Download or read book Aqueous Etching of Microfabricated and Nanofabricated Surfaces written by Rikard Anton Wind and published by . This book was released on 2003 with total page 462 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Micro and Nano Fabrication by Metal Assisted Chemical Etching written by Lucia Romano and published by MDPI. This book was released on 2021-01-13 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Download or read book Manufacturing Techniques for Microfabrication and Nanotechnology written by Marc J. Madou and published by CRC Press. This book was released on 2011-06-13 with total page 672 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed for science and engineering students, this text focuses on emerging trends in processes for fabricating MEMS and NEMS devices. The book reviews different forms of lithography, subtractive material removal processes, and additive technologies. Both top-down and bottom-up fabrication processes are exhaustively covered and the merits of the different approaches are compared. Students can use this color volume as a guide to help establish the appropriate fabrication technique for any type of micro- or nano-machine.
Download or read book Micro and Nanofabrication for Beginners written by Eiichi Kondoh and published by CRC Press. This book was released on 2022-06-13 with total page 156 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book, the fundamentals of micro- and nanofabrication are described on the basis of the concept of “using gases as a fabrication tool.” Unlike other books available on the subject, this volume assumes only entry-level mathematics, physics, and chemistry of undergraduates or high-school students in science and engineering courses. Necessary theories are plainly explained to help the reader learn about this new attractive field and enable further reading of specialized books. The book is an attractive guide for students, young engineers, and anyone getting involved in micro- and nanofabrication from various fields including physics, electronics, chemistry, and materials sciences.
Download or read book written by 崔铮 and published by . This book was released on 2005 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: Talks about the developments in micro-nanofabrication technologies. This book gives an introduction on the basics of micro-nanofabrication, including optical lithography, electron beam lithography, focused ion beam technique, X-ray lithography, various etching and replication techniques. It serves as a reference book for engineering professionals.
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2004 with total page 806 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Micro and Nano Fabrication by Metal Assisted Chemical Etching written by Lucia Romano and published by . This book was released on 2021 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates--Si, Ge, poly-Si, GaAs, and SiC--and using different catalysts--Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale--nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Download or read book The Aqueous Etching of Silicon 100 written by Ian T. Clark and published by . This book was released on 2008 with total page 125 pages. Available in PDF, EPUB and Kindle. Book excerpt: An etchant that produces atomically flat or near-atomically flat Si(100) surfaces has been long been sought by the microelectronics industry; however, no such etchant has yet been demonstrated. In the following I describe a combined spectroscopic and morphological investigation of Si(100) surfaces etched in two aqueous etchants: aqueous ammonium fluoride and pure deoxygenated water. For both of these systems, the etch morphology was determined using ex situ ultrahigh vacuum scanning tunneling microscopy. Information on the chemical nature of the surface species was obtained using Fourier transform infrared absorption spectroscopy in the multiple-internal-reflection geometry. A new deconvolution method, which is described here, was applied to the spectroscopic data to maximize the information extracted from these spectra. The spectroscopic data were used in conjunction with morphological data from STM experiments to determine the atomic-scale structure of the etched surfaces. During ammonium fluoride etching, the Si(100) surface was found to achieve a near-atomically-flat steady-state etch morphology characterized by & sim;200-A-wide terraces populated by alternating rows of unstrained silicon dihydrides within 30 sec. In contrast, during H2O etching, the surface structure was found to evolve over the course days, developing a surprisingly homogeneous 4-fold-symmetric morphology dominated by orthogonally oriented "stripes" running along & lang;011 & rang; directions, atomically flat terraces and several-monolayer-height hillocks. The atomic-scale structure of both etch morphologies is described, and the role of inter-adsorbate strain in the formation of the etch morphologies is discussed. Finally, the development of an organic functionalization chemistry suitable for use in silicon-resonator-based frequency-detected chemical sensing is described. The composition of these organic monolayers were characterized using Fourier transform infrared absorption spectroscopy, and the affect of monolayer surface termination on the mechanical properties of single-crystal-silicon micromechanical resonators was determined.
Download or read book Micro Nanofabrication written by Zheng Cui and published by Springer. This book was released on 2010-10-14 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book is a collection of the author’s years of experience and research findings, as well as the latest development, in micro-nanofabrication technologies. It gives a detailed introduction on the basics of micro-nanofabrication, including optical lithography, electron beam lithography, focused ion beam technique, X-ray lithography, various etching and replication techniques. For each of the fabrication technology it introduces, the emphasis is on clear explanation of the basic principle, the essential steps in the processes, various process conditions and typical process parameters. The advantages and disadvantages of each technique are also analysed. The applications of micro-nanofabrication technologies focus on manufacturing of very large scale integrated circuits (VLSI), nanoelectronics, optoelectronics, high density magnetic storage, micro-electro-mechanical system or MEMS, biochip or lab-on-chip and nanotechnology. Each of the applications is accompanied by practical examples to demonstrate how particular fabrication techniques are applied. There is an extensive list of references following each chapter for readers to explore further. The book is not only a good supplementary reading material for university undergraduates or postgraduates who are novices in this field, but also a good reference book for experienced engineering professionals who wish to know other fabrication techniques outside their own field.
Download or read book Nanotechnology written by Gregory L. Timp and published by Springer Science & Business Media. This book was released on 1999 with total page 730 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fields of nanotechnology and microfabrication have widespread applications in industry, especially in semiconductors and superconductors. This book is an indispensable overview of this rapidly growing field, bringing together contributions from leading scientists and engineers. It offers state-of-the-art coverage of topics ranging from single-electron transport and chaos in ballistic nanostructures, to atomic optics and superconducting physics. 260 illus.
Download or read book Recent Advances in Nanofabrication Techniques and Applications written by Bo Cui and published by BoD – Books on Demand. This book was released on 2011-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Download or read book Integrated Fabrication of Micro and Nano scale Structures for Silicon Devices Enabled by Metal assisted Chemical Etch written by Raul Marcel Lema Galindo and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon device manufacturing, at both the micro and nanoscales, is largely performed using plasma etching techniques such as Reactive Ion Etching. Deep Reactive Ion Etching (DRIE) can be used to create high-aspect ratio nanostructures in silicon. The DRIE process suffers from low throughput, only one wafer can be processed at a time; high cost, the necessary tools and facilities for implementation are expensive; and surface defects such as sidewall taper and scalloping as a consequence of the cycling process required for high-aspect-ratio manufacturing. A potential solution to these issues consists of implementing wet-etching techniques, which do not require expensive equipment and can be implemented at a batch scale. Metal Assisted Chemical Etch is a wet-etch process that uses a metal catalyst to mediate silicon oxidation and removal in a diffusion-based process. This process has been demonstrated to work for both micro and nanoscale feature manufacturing on silicon substrates. To date, however, a single study aimed at identifying experimental conditions for successful multi-scale (integrated micro- and nanoscale) manufacturing is lacking in the literature. This mixed micro-nanoscale etching process (IMN-MACE) can enable a wide variety of applications including, for example, development of point-of-care medical diagnostic devices which rely on micro- and nano-fluidic sample processing, a growing field in the area of preventive medicine. This work developed multi-scale MACE by a systematic experimental exploration of the process space. A total of 54 experiments were performed to study the effects of the following process parameters: (i) surface silicon dioxide, (ii) metal catalyst stack, (iii) etchant solution concentration, and (iv) pre-etch sample preparation. Of these 54 experiments, 18 experiments were based on exploring nanopatterning of 100nm pillars, and the remaining 36 explored the fabrication of micropillars with a diameter between 10μm and 50μm in 5μm increments. It was determined that a single catalyst stack consisting of ~3nm Ag underneath a ~15nm Au metal layer can be used to etch high quality features at both the micro and nanoscales on a silicon substrate pre-treated with hydrogen fluoride to remove the native oxide layer from the surface. Future steps for micro-nano scale integration were also proposed
Download or read book Biomolecular Patterning on Micro and Nanofabricated Surfaces for Biosensor Applications and Cell based Research written by Reid Nelson Orth and published by . This book was released on 2003 with total page 402 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this study, biomaterials are patterned at the micro- and nanometer scale for biosensor applications and cell-based research. Two enabling technologies were photoactivatable biotin and the polymer lift-off technique. Avidin-biotin complexes have been immobilized on planar silicon substrates and to the inner surfaces of capillary tubes. The latter serves as a model for patterning inside microfluidic systems. Several biomaterials have been patterned using the polymer lift-off method, including lipids, metal, microspheres, biotin, and proteins (e.g., antibodies, protein A, and NeutrAvidin). The patterned lipids formed supported lipid bilayers with diffusion coefficients comparable to cell membranes as confirmed by fluorescence recovery after photobleaching (FRP). The author's tailored patterns comprised 2, 4-dinitrophenyl (DNP) or biotin functionalized lipids with features ranging from 1.3 micrometers to 76 micrometers. Non-lipid molecules were patterned in features as small as 700 nanometers. A characterization of the surfaces has shown a highly uniform patterning. Several of these materials also were applied in patterned regions inside microtrenches. Micro- and nanometer-scale patterns of functionalized biomaterials served as spatially controlled stimuli for cell surface ligands in this research. This technology has been applied to rat basophilic leukocyte (RBL) cells, eosinophils, lymphocytes, macrophages, and fibroblasts. For RBL experiments, DNP-conjugated lipids have been incorporated in the lipid bilayers with fluorescent lipid DiIC16 and used to stimulate RBL cells sensitized with anti-DNP IgE on the Fc receptors. Receptor aggregation was observed with confocal microscopy. This technique allows researchers to study the effects of antigen density on cellular response, binding kinetics, and the redistribution after individual binding events. (1 table, 71 figures).
Download or read book Proceedings of Micro and Nanofabricated Structures and Devices for Biomedical Environmental Applications written by and published by . This book was released on 1998 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Directory of Graduate Research written by American Chemical Society. Committee on Professional Training and published by . This book was released on 2005 with total page 1932 pages. Available in PDF, EPUB and Kindle. Book excerpt: Faculties, publications and doctoral theses in departments or divisions of chemistry, chemical engineering, biochemistry and pharmaceutical and/or medicinal chemistry at universities in the United States and Canada.
Download or read book Micro and Nanofabricated Structures and Devices for Biomedical Environmental Applications II written by Society of Photo-optical Instrumentation Engineers and published by SPIE-International Society for Optical Engineering. This book was released on 1999 with total page 182 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dry Etching Technology for Semiconductors written by Kazuo Nojiri and published by Springer. This book was released on 2014-10-25 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
