Download or read book Advanced Source Studies on Laser Produced Plasmas for EUV Lithography written by and published by . This book was released on 1995 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser-produced plasmas are source candidates for EUV lithography. The radiation angular distribution for several target materials is investigated and source debris is characterized.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Extreme ultraviolet Radiation Transport in Small Scale Length Laser produced Tin Plasmas written by Kevin Lamar Williams Sequoia and published by . This book was released on 2009 with total page 179 pages. Available in PDF, EPUB and Kindle. Book excerpt: The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) light source have focused on relatively large plasmas produced at large laser facilities. However, to develop a commercially viable light source for EUV lithography, much smaller lasers and hence much smaller plasmas must be employed. Smaller plasmas behave quite differently than large plasmas in that the temperature and density are less uniform, and lateral expansion is more important. These differences affect the energy transport and, in particular, the radiation transport. This work studies the EUV radiation transport in small scale length tin plasmas, focusing on the effects of target geometry and laser pulse duration. Both planar and spherical tin targets were irradiated with an Nd:YAG laser operating at 1.064 [Mu]m. Conversion efficiency of laser light to 13.5 nm radiation (in-band), EUV emission spectrum, two-dimensional in-band emission profile, and the plasma electron density were measured experimentally. These measurements provide insight into where the laser is absorbed, where the in-band emission is produced, and how the radiation is transmitted. The plasma evolution in these experiments were simulated with a two-dimensional radiation hydrodynamic code, while the radiation transport and atomic kinetics where modeled with a collisional radiative code. Additional experiments were conducted using planar targets where the pulse duration was varied from 0.5 ns to 16 ns to understand the effects of laser pulse duration. It was found that the optimum plasma temperature for efficient generation and transmission of in-band emission is 20 eV. This is lower than the previously reported optimum temperature of 30 eV. The use of a 1.064 [Mu]m heating laser results in overheating of the plasma in a region that is much too dense to transmit the in-band emission. This overheating is necessary for the plasma to reach the optimum temperature in the region where the density is low enough to transmit the in-band emission.
Download or read book Studies of Extreme Ultraviolet Emission from Laser Produced Plasmas as Sources for Next Generation Lithography written by and published by . This book was released on 2013 with total page 193 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Radiation Studies of the Tin doped Microscopic Droplet Laser Plasma Light Source Specific to EUV Lithography written by Chiew-Seng Koay and published by . This book was released on 2006 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the other research program, debris mitigation and debris characterization of the source are also being carried out, and promising results have been demonstrated.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by . This book was released on 2006-02-28 with total page 1094 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Advances in Laser Produced Plasmas Research written by Maricel Agop and published by MDPI. This book was released on 2021-01-21 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt: The world of laser matter interaction has known great and rapid advancements in the last few years, with a considerable increase in the number of both experimental and theoretical studies. The classical paradigm used to describe the dynamics of laser produced plasmas has been challenged by new peculiar phenomena observed experimentally, like plasma particles’ oscillations, plume splitting and self-structuring behavior during the expansion of the ejected particles. The use of multiple complementary techniques has become a requirement nowadays, as different aspects can be showcased by specific experimental approaches. To balance these non-linear effects and still remain tributary to the classical theoretical, views on laser produced plasma dynamics novel theoretical models that cover the two sides of the ablation plasma (differentiability and non-differentiability) still need to be developed. Plasma is a strongly nonlinear dynamic system, with many degrees of freedom and other symmetries, favorable for the development of ordered structures, instabilities and transitions (from ordered to chaotic states). In such contexts, we showcased research based on global and local symmetries, complexity and invariance. This special number highlighted exciting new phenomena related to laser produced plasma dynamics with the implementation of theoretical models, towards understanding the complex reality of laser matter interaction.
Download or read book Control and Stabilization of Laser Plasma Sources for EUV Lithography written by Jose A. Cunado and published by . This book was released on 2007 with total page 87 pages. Available in PDF, EPUB and Kindle. Book excerpt: The laser plasma targeting system combines optical illumination and imaging, droplet technology innovation, advanced electronics, and custom software which act in harmony to provide complete stabilization of the droplets. Thus, a stable, debris-free light source combined with suitable collection optics can provide useful EUV radiation power. Detailed description of the targeting system and the evaluation of the system will be presented.
Download or read book EUV Spectroscopic Studies of Nanosecond Laser Produced Plasmas written by and published by . This book was released on 2014 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Laser Plasma Radiation Studies for Droplet Sources in the Extreme Ultraviolet written by Reuvani D. Kamtaprasad and published by . This book was released on 2010 with total page 73 pages. Available in PDF, EPUB and Kindle. Book excerpt: The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and target configurations. This work demonstrates the generation of EUV radiation by creating laser plasmas from mass-limited targets with indium, tin, and antimony doped droplets. Spectral emission from the laser plasmas is quantified using a flat-field spectrometer. COWAN code oscillator strength predications for each of the dopants were convolved with narrow Gaussian functions creating synthetic spectra for the EUV region between 10 nm - 20 nm. A preliminary comparison was made between the theoretical spectra and experimental results. From this comparison, ion stage transitions for each of the hot dense plasmas generated were assessed.
