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Book Evaluation of Ion  and Radical induced Degradation of Ultra Low k Dielectric Films

Download or read book Evaluation of Ion and Radical induced Degradation of Ultra Low k Dielectric Films written by Mark Adam Goldman and published by . This book was released on 2008 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book JJAP

    Book Details:
  • Author :
  • Publisher :
  • Release : 2008
  • ISBN :
  • Pages : 930 pages

Download or read book JJAP written by and published by . This book was released on 2008 with total page 930 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Plasma Science and Technology

Download or read book Plasma Science and Technology written by Haikel Jelassi and published by BoD – Books on Demand. This book was released on 2019-02-27 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt: Usually called the "fourth state of matter," plasmas make up more than 99% of known material. In usual terminology, this term generally refers to partially or totally ionized gas and covers a large number of topics with very different characteristics and behaviors. Over the last few decades, the physics and engineering of plasmas was experiencing a renewed interest, essentially born of a series of important applications such as thin-layer deposition, surface treatment, isotopic separation, integrated circuit etchings, medicine, etc. Plasma Science

Book Advanced Interconnects for ULSI Technology

Download or read book Advanced Interconnects for ULSI Technology written by Mikhail Baklanov and published by John Wiley & Sons. This book was released on 2012-02-17 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.

Book Atomic Layer Deposition for Semiconductors

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Book Nuclear Science Abstracts

Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1974 with total page 648 pages. Available in PDF, EPUB and Kindle. Book excerpt: NSA is a comprehensive collection of international nuclear science and technology literature for the period 1948 through 1976, pre-dating the prestigious INIS database, which began in 1970. NSA existed as a printed product (Volumes 1-33) initially, created by DOE's predecessor, the U.S. Atomic Energy Commission (AEC). NSA includes citations to scientific and technical reports from the AEC, the U.S. Energy Research and Development Administration and its contractors, plus other agencies and international organizations, universities, and industrial and research organizations. References to books, conference proceedings, papers, patents, dissertations, engineering drawings, and journal articles from worldwide sources are also included. Abstracts and full text are provided if available.

Book Broadband Dielectric Spectroscopy

Download or read book Broadband Dielectric Spectroscopy written by William Henry Hunter Woodward and published by . This book was released on 2021 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: "This book is about Broadband Dielectric Spectroscopy as a Modern Analytical Technique"--

Book INIS Atomindeks

Download or read book INIS Atomindeks written by and published by . This book was released on 1982 with total page 1246 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Low Pressure Plasmas and Microstructuring Technology

Download or read book Low Pressure Plasmas and Microstructuring Technology written by Gerhard Franz and published by Springer Science & Business Media. This book was released on 2009-04-09 with total page 743 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].

Book Dissertation Abstracts International

Download or read book Dissertation Abstracts International written by and published by . This book was released on 2006 with total page 862 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book GaN and Related Materials

Download or read book GaN and Related Materials written by Stephen J. Pearton and published by CRC Press. This book was released on 2021-10-08 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents views on current developments in heat and mass transfer research related to the modern development of heat exchangers. Devotes special attention to the different modes of heat and mass transfer mechanisms in relation to the new development of heat exchangers design. Dedicates particular attention to the future needs and demands for further development in heat and mass transfer. GaN and related materials are attracting tremendous interest for their applications to high-density optical data storage, blue/green diode lasers and LEDs, high-temperature electronics for high-power microwave applications, electronics for aerospace and automobiles, and stable passivation films for semiconductors. In addition, there is great scientific interest in the nitrides, because they appear to form the first semiconductor system in which extended defects do not severely affect the optical properties of devices. This series provides a forum for the latest research in this rapidly-changing field, offering readers a basic understanding of new developments in recent research. Series volumes feature a balance between original theoretical and experimental research in basic physics, device physics, novel materials and quantum structures, processing, and systems.

Book Electrogenerated Chemiluminescence

Download or read book Electrogenerated Chemiluminescence written by Allen J. Bard and published by CRC Press. This book was released on 2004-07-20 with total page 674 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first source on this expanding analytical science, this reference explores advances in the instrumentation, design, and application of techniques with electrogenerated chemiluminescence (ECL), examining the use and impact of ECL-based assays in clinical diagnostics, life science research, environmental testing, food and water evaluation, and th

Book Handbook of Advanced Plasma Processing Techniques

Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Book Advanced Oxidation Processes for Water and Wastewater Treatment

Download or read book Advanced Oxidation Processes for Water and Wastewater Treatment written by Simon Parsons and published by IWA Publishing. This book was released on 2004-03-01 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt: The suitability of Advanced Oxidation Processes (AOPs) for pollutant degradation was recognised in the early 1970s and much research and development work has been undertaken to commercialise some of these processes. AOPs have shown great potential in treating pollutants at both low and high concentrations and have found applications as diverse as ground water treatment, municipal wastewater sludge destruction and VOCs control. Advanced Oxidation Processes for Water and Wastewater Treatment is an overview of the advanced oxidation processes currently used or proposed for the remediation of water, wastewater, odours and sludge. The book contains two opening chapters which present introductions to advanced oxidation processes and a background to UV photolysis, seven chapters focusing on individual advanced oxidation processes and, finally, three chapters concentrating on selected applications of advanced oxidation processes. Advanced Oxidation Processes for Water and Wastewater Treatment will be invaluable to readers interested in water and wastewater treatment processes, including professionals and suppliers, as well as students and academics studying in this area. Dr Simon Parsons is a Senior Lecturer in Water Sciences at Cranfield University with ten years' experience of industrial and academic research and development.

Book High k Gate Dielectric Materials

Download or read book High k Gate Dielectric Materials written by Niladri Pratap Maity and published by CRC Press. This book was released on 2020-12-18 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

Book Oxide Surfaces

    Book Details:
  • Author :
  • Publisher : Elsevier
  • Release : 2001-05-21
  • ISBN : 0080538312
  • Pages : 677 pages

Download or read book Oxide Surfaces written by and published by Elsevier. This book was released on 2001-05-21 with total page 677 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book is a multi-author survey (in 15 chapters) of the current state of knowledge and recent developments in our understanding of oxide surfaces. The author list includes most of the acknowledged world experts in this field. The material covered includes fundamental theory and experimental studies of the geometrical, vibrational and electronic structure of such surfaces, but with a special emphasis on the chemical properties and associated reactivity. The main focus is on metal oxides but coverage extends from 'simple' rocksalt materials such as MgO through to complex transition metal oxides with different valencies.

Book Self Healing Polymers

Download or read book Self Healing Polymers written by Wolfgang H. Binder and published by John Wiley & Sons. This book was released on 2013-03-29 with total page 638 pages. Available in PDF, EPUB and Kindle. Book excerpt: Self-healing is a well-known phenomenon in nature: a broken bone merges after some time and if skin is damaged, the wound will stop bleeding and heals again. This concept can be mimicked in order to create polymeric materials with the ability to regenerate after they have suffered degradation or wear. Already realized applications are used in aerospace engineering, and current research in this fascinating field shows how different self-healing mechanisms proven successful by nature can be adapted to produce even more versatile materials. The book combines the knowledge of an international panel of experts in the field and provides the reader with chemical and physical concepts for self-healing polymers, including aspects of biomimetic processes of healing in nature. It shows how to design self-healing polymers and explains the dynamics in these systems. Different self-healing concepts such as encapsulated systems and supramolecular systems are detailed. Chapters on analysis and friction detection in self-healing polymers and on applications round off the book.