Download or read book Silicon Processing written by SYMPOSIUM ON SILICON PROCESSING. (1982 : SAN JOSE) AUTOR and published by ASTM International. This book was released on 1983 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book ASTM Special Technical Publication written by and published by . This book was released on 1983 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Very Large Scale Integration VLSI written by D.F. Barbe and published by Springer Science & Business Media. This book was released on 2013-04-17 with total page 291 pages. Available in PDF, EPUB and Kindle. Book excerpt: Even elementary school students of today know that electronics can do fan tastic things. Electronic calculators make arithmetic easy. An electronic box connected to your TV set provides a wonderful array of games. Electron ic boxes can translate languages! Electronics has even changed watches from a pair of hands to a set of digits. Integrated circuit (IC) chips which use transistors to store information in binary form and perform bin ary arithmetic make all of this possible. In just a short twenty years the field of integrated circuits has progressed from a few transistors per chip to thousands of transistors per chip. Since the early 1960's, the field has progressed from chips containing several transistors performing simple functions such as OR and AND functions to chips presently available which contain thousands of transistors performing a wide range of memory, control and arithmetic functions. The number of special journal issues, conferences, workshops, seminars, etc. related to the field of IC's is large. l~hile no single volume could adequately summarize the field, this volume attempts to provide a summary of some of the important issues and factors for Very Large Scale Integra tion (VLSI) from the perspective of several authors deeply involved in the field. In the field of VLSI, composed of many facets and disciplines, the de mand for engineers, physicists and chemists trained in IC skills exceeds supply.
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Download or read book Plasma Processing for VLSI written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.
Download or read book Fundamentals of Semiconductor Processing Technology written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.
Download or read book Advances in FDTD Computational Electrodynamics written by Allen Taflove and published by Artech House. This book was released on 2013 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in photonics and nanotechnology have the potential to revolutionize humanitys ability to communicate and compute. To pursue these advances, it is mandatory to understand and properly model interactions of light with materials such as silicon and gold at the nanoscale, i.e., the span of a few tens of atoms laid side by side. These interactions are governed by the fundamental Maxwells equations of classical electrodynamics, supplemented by quantum electrodynamics. This book presents the current state-of-the-art in formulating and implementing computational models of these interactions. Maxwells equations are solved using the finite-difference time-domain (FDTD) technique, pioneered by the senior editor, whose prior Artech House books in this area are among the top ten most-cited in the history of engineering. This cutting-edge resource helps readers understand the latest developments in computational modeling of nanoscale optical microscopy and microchip lithography, as well as nanoscale plasmonics and biophotonics.
Download or read book VLSI Electronics written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: VLSI Electronics: Microstructure Science, Volume 5 considers trends for the future of very large scale integration (VLSI) electronics and the scientific base that supports its development. This book discusses the automation for VLSI manufacture, silicon material properties for VLSI circuitry, and high-performance computer packaging and thin-film multichip module. The nanometer-scale fabrication techniques, high-density CCD memories, and solid-state infrared imaging are also elaborated. This text likewise covers the impact of microelectronics upon radar systems and quantum-mechanical limitations on device performance. This volume is a good source for scientists and engineers who wish to become familiar with VLSI electronics, device designers concerned with the fundamental character of and limitations to device performance, systems architects who will be charged with tying VLSI circuits together, and engineers conducting work on the utilization of VLSI circuits in specific areas of application.
Download or read book 1995 International Symposium on VLSI Technology Systems and Applications written by and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1995 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Download or read book Micro Optics written by H. P. Herzig and published by CRC Press. This book was released on 1997-04-26 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text examines the technology behind the plethora of modern industrial and domestic technologies which incorporate micro-optics eg. CDs, cameras, automated manufacturing systems, mobile communications etc. It includes a simple but comprehensive introduction to micro-optical developments design, and an overview of fabrication and replication technology. The theoretical, practical and industrial developments in micro-scale optoelectronics continue apace in the late 1990s. In this book, a distinguished group of physicists and engineers describe the current state of research and applications in micro-optics. It provides the theoretical background and an overview of current technology, with several chapters taking a deeper look at specific recent applications and future trends. The book concentrates on diffractive and refractive micro- optical elements, such as lenses, fan-out gratings, optimized phase elements and polarisers. Sections are included on the simulation and optimization of design for micro-optics and subsequently the efficient transformation from design to real optical elements, using techniques such as e-beam writing, laser beam writing, lithography, etching and thin film deposition.
Download or read book IETE Technical Review written by and published by . This book was released on 1986 with total page 678 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Semiconductor Silicon 1981 written by Howard R. Huff and published by . This book was released on 1981 with total page 1076 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book VLSI Technology and Design written by Otto G. Folberth and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1984 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Neural Computation written by Emile Fiesler and published by CRC Press. This book was released on 2020-01-15 with total page 1129 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Neural Computation is a practical, hands-on guide to the design and implementation of neural networks used by scientists and engineers to tackle difficult and/or time-consuming problems. The handbook bridges an information pathway between scientists and engineers in different disciplines who apply neural networks to similar probl
Download or read book VLSI and Hardware Implementations using Modern Machine Learning Methods written by Sandeep Saini and published by CRC Press. This book was released on 2021-12-31 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: Machine learning is a potential solution to resolve bottleneck issues in VLSI via optimizing tasks in the design process. This book aims to provide the latest machine-learning–based methods, algorithms, architectures, and frameworks designed for VLSI design. The focus is on digital, analog, and mixed-signal design techniques, device modeling, physical design, hardware implementation, testability, reconfigurable design, synthesis and verification, and related areas. Chapters include case studies as well as novel research ideas in the given field. Overall, the book provides practical implementations of VLSI design, IC design, and hardware realization using machine learning techniques. Features: Provides the details of state-of-the-art machine learning methods used in VLSI design Discusses hardware implementation and device modeling pertaining to machine learning algorithms Explores machine learning for various VLSI architectures and reconfigurable computing Illustrates the latest techniques for device size and feature optimization Highlights the latest case studies and reviews of the methods used for hardware implementation This book is aimed at researchers, professionals, and graduate students in VLSI, machine learning, electrical and electronic engineering, computer engineering, and hardware systems.
Download or read book Selected Papers on Resolution Enhancement Techniques in Optical Lithography written by F. M. Schellenberg and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 910 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical lithography for integrated circuits is undergoing a renaissance with the adoption of Resolution Enhancement Technology (RET). Some RET concepts have become routine in manufacturing. This volume gathers together seminal RET papers.
