Download or read book Contamination Free Manufacturing for Semiconductors and Other Precision Products written by Robert P. Donovan and published by CRC Press. This book was released on 2018-10-08 with total page 461 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments. Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)! Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products: Details the physics and chemistry behind the mechanisms leading to contamination-induced failures Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants Outlines primary contamination problems and target control levels Reveals and offers solutions to inadequate areas of measurement capability and control technology Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.
Download or read book Developments in Surface Contamination and Cleaning Volume 12 written by Rajiv Kohli and published by Elsevier. This book was released on 2019-06-08 with total page 278 pages. Available in PDF, EPUB and Kindle. Book excerpt: Developments in Surface Contamination and Cleaning: Methods for Assessment and Verification of Cleanliness of Surfaces and Characterization of Surface Contaminants, Volume Twelve, the latest release in the Developments in Surface Contamination and Cleaning series, provides best practices on determining surface cleanliness. Chapters include an introduction to the nature and size of particles, a discussion of cleanliness levels, detailed coverage of measurement methods, characterization methods and analytical methods for evaluating surfaces, and an overview of analysis methods for various contaminants. As a whole, the series creates a unique and comprehensive knowledge base for those in research and development in a variety of industries. Manufacturing, quality control and procurement specification professionals in the aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography industries will find this book to be very helpful. In addition, researchers in an academic setting will also find these volumes excellent source books. - Includes an extensive listing, with a description of available methods for the assessment of surface cleanliness - Provides a single source of information on methods for verification of surface cleanliness - Serves as a guide to the selection, assessment and verification of methods for specific applications
Download or read book NASA Technical Memorandum written by and published by . This book was released on 1978 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Semiconductor Cleaning Science and Technology 14 SCST 14 written by T. Hattori and published by The Electrochemical Society. This book was released on 2015 with total page 335 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Contamination and ESD Control in High Technology Manufacturing written by Roger W. Welker and published by John Wiley & Sons. This book was released on 2006-09-18 with total page 534 pages. Available in PDF, EPUB and Kindle. Book excerpt: A practical "how to" guide that effectively deals with the control of both contamination and ESD This book offers effective strategies and techniques for contamination and electrostatic discharge (ESD) control that can be implemented in a wide range of high-technology industries, including semiconductor, disk drive, aerospace, pharmaceutical, medical device, automobile, and food production manufacturing. The authors set forth a new and innovative methodology that can manage both contamination and ESD, often considered to be mutually exclusive challenges requiring distinct strategies. Beginning with two general chapters on the fundamentals of contamination and ESD control, the book presents a logical progression of topics that collectively build the necessary skills and knowledge: Analysis methods for solving contamination and ESD problems Building the contamination and ESD control environment, including design and construction of cleanrooms and ESD protected environments Cleaning processes and the equipment needed to support these processes Tooling design and certification Continuous monitoring Consumable supplies and packaging materials Controlling contamination and ESD originating from people Management of cleanrooms and ESD protected workplace environments Contamination and ESD Control in High-Technology Manufacturing conveys a practical, working knowledge of contamination and ESD control strategies and techniques, and it is filled with case studies that illustrate key principles and the benefits of contamination and ESD control. Moreover, its straightforward style makes the material, which integrates many disciplines of engineering and science, clear and accessible. Written by three leading industry experts, this book is an essential guide for engineers and designers across the many industries where contamination and ESD control is a concern.
Download or read book Advances in Chemical Engineering written by and published by Academic Press. This book was released on 1992-02-03 with total page 623 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in Chemical Engineering
Download or read book Particles in Gases and Liquids 2 written by K.L. Mittal and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 393 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book chronicles the proceedings of the Second Symposium on Particles in Gases and Liquids: Detection, Characterization and Control held as a part of the 20th Annual Fine Particle Society meeting in Boston, August 21-25, 1989. As this second symposium was as successful as the prior one, so we have decided to hold symposia on this topic on a regular (biennial) basis and the third symposium in this series is scheduled to be held at the 22nd Annual Meeting of the Fine Particle Society in San Jose, California, July 29-August 2, 1991. l As pointed out in the Preface to the prior volume in this series that recently there has been tremendous concern about yield losses due to unwanted particles, and these unwelcome particles can originate from a legion of sources, including process gases and liquids. Also all signals indicate that in the future manufacture of sophisticated and sensitive microelectronic components (with shrinking dimensions) and other precision parts, the need for detection, characterization, analysis and control of smaller and smaller particles will be more intensified.
Download or read book Particles in Gases and Liquids 1 written by K.L. Mittal and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book documents the proceedings of the Symposium on Particles in Fluids: Detection, Characterization and Control held as a part of the 18th Fine Particle Society meeting in Boston, August 3-7, 1987. This was the Premier symposium on this topic and the response was so good that we have decided to organize it on a biennial basis and the second symposium will be held under the rubric Particles in Gases and Liquids: Detection, Characterization and Control at the 20th Fine Particle Society meeting in Boston, August 22-26, 1989. In the modern manufacture of sophisticated and sensitive microelectronic components and other precision parts, there has been a great deal of concern about yield losses due to micrometer- and submicrometer-sized particles. These particles can originate from a number of sources including fluids, i. e. , gases and liquids used in the manufacturing process. So the detection, characterization and control or removal of these undesirable particles is of cardinal importance and this symposium was conceived and o~ganized with this in mind. The purposes of this symposium were to bring together those actively involved in all aspects of particles in fluids, to provide a forum for discussion of the latest techniques for the detection, characterization and control of particles, and to highlight areas which needed intensified R&D efforts. The printed program contained a total of 46 papers and a variety of topics dealing with various ramifications of particles in fluids were presented.
Download or read book Catalog written by Southwestern Indian Polytechnic Institute and published by . This book was released on with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Contamination Control and Cleanrooms written by Alvin Lieberman and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 419 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contamination control standards and techniques for all phases of the production of high-technology products are spelled out in this applications-orientated guide. Practical cleaning methods for products and process fluids are accompanied by tips on selecting operations based on economy and efficiency. Explanations of contaminant measurement devices cover operation, error sources and remedial methods. Engineers will find vital data on contaminant sources, as well as coverage of operations and procedures that aggravate contaminant effects.
Download or read book Developments in Surface Contamination and Cleaning Vol 2 written by Rajiv Kohli and published by William Andrew. This book was released on 2009-10-02 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: - A systems analysis approach to contamination control - Physical factors that influence the behavior of particle deposition in enclosures - An overview of current yield models and description of advanced models - Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants - In-depth coverage of ultrasonic cleaning - Contamination and cleaning issues at the nanoscale - Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. · Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination · Covers contamination and cleaning issues at the nanoscale · Includes an in-depth look at ultrasonic cleaning
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 994 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Contamination Control in the Natural Gas Industry written by Thomas H. Wines and published by Gulf Professional Publishing. This book was released on 2021-11-25 with total page 414 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contamination Control in the Natural Gas Industry delivers the separation fundamentals and technology applications utilized by natural gas producers and processors. This reference covers principles and practices for better design and operation of a wide range of media, filters and systems to remove contaminants from liquids and gases, enabling gas industry professionals to fulfill diverse fluid purification requirements. Packed to cover practical technologies, diagnostics and troubleshooting methods, this book provides gas engineers and technologists with a critical first-ever reference geared to contamination control. - Covers contamination control methods and equipment specific to the natural gas industry - Includes guidelines on fundamentals and real-world technologies used today - Gives engineers better design and operation with rating methods, standards and case histories
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