Download or read book A Method for Atomic Layer Deposition of Complex Oxide Thin Films written by Brian Robert Beatty and published by . This book was released on 2013 with total page 174 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advanced technologies derive many of their capabilities from the advanced materials that they are made from. Complex oxides are a class of materials which are driving technological advancement in a host of di erent directions. These highly functional materials have a great variety of useful properties, which can be chosen and even engineered. Advanced materials require advanced deposition methods. Atomic layer deposition (ALD), a variant of chemical vapor deposition (CVD), is gaining more use in industry for its ability to provide ultra-high lm thickness resolution (down to 0.1 nm), capability to conformally coat three-dimensional structures, and its high uniformity across large surface areas. Additionally, ALD processes provide a possibility to improve economic and environmental viability of the process as compared to CVD by using and wasting less toxic reactants and expelling fewer nano-particulate byproducts. ALD processes are highly mature for many binary oxides commonly used in the semiconductor industries, however processes for depositing heavy metal oxides and complex oxides - oxides containing two or more separate metallic cations - are sorely lacking in literature. The primary focus of this work is the development of a process for depositing the complex perovskite oxide lead titanate (PbTiO3), an end group of the lead zirconate titanate family (PbZrxTi1-xO3), which has valuable technical applications as well as serves as a template for applying this research into other material systems. The author gratefully acknowledges the Army Research O ce (ARO) for their support of this project under the funding provided by Grant # W911NF-08-1-0067.
Download or read book Atomic Layer Deposition Applications 5 written by S. de Gendt and published by The Electrochemical Society. This book was released on 2009-09 with total page 425 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic Layer Deposition can enable precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties for a wide range of applications.
Download or read book Advanced Nano Deposition Methods written by Yuan Lin and published by John Wiley & Sons. This book was released on 2016-08-29 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.
Download or read book Atomic Layer Deposition ALD written by Jeannie Valdez and published by . This book was released on 2015 with total page 183 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.
Download or read book ATOMIC CONSTRUCTION OF OXIDE THIN FILMS BY LASER MOLECULAR BEAM EPITAXY written by Qingyu Lei and published by . This book was released on 2016 with total page 115 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advancements in nanoscale engineering of oxide interfaces and heterostructures have led to discoveries of emergent phenomena and new artificial materials. Reactive molecular-beam epitaxy (MBE) and pulsed-laser deposition (PLD) are the two most successful growth techniques for epitaxial heterostructures of complex oxides. PLD possesses experimental simplicity, low cost, and versatility in the materials to be deposited. Reactive MBE employing alternately-shuttered elemental sources (atomic layer-by-layer MBE, or ALL-MBE) can control the cation stoichiometry precisely, thus producing oxide thin films of exceptional quality. There are, however, major drawbacks to the two techniques. Reactive MBE is limited to source elements whose vapor pressure is sufficiently high; this eliminates a large fraction of 4- and 5-d metals. In addition, the need for ozone to maintain low-pressure MBE conditions increases system complexity in comparison to conventional PLD. On the other hand, conventional PLD using a compound target often results in cation off-stoichiometry in the films. This thesis presents an approach that combines the strengths of reactive MBE and PLD: atomic layer-by-layer laser MBE (ALL-Laser MBE) using separate oxide targets. Ablating alternately the targets of constituent oxides, for example SrO and TiO2, a SrTiO3 film can be grown one atomic layer at a time. Stoichiometry for both the cations and oxygen in the oxide films can be controlled. Using Sr1+xTi1-xO3, CaMnO3, BaTiO3 and Ruddlesden-Popper phase Lan+1NinO3n+1 (n = 4) as examples, the technique is demonstrated to be effective in producing oxide films with stoichiometric and crystalline perfection. By growing LaAl1+yO3 films of different stoichiometry on TiO2-terminated SrTiO3 substrate at high oxygen pressure, it is shown that the behavior of the two-dimensional electron gas at the LaAlO3/SrTiO3 interface can be quantitatively explained by the polar catastrophe mechanism.
Download or read book Chemical Vapor Deposition for Nanotechnology written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2019-01-10 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Download or read book Atomic Layer Deposition written by Tommi Kääriäinen and published by John Wiley & Sons. This book was released on 2013-05-28 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Download or read book Atomic Layer Deposition in Energy Conversion Applications written by Julien Bachmann and published by John Wiley & Sons. This book was released on 2017-03-15 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
Download or read book Atomic Layer Deposition Applications 6 written by J. W. Elam and published by The Electrochemical Society. This book was released on 2010-10 with total page 469 pages. Available in PDF, EPUB and Kindle. Book excerpt: The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.
Download or read book Atomic Layer Deposition of Metal Oxide Thin Films written by Dennis Michael Hausmann and published by . This book was released on 2002 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Organometallic Chemistry written by Nathan J Patmore and published by Royal Society of Chemistry. This book was released on 2018-11-16 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.
Download or read book Epitaxial Growth of Complex Metal Oxides written by Gertjan Koster and published by Woodhead Publishing. This book was released on 2022-04-22 with total page 534 pages. Available in PDF, EPUB and Kindle. Book excerpt: Epitaxial Growth of Complex Metal Oxides, Second Edition reviews techniques and recent developments in the fabrication quality of complex metal oxides, which are facilitating advances in electronic, magnetic and optical applications. Sections review the key techniques involved in the epitaxial growth of complex metal oxides and explore the effects of strain and stoichiometry on crystal structure and related properties in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films, including optoelectronics, batteries, spintronics and neuromorphic applications. This new edition has been fully updated, with brand new chapters on topics such as atomic layer deposition, interfaces, STEM-EELs, and the epitaxial growth of multiferroics, ferroelectrics and nanocomposites. Examines the techniques used in epitaxial thin film growth for complex oxides, including atomic layer deposition, sputtering techniques, molecular beam epitaxy, and chemical solution deposition techniques Reviews materials design strategies and materials property analysis methods, including the impacts of defects, strain, interfaces and stoichiometry Describes key applications of epitaxially grown metal oxides, including optoelectronics, batteries, spintronics and neuromorphic applications
Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Download or read book Epitaxial and Lateral Solid phase Crystallization of Complex Oxides written by Yajin Chen and published by . This book was released on 2019 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: The crystallization of complex-oxide materials through a transformation from the amorphous to crystalline forms presents a range of new opportunities to synthesize new materials, and simultaneously poses important scientific challenges. New crystallization method complements more conventional vapor-phase epitaxy techniques for epitaxial complex-oxide thin film growth that involve long-range surface diffusion on 2D planar crystal surfaces. The vapor-phase techniques are not readily adaptable to creating nanoscale epitaxial complex-oxide crystals. The alternative synthesis method described in this thesis is solid-phase crystallization, which is the crystallization of amorphous oxides, often in the form of thin films, by post-deposition heating. The creation of epitaxial complex-oxide nanostructures can facilitate their integration in 3D electronic, optoelectronic and ionic devices. Epitaxial complex-oxide crystals in intricate geometries can be created by solid-phase crystallization employing patterned substrates with a distribution of isolated crystalline seeds. This method requires the study of distinct crystal growth and nucleation kinetics on epitaxial and non-epitaxial surfaces. Nanoscale seeded crystallization can be achieved by understanding the relative rates of nucleation and lateral crystal growth processes, and the role of seeds in determining the overall orientation of the resulting crystals. Epitaxial complex-oxide thin films in intricate geometries with an expanded range of compositions can be created by combining the use of atomic layer deposition (ALD) and solid-phase crystallization, with the development of new ALD procedures to deposit amorphous oxide films and the study of the subsequent crystallization processes to select the crystalline structures of the crystallized film. ALD itself allows for the conformal deposition of thin films over non-planar surfaces. Solid-phase crystallization can also be used to deposit epitaxial complex-oxide thin films with a wider range of compositions, including those that cannot be deposited from the vapor phase at high temperatures. Such oxides include the oxides that have complex compositions and volatile components. The different kinetic constraints of solid-phase crystallization allow the epitaxial growth of those oxide thin films because of the slow diffusion in the solid state at relatively low crystallization temperatures. This thesis describes the discovery that, at low crystallization temperatures, epitaxial crystal growth of the model perovskite SrTiO3 on single-crystal SrTiO3 propagates over long distances without nucleation of SrTiO3 on Si with a native oxide. Two kinds of isolated nanoscale seed crystals are employed to study the seeded lateral crystallization of SrTiO3, yielding highly similar results. Micron-scale crystalline regions form surrounding the seeds before encountering separately nucleated crystals away from the seeds. Seed crystals play an important role in determining the orientations of the resulting crystals. New chemical precursors and ALD procedures were developed to grow amorphous PrAlO3 films. An epitaxial [lowercase gamma]-Al2O3 layer formed at the interface between the PrAlO3 film and (001) SrTiO3 substrate during the deposition. Epitaxial PrAlO3 films were achieved on (001) [lowercase gamma]-Al2O3/SrTiO3 by solid-phase epitaxy. The study of SrTiO3 and PrAlO[3] is also applicable to a series of chemically and structurally similar functional ABO3 compounds. The concepts of solid-phase crystallization also apply to oxides with multiple metal ions and more complex crystal structure. The kinetic processes occurring during the crystallization of ScAlMgO4, on (0001) sapphire substrates are quite different at two different temperatures. Epitaxial ScAlMgO4 crystals grow through the film thickness at a crystallization temperature of 950 °C. Solid-state reaction and evaporation of the component Sc prohibits the formation of large ScAlMgO4 crystals at a crystallization temperature of 1400 °C. Low-temperature crystallization can be used to create epitaxial oxide thin films with complex compositions and volatile components.
Download or read book Atomic Layer Deposition and Characterization of Metal Oxide Thin Films written by Ali Mahmoodinezhad and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Metal Oxide Based Thin Film Structures written by Nini Pryds and published by Elsevier. This book was released on 2017-09-07 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike
