Download or read book Dependence of Thin Gate Oxide Properties on Processing written by SK. Lai and published by . This book was released on 1983 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin-gate oxides (23 nm or less) will be very important for future very-large-scale-integration (VLSI) circuits. Oxides in this thickness range can be grown in different environments and temperatures. Breakdown, interface properties, and electron and hole trapping are affected by the growth conditions. The effect of growth and anneal temperature on insulator and interface properties will be examined. Such information is useful in optimizing process conditions for the long-term reliability of thin-gate oxides.

Download or read book Silicon Processing written by SYMPOSIUM ON SILICON PROCESSING. (1982 : SAN JOSE) AUTOR and published by ASTM International. This book was released on 1983 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book ASTM Special Technical Publication written by and published by . This book was released on 1983 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Oxide Reliability A Summary Of Silicon Oxide Wearout Breakdown And Reliability written by David J Dumin and published by World Scientific. This book was released on 2002-01-18 with total page 281 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents in summary the state of our knowledge of oxide reliability. The articles have been written by experts who are among the most knowledgeable in the field. The book will be an invaluable aid to reliability engineers and manufacturing engineers, helping them to produce and characterize reliable oxides. It can be used as an introduction for new engineers interested in oxide reliability, besides being a reference for engineers already engaged in the field.

Download or read book Process and Geometry Dependence of Thin Silicon Oxide Quality and Reliability written by Naved Husain and published by . This book was released on 1990 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Rapid Thermal Processing written by Richard B. Fair and published by Academic Press. This book was released on 2012-12-02 with total page 441 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.

Download or read book Nanocomposite Thin Films And Coatings Processing Properties And Performance written by Sam Zhang and published by World Scientific. This book was released on 2007-10-08 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials development has reached a point where it is difficult for a single material to satisfy the needs of sophisticated applications in the modern world. Nanocomposite films and coatings achieve much more than the simple addition of the constitutents — the law of summation fails to work in the nano-world. This book encompasses three major parts of the development of nanocomposite films and coatings: the first focuses on processing and properties, the second concentrates on mechanical performance, and the third deals with functional performance, including wide application areas ranging from mechanical cutting to solar energy and from electronics to medicine./a

Download or read book Science of Ceramic Chemical Processing written by Larry L. Hench and published by Wiley-Interscience. This book was released on 1986 with total page 632 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive treatment of producing ceramic, glass, and composite materials using chemistry-based processing methods. Synthesizes the most up-to-date research. Includes new areas of computer aided processing, molecular calculations of ceramic processing reactions, and chemical control of surface films. Contributions from over 115 experts in the field. Index.

Download or read book Rapid Thermal Processing of Semiconductors written by Victor E. Borisenko and published by Springer Science & Business Media. This book was released on 2013-11-22 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

Download or read book Electrical Breakdown of Thin Gate and Tunneling Oxides written by Ih-Chin Chen and published by . This book was released on 1986 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films written by Vikram J. Kapoor and published by . This book was released on 1987 with total page 570 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Symposia on Reliability of Semiconductor Devices interconnections and Dielectric Breakdown and Laser Process for Microelectronic Applications written by Electrochemical Society. Dielectric Science and Technology Division and published by The Electrochemical Society. This book was released on 1992 with total page 346 pages. Available in PDF, EPUB and Kindle. Book excerpt: Papers in this volume are from the 180th ECS Meeting, held in held in Phoenix, Arizona, Fall 1991. This symposium addresses all aspects of reliability of semiconductor devices, multilevel interconnection and dielectric breakdown in VLSI and ULSI technologies. The symposium establishes reliability from design through manufacturing. The second part of the symposium addresses laser ablation/etching, laser planarization laser/UV. CVD of metal end dielectric films, laser/UV enhanced etching and deposition processesing liquid phase, and photomodification of surfaces.

Download or read book Proceedings of the Third International Symposium on Corrosion and Reliability of Electronic Materials and Devices written by Robert B. Comizzoli and published by The Electrochemical Society. This book was released on 1994 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Publications of the National Bureau of Standards Catalog written by United States. National Bureau of Standards and published by . This book was released on 1987 with total page 404 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Rapid Thermal and Other Short time Processing Technologies II written by Dim-Lee Kwong and published by The Electrochemical Society. This book was released on 2001 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."

Download or read book Publications of the National Institute of Standards and Technology Catalog written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1988 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2000-08-09 with total page 1186 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."