Download or read book Fine Line Lithography written by R Newman and published by Elsevier. This book was released on 2012-12-02 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials Processing - Theory and Practices, Volume 1: Fine Line Lithography reviews technical information as well as the theory and practices of materials processing. It looks at very large scale integration (VLSI) technology, with emphasis on the creation of fine line patterned structures that make up the devices and interconnects of complex functional circuits. It also describes a variety of other technologies that provide finer patterns, from modified versions of optical methods to electron-optic systems, non-plus-ultra of X-ray techniques, and dry processing that uses the chemical or kinetic energies of gas molecules or ions. Organized into five chapters, this volume begins with an overview of the fundamentals of electron and X-ray lithography, with a focus on resists and the way they function, and how they are used in microfabrication. It then discusses electron scattering and its effects on resist exposure and development, electron-beam lithography equipment, X-ray lithography, and optical methods for fine line lithography. It systematically introduces the reader to electron-beam projection techniques, dry processing methods, and application of electron-beam technology to large-scale integrated circuits. Other chapters focus on contact and proximity printing, projection printing, deep-UV lithography, and shadow printing with electrons and ions. The book describes reactive plasma etching and ion beam etching before concluding with a look at factors affecting the performance of the scanning-probe type of systems. This book is a valuable resource for materials engineers and processing engineers, as well as those in the academics and industry.
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Download or read book Fundamentals of Semiconductor Processing Technology written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.
Download or read book Process and Device Simulation for MOS VLSI Circuits written by P. Antognetti and published by Springer Science & Business Media. This book was released on 1983-04-30 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the NATO Advanced Study Institute on Process and Device Simulation for MOS-VLSI Circuits, Sogesta, Urbino, Italy, July 12-23, 1982
Download or read book Photo lithography written by Georg Fritz and published by . This book was released on 1895 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microwave Applications written by Horst Groll and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 124 pages. Available in PDF, EPUB and Kindle. Book excerpt: In opto-electronics and microwave technology, new research results are translated into technological developments and applications at a breathtaking pace. This congress and trade fair, held bienniallys since 1973, covers a broad spectrum of latest advances in laser technology, opto-electronics, and for the first time, microwave technology. The fundamental physical principles are explained in basic-level seminars, panel lectures provide an overview of major spezialized fields, and the latest results are described in individual lectures. This volume deals with the 12 papers presented at the Microwave Congress.
Download or read book International Competitiveness in Electronics written by and published by . This book was released on 1983 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanostructure Science and Technology written by Richard W. Siegel and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt: Timely information on scientific and engineering developments occurring in laboratories around the world provides critical input to maintaining the economic and technological strength of the United States. Moreover, sharing this information quickly with other countries can greatly enhance the productivity of scientists and engineers. These are some of the reasons why the National Science Foundation (NSF) has been involved in funding science and technology assessments comparing the United States and foreign countries since the early 1980s. A substantial number of these studies have been conducted by the World Technology Evaluation Center (WTEC) managed by Loyola College through a cooperative agreement with NSF. The National Science and Technology Council (NSTC), Committee on Technology's Interagency Working Group on NanoScience, Engineering and Technology (CT/IWGN) worked with WTEC to develop the scope of this Nanostucture Science and Technology report in an effort to develop a baseline of understanding for how to strategically make Federal nanoscale R&D investments in the coming years. The purpose of the NSTC/WTEC activity is to assess R&D efforts in other countries in specific areas of technology, to compare these efforts and their results to U. S. research in the same areas, and to identify opportunities for international collaboration in precompetitive research. Many U. S. organizations support substantial data gathering and analysis efforts focusing on nations such as Japan. But often the results of these studies are not widely available. At the same time, government and privately sponsored studies that are in the public domain tend to be "input" studies.
Download or read book International Competitiveness in Electronics written by Congress of the U.S., Washington, DC. Office of Technology Assessment and published by DIANE Publishing. This book was released on 1983 with total page 543 pages. Available in PDF, EPUB and Kindle. Book excerpt: This assessment continues the Office of Technology Assessment's (OTA) exploration of the meaning of industrial policy in the United States context, while also examining the industrial policies of several U.S. economic rivals. The major focus is on electronics, an area which virtually defines "high technology" of the 1980's. The assessment sets the characteristics of the technology itself alongside other forces that exert major influences over international competitiveness. Specific areas addressed include: electronics technology; structure, trade, and competitiveness in the international electronics industry; quality, reliability, and automation in manufacturing; role of financing in competitiveness and electronics; human resources (education, training, management); employment effects; national industrial policies; and U.S. trade policies and their effects. The report concludes by outlining five options for a U.S. industrial policy, drawing on electronics for examples of past and prospective impacts, as well as on OTA's previous studies of the steel and automotive industries. A detailed summary and introductory comments are included. Also included in appendices are case studies in the development and marketing of electronics products, a discussion of offshore manufacturing, and a glossary of terms used in the assessment. (JN)
Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Download or read book Integrated Circuit Fabrication written by Shubham Kumar and published by CRC Press. This book was released on 2021-04-28 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers theoretical and practical aspects of all major steps in the fabrication sequence. This book can be used conveniently in a semester length course on integrated circuit fabrication. This text can also serve as a reference for practicing engineer and scientist in the semiconductor industry. IC Fabrication are ever demanding of technology in rapidly growing industry growth opportunities are numerous. A recent survey shows that integrated circuit currently outnumber humans in UK, USA, India and China. The spectacular advances in the development and application of integrated circuit technology have led to the emergence of microelectronic process engineering as an independent discipline. Integrated circuit fabrication text books typically divide the fabrication sequence into a number of unit processes that are repeated to form the integrated circuit. The effect is to give the book an analysis flavor: a number of loosely related topics each with its own background material. Note: T& F does not sell or distribute the Hardback in India, Pakistan, Nepal, Bhutan, Bangladesh and Sri Lanka.
Download or read book The Market and Beyond written by Martin Fransman and published by Cambridge University Press. This book was released on 1993-02-25 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book examines the Japanese success in technology through their Innovation System, improving products and their foresight.
Download or read book Proceedings of the Symposium on Large Area Wafer Growth and Processing for Electronic and Photonic Devices and the Twentieth State of the Art Program on Compound Semiconductors SOTAPOCS XX written by D. N. Buckley and published by The Electrochemical Society. This book was released on 1995 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Symposium on Light Emitting Devices for Optoelectronic Applications and the Twenty Eighth State of the Art Program on Compound Semiconductors written by H. Q. Hou and published by The Electrochemical Society. This book was released on 1998 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Semiconductor Microlithography VI written by Jim Dey and published by . This book was released on 1981 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin Film Diamond II written by Christopher Nebel and published by Elsevier. This book was released on 2004-04-19 with total page 411 pages. Available in PDF, EPUB and Kindle. Book excerpt: Part II reviews the state of the art of thin film diamond a very promising new semiconductor that may one day rival silicon as the material of choice for electronics. Diamond has the following important characteristics; it is resistant to radiation damage, chemically inert and biocompatible and it will become "the material" for bio-electronics, in-vivo applications, radiation detectors and high-frequency devices. Thin-Film Diamond II is the first book to summarize state of the art of CVD diamond in depth. It covers the most recent results regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices * Accessible by both experts and non-experts in the field of semi-conductors research and technology, each chapter is written in a tutorial format· * Assisting engineers to manufacture devices with optimized electronic properties· * Truly international, this volume contains chapters written by recognized experts representing academic and industrial institutions from Europe, Japan and the US
Download or read book The Grammar of Lithography written by W. D. Richmond and published by . This book was released on 1880 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: First edition published 1878. "Undoubtedly the most importanttextbook of this half-century was Richmond's Grammar which found its first readership amongst the subscribers to a lithographic trade periodical and, after republication in book form, remained in print virtually unaltered as the standard "trade" manual for the next 30 years. Richmond acknowledged the help of four luminaries of the old school, Louis Haghe, Michael Hanhart, William Simpson and Harry Sandars (i.e. W. J. Stannard), and they no doubt helped him to achieve a balanced coverage of traditional and modern workshop approaches as well as enhancing the work's authority." -Bridson/Wakeman p. 129 and D67. Bigmore & Wyman: "Up to the date of the publication of the first edition of this work there had been no hand-book in the English language of the art of lithography that was of any practical use except the English translation of the work of Senefelder himself and the translation by Hullmandel, of the work of M. Raucourt." (II, pp. 256-7) (Charles Wood 160/96).