Download or read book Spectroscopic Studies of Laser Plasmas for EUV Sources written by Simi A. George and published by . This book was released on 2007 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: With the availability of high re ectivity multilayer mirrors and zone plate lenses, the EUV region (5nm-40nm) of the electromagnetic spectrum is currently being explored for applications of nanoscale printing and imaging. Advances made in this area have consequences for many areas of science. Research for producing a compact, bright EUV source for laboratory use has gained momentum in recent years. For this study, EUV radiation is produced by irradiating target materials using a focused laser beam. Focused laser beam ionizes the target to create a hot, dense, pulsed plasma source, where emission is a result of the relaxation of excited levels. Spectroscopy is used as the main diagnostic to obtain the spectral signature of the plasma. Spectral characteristics are used to deduce the physical state of plasma, thus enabling the tuning of laser irradiance conditions to maximize the needed emission bandwidth. Various target materials are studied, as well as di erent target geometries, with spectroscopy below 200 nm on pulsed micro-plasmas being a particularly daunting task. Total range spectroscopy from 1 nm to greater than 1 micron is completed for tin-doped spherical droplet plasma source. Reliable plasma diagnostics require both accurate measurements and solid theoretical support in order to interpret the experimental results. Using existing 1D-hydrocode, temperature and density characteristics of the expanding plasma is simulated for any set of experimental conditions. Existing atomic codes written for calculating one-electron radial wavefunctions with LS-coupling scheme via Hartree-Fock method is used in order to gain details of the ion stages, populations, transitions, etc, contributing to the spectral data.
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Download or read book Modern Methods in Collisional Radiative Modeling of Plasmas written by Yuri Ralchenko and published by Springer. This book was released on 2016-02-25 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a compact yet comprehensive overview of recent developments in collisional-radiative (CR) modeling of laboratory and astrophysical plasmas. It describes advances across the entire field, from basic considerations of model completeness to validation and verification of CR models to calculation of plasma kinetic characteristics and spectra in diverse plasmas. Various approaches to CR modeling are presented, together with numerous examples of applications. A number of important topics, such as atomic models for CR modeling, atomic data and its availability and quality, radiation transport, non-Maxwellian effects on plasma emission, ionization potential lowering, and verification and validation of CR models, are thoroughly addressed. Strong emphasis is placed on the most recent developments in the field, such as XFEL spectroscopy. Written by leading international research scientists from a number of key laboratories, the book offers a timely summary of the most recent progress in this area. It will be a useful and practical guide for students and experienced researchers working in plasma spectroscopy, spectra simulations, and related fields.
Download or read book Debris Characterization and Mitigation of Droplet Laser Plasma Sources for EUV Lithography written by Kazutoshi Takenoshita and published by . This book was released on 2006 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt: The design of a the laser plasma EUVL light source consists of a plasma produced from a high-intensity focused laser beam from a solid/liquid target, from which radiation is generated and collected by a large solid angle mirror or array of mirrors. The collector mirrors have the same reflectivity characteristics as the stepper mirrors. The EUVL light source is considered as the combination of both the hot-dense plasma and the collector mirrors.
Download or read book High Power Gas Discharge and Laser Plasma Based EUV Sources written by Frank Flohrer and published by . This book was released on 2002 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this paper we discuss new results from investigations on high power EUV sources for micro-lithography based on gas discharge produced plasmas and laser produced plasmas. The EUV development is performed at XTREME technologies OmbH, a joint venture of Lambda Physik AG, Gottingen, and Jenoptik LOS GmbH, Jena. For gas discharge EUV sources we report data based on Xenon filled Z-pinches. Prototypes of the EUV source achieve an EUV output power of 10 W in-band in continuous operation. Repetition rates of 1 kHz are possible with liquid cooling of the discharge head. The spectral distribution of the EUV radiation shows a maximum around 13.5 nm and matches the reflection characteristics of silicon/molybdenum multilayer mirrors. Conversion efficiencies between 0.25% and 0.7% into a solid angle of 2 pi sr were achieved with the Z-pinch source depending the discharge geometry. The total EUV average power in the spectral range between 5 nm and 50 nm is about 200 W in 1.8 sr. Pulse energy stability data show standard deviation between 1 - 4%. Spatial and temporal emission characteristics of the discharge source in dependence on the discharge geometry are discussed. The laser plasma investigations are performed with an experimental setup consisting of a diode pumped laser system coupled to a liquid jet target. Since the conversion efficiency into EUV-power depends critically on the emitter density in the interaction region, we use a Xenon-jet, which is cryogenically liquefied and injected under high pressure into the vacuum vessel. Thus the laser is impinging on a target of solid-state density, which allows the generation of EUV-radiation with high conversion efficiencies of 0.5% into a solid angle of 2 pi sr.
Download or read book Chemistry and Lithography written by Uzodinma Okoroanyanwu and published by SPIE Press. This book was released on 2011-03-08 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
