Download or read book A Fundamental Study of Feature Evolution During High Density Plasma Etching written by Jennifer Marie Lane and published by . This book was released on 1999 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Feature Profile Evolution During the High Density Plasma Etching of Polysilicon written by Arpan Pravin Mahorowala and published by . This book was released on 1998 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Etching written by M. Sugawara and published by OUP Oxford. This book was released on 1998-05-28 with total page 362 pages. Available in PDF, EPUB and Kindle. Book excerpt: The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Download or read book Feature Profile Evolution in Plasma Processing Using On wafer Monitoring System written by Seiji Samukawa and published by Springer Science & Business Media. This book was released on 2014-01-28 with total page 46 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
Download or read book NATO Advanced Study Institute on Plasma Processing of Semiconductors written by and published by . This book was released on 1997 with total page 32 pages. Available in PDF, EPUB and Kindle. Book excerpt: Partial contents: Introduction to Plasma Etching; Plasma Chemistry, Basic Processes and PECVD; The Role of ions in Reactive Ion Etching with Low Density Plasmas; SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas; Introduction to Plasma Enhanced Chemical Vapor Deposition; Topography Evolution During Semiconductor Processing; Deposition of Amorphous Silicon; High Density Sources for Plasma Etching; Resonant Plasma Excitation by Electron Cyclotron Waves-Fundamentals and Applications; The Transition from Capacitive to Inductive to Wave Sustained Discharges.
Download or read book Characterization and Modeling of Pattern Dependencies and Time Evolution in Plasma Etching written by Ali Farahanchi and published by . This book was released on 2009 with total page 43 pages. Available in PDF, EPUB and Kindle. Book excerpt: A quantitative model capturing pattern dependent effects and time evolution of the etch rate in Deep Reactive Ion Etching (DRIE) is presented. DRIE is a key process for pattern formation in semiconductor fabrication. Non-uniformities are caused due to microloading and aspect ratio dependencies. The etch rate varies over time and lateral etch consumes some of the etching species. This thesis contributes a physical analysis for capturing and modeling microloading, aspect ratio dependencies, effects of lateral etch and time evolution of the etch rate. This methodology is applied to the study of etching variation on silicon wafers; the integrated model is able to predict pattern density and feature size dependent non-uniformities in trench depth and time evolution of the etch rate. Previous studies of variation in plasma etching have characterized microloading and aspect ratio dependent etching (ARDE) as distinct constant causes for etch non-uniformity. In contrast to these previous works, we present here a time-based methodology for vertical and lateral etch.
Download or read book Plasma Processing XIV written by G. S. Mathad and published by . This book was released on 2002 with total page 342 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Development of Silicon chlorine Plasma Etching System for Fundamental Studies on Shape Evolution written by Jee-Loon Look and published by . This book was released on 1988 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Technology Computer Aided Design for Si SiGe and GaAs Integrated Circuits written by G.A. Armstrong and published by IET. This book was released on 2007-11-30 with total page 457 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first book to deal with a broad spectrum of process and device design, and modeling issues related to semiconductor devices, bridging the gap between device modelling and process design using TCAD. Presents a comprehensive perspective of emerging fields and covers topics ranging from materials to fabrication, devices, modelling and applications. Aimed at research-and-development engineers and scientists involved in microelectronics technology and device design via Technology CAD, and TCAD engineers and developers.
Download or read book The Role of Ions in Charging Damage During High Density Plasma Etching written by Tsitsi Grace Madziwa-Nussinov and published by . This book was released on 2003 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High Density Helicon Plasma Science written by Shunjiro Shinohara and published by Springer Nature. This book was released on 2023-02-03 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book highlights a high-density helicon plasma source produced by radio frequency excitation in the presence of magnetic fields, which has attracted considerable attention thanks to its wide applicability in various fields, from basic science to industrial use. Presenting specific applications such as plasma thrusters, nuclear fusion, and plasma processing, it offers a review of modern helicon plasma science for a broad readership. The book covers a wide range of topics, including the fundamental physics of helicon plasma and their cutting-edge applications, based on his abundant and broad experience from low to high temperature plasmas, using various linear magnetized machines and nuclear fusion ones such as tokamaks and reversed field pinches. It first provides a brief overview of the field and a crash course on the fundamentals of plasma, including miscellaneous diagnostics, for advanced undergraduate and early graduate students in plasma science, and presents the basics of helicon plasma for beginners in the field. Further, digesting advanced application topics is also useful for experts to have a quick overview of extensive helicon plasma science research.
Download or read book Surface Evolution During Integrated Circuit Processing written by Michael Andrew Vyvoda and published by . This book was released on 1999 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings written by Toshio Goto and published by . This book was released on 2001 with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Processing of Materials written by National Research Council and published by National Academies Press. This book was released on 1991-02-01 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Download or read book Japanese Journal of Applied Physics written by and published by . This book was released on 2007 with total page 1286 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Journal of the Electrochemical Society written by and published by . This book was released on 2003 with total page 982 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2006 with total page 764 pages. Available in PDF, EPUB and Kindle. Book excerpt:
