition rates and increased adatom energy level. TiN films are deposited onto silicon (Si) wafers under varied reactive sputtering conditions, including DC, HIPIMS, and HIPIMS with kick-pulse. Structural characterizations are performed using scanning electron microscopy (SEM) and X-ray diffraction (XRD). Optical properties of the resulting films are also characterized using reflection UV-Vis spectroscopy. The deposition rate, morphology, and chemical composition of the films are highly affected by the processing conditions, with the kick-pulse producing significant increase in deposition rate and observed grain size. Further investigation will aim to develop a modified structural zone model to include HIPIMS with and without kick-pulse.

Download or read book Sputtered Thin Films written by Frederick Madaraka Mwema and published by CRC Press. This book was released on 2021-04-12 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sputtered Thin Films: Theory and Fractal Descriptions provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes. Part 1 of the book describes the basics and theory of thin film sputtering and fractals. Part 2 consists of examples illustrating specific descriptions of thin films using fractal methods. Discusses thin film growth, structure, and properties Covers fractal theory Presents methods of fractal measurements Offers typical examples of fractal descriptions of thin films grown via magnetron sputtering processes Describes application of fractal theory in prediction of thin film growth and properties This reference book is aimed at engineers and scientists working across a variety of disciplines including materials science and metallurgy as well as mechanical, manufacturing, electrical, and biomedical engineering.

Download or read book Photoelectrochemical Activity of Titanium Dioxide Thin Films written by Aida Mehdinezhad Roshan and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Titanium dioxide (TiO2) is considered as an oxide semiconductor with several unique properties, including environmental sensing capabilities, biocompatibility and photocurrent generation, long-term stability, cost efficiency, and chemical inertness. TiO2 thin films have a wide range of applications in dye-sensitized solar cells. TiO2 films have been deposited on two different substrates, aluminum and titanium. Two different methods used for deposition of the thin films namely: Plasma Electrolytic Oxidation (PEO) and Physical Vapor Deposition (PVD). In order to study the effect of roughness of the substrate on photocurrent generation of the deposited films, one group of substrates were "patterned" by Electrolytic Plasma Processing (EPP) prior to deposition. A "hill and valley" morphology was observed on the uppermost layer of the EPP-treated substrates. The microstructure and also roughness of the EPP-treated substrates were characterized by Scanning Electron Microscopy (SEM) and Profilometry. Similarly, the deposited TiO2 thin films were also characterized by SEM, Energy Dispersive Spectroscopy (EDS), Raman, Transmission Electron Microscopy (TEM), X-ray Diffractometry (XRD), and Profilometry. It was found that the PEO deposited film on titanium substrate was composed of anatase and the film on the aluminum substrate was amorphous. The average thickness of the PEO deposited films was about 6-10 microns. TiO2 thin films deposited by DC magnetron sputtering were found to be almost amorphous with an average thickness of 650 nm. High resolution TEM analysis showed some areas of crystallinity with a grain size of ~5 nm. Photoelectrocurrent measurements were then performed on all deposited films by a standard single-compartment, three-electrode electrochemical cell. It has been observed that the films deposited by PVD technique have a much higher quality and produce much higher photocurrent comparing to ones of PEO method.

Download or read book Titanium Dioxide written by Dongfang Yang and published by BoD – Books on Demand. This book was released on 2018-06-27 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt: Titanium dioxide is currently being used in many industrial products. It provides unique photocatalytic properties for water splitting and purification, bacterial inactivation, and organics degradation. It has also been widely used as the photoanode for dye-sensitized solar cells and coatings for self-cleaning surfaces, biomedical implants, and nanomedicine. This book covers various aspects of titanium dioxide nanomaterials including their unique one-dimensional, two-dimensional, mesoporous, and hierarchical nanostructures and their synthetic methods such as sol-gel, hydrothermal, anodic oxidation, and electrophoretic deposition, as well as its key applications in environmental and energy sectors. Through these 24 chapters written by experts from the international scientific community, readers will have access to a comprehensive overview of the recent research and development findings on the titanium dioxide nanomaterials.