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Book Characterization of Oxidation  Dry Etching and Device Performance of Monocrystalline Beta silicon Carbide Thin Films

Download or read book Characterization of Oxidation Dry Etching and Device Performance of Monocrystalline Beta silicon Carbide Thin Films written by John Williams Palmour and published by . This book was released on 1988 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Vapor Deposition  Characterization and Device Development of Monocrystalline Beta  and Alpha 6H  silicon Carbide Thin Films

Download or read book Chemical Vapor Deposition Characterization and Device Development of Monocrystalline Beta and Alpha 6H silicon Carbide Thin Films written by Hua-shuang Kong and published by . This book was released on 1988 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Epitaxial Growth  Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic Devices

Download or read book Epitaxial Growth Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic Devices written by Hyeong Joon Kim and published by . This book was released on 1985 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Epitaxial growth  doping and characterization of monocrystalline beta silicon carbide thin films and fabriation of electronic devices

Download or read book Epitaxial growth doping and characterization of monocrystalline beta silicon carbide thin films and fabriation of electronic devices written by Hyeong Joon Kim and published by . This book was released on 1986 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Proceedings

Download or read book Proceedings written by and published by . This book was released on 1991 with total page 504 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Epitaxial Growth  Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic

Download or read book Epitaxial Growth Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic written by Hyeong Joon Kim and published by . This book was released on 1985 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book The Growth and Characterization of Beta Silicon Carbide   beta  Sic  Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor

Download or read book The Growth and Characterization of Beta Silicon Carbide beta Sic Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor written by Kenneth George Irvine and published by . This book was released on 1992 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Growth and Characterization of Beta silicon Carbide Thin Films

Download or read book Growth and Characterization of Beta silicon Carbide Thin Films written by Bagher Bahavar and published by . This book was released on 1993 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Scientific and Technical Aerospace Reports

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Photoelectrochemical Etching of Beta Silicon Carbide   beta  SIC  and Its Characterization

Download or read book Photoelectrochemical Etching of Beta Silicon Carbide beta SIC and Its Characterization written by Kern Anthony Dass and published by . This book was released on 1996 with total page 196 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Fundamental Studies in Selective Wet Etching and Corrosion Processes for High performance Semiconductor Devices

Download or read book Fundamental Studies in Selective Wet Etching and Corrosion Processes for High performance Semiconductor Devices written by Nabil George Mistkawi and published by . This book was released on 2010 with total page 198 pages. Available in PDF, EPUB and Kindle. Book excerpt: As multistep, multilayer processing in semiconductor industry becomes more complex, the role of cleaning solutions and etching chemistries are becoming important in enhancing yield and in reducing defects. This thesis demonstrates successful formulations that exhibit copper and tungsten compatibility, and are capable of Inter Layer Dielectric (ILD) cleaning and selective Ti etching. The corrosion behavior of electrochemically deposited copper thin films in deaerated and non-deaerated cleaning solution containing hydrofluoric acid (HF) has been investigated. Potentiodynamic polarization experiments were carried out to determine active, active-passive, passive, and transpassive regions. Corrosion rates were calculated from tafel slopes. ICP-MS and potentiodynamic methods yielded comparable Cu dissolution rates. Interestingly, the presence of hydrogen peroxide in the cleaning solution led to more than an order of magnitude suppression of copper dissolution rate. We ascribe this phenomenon to the formation of interfacial CuO which dissolves at slower rate in dilute HF. A kinetic scheme involving cathodic reduction of oxygen and anodic oxidation of Cu0 and Cu+1 is proposed. It was determined that the reaction order kinetics is first order with respect to both HF and oxygen concentrations. The learnings from copper corrosion studies were leveraged to develop a wet etch/clean formulation for selective titanium etching. The introduction of titanium hard-mask (HM) for dual damascene patterning of copper interconnects created a unique application in selective wet etch chemistry. A formulation that addresses the selectivity requirements was not available and was developed during the course of this dissertation. This chemical formulation selectively strips Ti HM film and removes post plasma etch polymer/residue while suppressing the etch rate of tungsten, copper, silicon oxide, silicon carbide, silicon nitride, and carbon doped silicon oxide. Ti etching selectivity exceeding three orders of magnitude was realized. Surprisingly, it exploits the use of HF, a chemical well known for its SiO2 etching ability, along with a silicon precursor to protect SiO2. The ability to selectively etch the Ti HM without impacting key transistor/interconnect components has enabled advanced process technology nodes of today and beyond. This environmentally friendly formulation is now employed in production of advanced high-performance microprocessors and produced in a 3000 gallon reactor.

Book Fundamentals of Silicon Carbide Technology

Download or read book Fundamentals of Silicon Carbide Technology written by Tsunenobu Kimoto and published by John Wiley & Sons. This book was released on 2014-11-24 with total page 565 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive introduction and up-to-date reference to SiC power semiconductor devices covering topics from material properties to applications Based on a number of breakthroughs in SiC material science and fabrication technology in the 1980s and 1990s, the first SiC Schottky barrier diodes (SBDs) were released as commercial products in 2001. The SiC SBD market has grown significantly since that time, and SBDs are now used in a variety of power systems, particularly switch-mode power supplies and motor controls. SiC power MOSFETs entered commercial production in 2011, providing rugged, high-efficiency switches for high-frequency power systems. In this wide-ranging book, the authors draw on their considerable experience to present both an introduction to SiC materials, devices, and applications and an in-depth reference for scientists and engineers working in this fast-moving field. Fundamentals of Silicon Carbide Technology covers basic properties of SiC materials, processing technology, theory and analysis of practical devices, and an overview of the most important systems applications. Specifically included are: A complete discussion of SiC material properties, bulk crystal growth, epitaxial growth, device fabrication technology, and characterization techniques. Device physics and operating equations for Schottky diodes, pin diodes, JBS/MPS diodes, JFETs, MOSFETs, BJTs, IGBTs, and thyristors. A survey of power electronics applications, including switch-mode power supplies, motor drives, power converters for electric vehicles, and converters for renewable energy sources. Coverage of special applications, including microwave devices, high-temperature electronics, and rugged sensors. Fully illustrated throughout, the text is written by recognized experts with over 45 years of combined experience in SiC research and development. This book is intended for graduate students and researchers in crystal growth, material science, and semiconductor device technology. The book is also useful for design engineers, application engineers, and product managers in areas such as power supplies, converter and inverter design, electric vehicle technology, high-temperature electronics, sensors, and smart grid technology.

Book Dissertation Abstracts International

Download or read book Dissertation Abstracts International written by and published by . This book was released on 1986 with total page 714 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book International Aerospace Abstracts

Download or read book International Aerospace Abstracts written by and published by . This book was released on 1999 with total page 1020 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Electrical   Electronics Abstracts

Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 1948 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Science Abstracts

Download or read book Science Abstracts written by and published by . This book was released on 1993 with total page 2332 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ceramic Abstracts

Download or read book Ceramic Abstracts written by and published by . This book was released on 2000 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt: