Download or read book High Density Plasma Sources written by Oleg A. Popov and published by . This book was released on 1995 with total page 445 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing.
Download or read book High Density Plasma Sources written by Oleg A. Popov and published by Elsevier. This book was released on 1996-12-31 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 343 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. - Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed - Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils - Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology - Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination
Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Download or read book Encyclopedia of Plasma Technology Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 2883 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Download or read book High Density Helicon Plasma Science written by Shunjiro Shinohara and published by Springer Nature. This book was released on 2023-02-03 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book highlights a high-density helicon plasma source produced by radio frequency excitation in the presence of magnetic fields, which has attracted considerable attention thanks to its wide applicability in various fields, from basic science to industrial use. Presenting specific applications such as plasma thrusters, nuclear fusion, and plasma processing, it offers a review of modern helicon plasma science for a broad readership. The book covers a wide range of topics, including the fundamental physics of helicon plasma and their cutting-edge applications, based on his abundant and broad experience from low to high temperature plasmas, using various linear magnetized machines and nuclear fusion ones such as tokamaks and reversed field pinches. It first provides a brief overview of the field and a crash course on the fundamentals of plasma, including miscellaneous diagnostics, for advanced undergraduate and early graduate students in plasma science, and presents the basics of helicon plasma for beginners in the field. Further, digesting advanced application topics is also useful for experts to have a quick overview of extensive helicon plasma science research.
Download or read book Frontiers in High Energy Density Physics written by National Research Council and published by National Academies Press. This book was released on 2003-05-11 with total page 177 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent scientific and technical advances have made it possible to create matter in the laboratory under conditions relevant to astrophysical systems such as supernovae and black holes. These advances will also benefit inertial confinement fusion research and the nation's nuclear weapon's program. The report describes the major research facilities on which such high energy density conditions can be achieved and lists a number of key scientific questions about high energy density physics that can be addressed by this research. Several recommendations are presented that would facilitate the development of a comprehensive strategy for realizing these research opportunities.
Download or read book Plasma Science written by National Research Council and published by National Academies Press. This book was released on 2008-01-20 with total page 281 pages. Available in PDF, EPUB and Kindle. Book excerpt: As part of its current physics decadal survey, Physics 2010, the NRC was asked by the DOE, NSF, and NASA to carry out an assessment of and outlook for the broad field of plasma science and engineering over the next several years. The study was to focus on progress in plasma research, identify the most compelling new scientific opportunities, evaluate prospects for broader application of plasmas, and offer guidance to realize these opportunities. The study paid particular attention to these last two points. This "demand-side" perspective provided a clear look at what plasma research can do to help achieve national goals of fusion energy, economic competitiveness, and nuclear weapons stockpile stewardship. The report provides an examination of the broad themes that frame plasma research: low-temperature plasma science and engineering; plasma physics at high energy density; plasma science of magnetic fusion; space and astrophysical science; and basic plasma science. Within those themes, the report offers a bold vision for future developments in plasma science.
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes
Download or read book Plasma Processing of Semiconductors written by P.F. Williams and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Download or read book Plasma Etching Processes for Sub quarter Micron Devices written by G. S. Mathad and published by The Electrochemical Society. This book was released on 2000 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultra thin Chip Technology and Applications written by Joachim Burghartz and published by Springer Science & Business Media. This book was released on 2010-11-18 with total page 471 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ultra-thin chips are the "smart skin" of a conventional silicon chip. This book shows how very thin and flexible chips can be fabricated and used in many new applications in microelectronics, Microsystems, biomedical and other fields. It provides a comprehensive reference to the fabrication technology, post processing, characterization and the applications of ultra-thin chips.
Download or read book Advanced Technologies Based on Wave and Beam Generated Plasmas written by H. Schlüter and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 580 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas
Download or read book Microwave Plasma Sources and Methods in Processing Technology written by Hana Barankova and published by John Wiley & Sons. This book was released on 2022-01-31 with total page 208 pages. Available in PDF, EPUB and Kindle. Book excerpt: A practical introduction to microwave plasma for processing applications at a variety of pressures In Microwave Plasma Sources and Methods in Processing Technology, the authors deliver a comprehensive introduction to microwaves and microwave-generated plasmas. Ideal for anyone interested in non-thermal gas discharge plasmas and their applications, the book includes detailed descriptions, explanations, and practical guidance for the study and use of microwave power, microwave components, plasma, and plasma generation. This reference includes over 130 full-color diagrams to illustrate the concepts discussed within. The distinguished authors discuss the plasmas generated at different levels of power, as well as their applications at reduced, atmospheric and higher pressures. They also describe plasmas inside liquids and plasma interactions with combustion flames. Microwave Plasma Sources and Methods in Processing Technology concludes with an incisive exploration of new trends in the study and application of microwave discharges, offering promising new areas of study. The book also includes: • A thorough introduction to the basic principles of microwave techniques and power systems, including a history of the technology, microwave generators, waveguides, and wave propagation • A comprehensive exploration of the fundamentals of the physics of gas discharge plasmas, including plasma generation, Townsend coefficients, and the Paschen curve • Practical discussions of the interaction between plasmas and solid surfaces and gases, including PVD, PE CVD, oxidation, sputtering, evaporation, dry etching, surface activation, and cleaning • In-depth examinations of microwave plasma systems for plasma processing at varied parameters Perfect for researchers and engineers in the microwave community, as well as those who work with plasma applications, Microwave Plasma Sources and Methods in Processing Technology will also earn a place in the libraries of graduate and PhD students studying engineering physics, microwave engineering, and plasmas.
Download or read book Novel Materials Processing by Advanced Electromagnetic Energy Sources written by S. Miyake and published by Elsevier. This book was released on 2005-11-21 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the International Symposium in Novel Materials Processing by Advanced Electromagnetic Energy Sources (MAPEES'04)*Identifies and details recent progress achieved by advanced electromagnetic energy sources in materials processing.*Explores novel approaches to advanced electromagnetic energy processing of materials in an attempt to discover new and unique industrial fields.
Download or read book Silicon Nitride Silicon Dioxide Thin Insulating Films and Other Emerging Diele c trics VIII written by Ram Ekwal Sah and published by The Electrochemical Society. This book was released on 2005 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Physics and Technology of Ion Sources written by Ian G. Brown and published by John Wiley & Sons. This book was released on 2004-10-15 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: Das bekannte Handbuch der Ionenquellen - jetzt in neuer, aktualisierter Auflage! Neben den Grundlagen (Plasmaphysik, Strahltransport, computergestützte Modellierung) wird eine Vielzahl von Ionenquellen für spezielle Anwendungen detailreich vorgestellt. Ein praxistaugliches Nachschlagewerk für Plasmaphysiker und alle, die Ionenquellen für analytische Zwecke nutzen.
