Download or read book SEMI Technical Programs Present Workshop on Contamination in Liquid Chemical Distribution Systems written by Semiconductor Equipment and Materials International and published by . This book was released on 1999-07-01 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Workshop on Contamination in Liquid Chemical Distribution Systems written by and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book SEMI Technical Programs Present Workshop on Contamination in Liquid Chemical Distribution Systems written by and published by . This book was released on 1996 with total page 38 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book SEMI Technical Programs Present Workshop on Contamination in Liquid Chemical Distribution Systems written by and published by . This book was released on 1997 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Mechanical Polishing in Silicon Processing written by and published by Academic Press. This book was released on 1999-10-29 with total page 325 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.

Download or read book Plasma Source Mass Spectrometry written by J Grenville Holland and published by Royal Society of Chemistry. This book was released on 2007-10-31 with total page 367 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic spectrometry has exciting new bio-analytical horizons open to it, principally through the developments in the capabilities of ICP-MS coupled with the inventiveness of experimentalists. This is reflected in the use of the technique for ion-, capillary electrophoresis-, liquid- and gas-chromatographic separation in biological applications, as reported in this book. Traditional (environmental, semiconductor, geological and clinical) applications are also well represented. In addition, recent and future developments in sample introduction devices, multicollector sector, reaction cells and collision cells instruments, as well as co-existence, divergence and potential convergence of atomic and biomolecular mass spectrometries are discussed. Reflecting the current state of practical ICP-MS and drawing together the latest developments in the field, Plasma Source Mass Spectrometry: Current Trends and Future Developments is ideal for university researchers and laboratory practitioners. It will be of interest to all those involved in the development and application of this technique.

Download or read book Chemical Mechanical Planarization in IC Device Manufacturing III written by Robert Leon Opila and published by The Electrochemical Society. This book was released on 2000 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains the proceedings of the third international symposium on Chemical Mechanical Planarization integrated circuit device manufacturing held at the 196th Meeting of the Electrochemical Society in Honolulu, Hawaii. ( October 20 -22 1999).

Download or read book Particles on Surfaces Five and Six written by Kashmiri Lal Mittal and published by VSP. This book was released on 1999-09 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume documents the Proceedings of the 5th and 6th Symposia on Particles on Surfaces: Detection, Adhesion and Removal, held under the aegis of the Fine Particle Society in Chicago (May 6--9, 1996) and Dallas (April 1--3, 1998), respectively. The technical programs clearly reflected an interest and need to ameliorate the existing methods and to devise new and more efficient ways to detect, analyze and characterize particles on surfaces. The removal of particles from a host of surfaces was especially highlighted; the need to remove smaller and smaller particles was particularly underscored. All manuscripts included in this volume were properly peer reviewed and all were revised before inclusion in this volume. Thus, this book is not a mere collection of unreviewed papers, but represents information that has passed peer scrutiny. Furthermore, the authors of the 5th Symposium were asked to update the information. So, the information presented in this book should be as fresh and up-to-date as possible. This volume is divided into two parts: Part 1. General Papers and Part 2. Particle Adhesion and Removal. The topics covered include: high-sensitivity rapid detection of particles; detection of particles using evanescent wave scattering; particles on the backside of wafers; particle shedding from fluid-handling components; dynamics of particle adhesion; particle dispersion/aggregation; precision cleaning; and particle removal by surfactants, supercritical fluids, hydrodynamic forces, high-speed droplet impinging, megasonic, CO2 blasting, CO2 snow, argon aerosol, lasers, microcluster beams, brush and chemical-mechanical methods. This volume offers bountiful information and represent a current commentary on the R&D activity taking place in the area of particles on surfaces, particularly particle removal from a variety of surfaces.

Download or read book Chemical Mechanical Planarization VI written by Sudipta Seal and published by The Electrochemical Society. This book was released on 2003 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 1720 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Download or read book Proceedings of International Symposium on Electrical Insulating Materials written by and published by . This book was released on 2001 with total page 990 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Microelectronic Applications of Chemical Mechanical Planarization written by Yuzhuo Li and published by John Wiley & Sons. This book was released on 2008 with total page 734 pages. Available in PDF, EPUB and Kindle. Book excerpt: An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: Provides in-depth coverage of a wide range of state-of-the-art technologies and applications Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.

Download or read book Directory of Published Proceedings written by and published by . This book was released on 2002 with total page 470 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Symposium on Electrical Insulating Materials written by and published by . This book was released on 2001 with total page 994 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Technology Transfer Seminar workshop on the Application of Pollution Abatement Technology to Local Governments written by James W. Stinson and published by . This book was released on 1975 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Identifying Future Drinking Water Contaminants written by National Research Council and published by National Academies Press. This book was released on 1999-09-30 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: With an increasing population, use of new and diverse chemicals that can enter the water supply, and emergence of new microbial pathogens, the U.S. federal government is faced with a regulatory dilemma: Where should it focus its attention and limited resources to ensure safe drinking water supplies for the future? Identifying Future Drinking Water Contaminants is based on a 1998 workshop on emerging drinking water contaminants. It includes a dozen papers that were presented on new and emerging microbiological and chemical drinking water contaminants, associated analytical and water treatment methods for their detection and removal, and existing and proposed environmental databases to assist in their proactive identification and regulation. The papers are preceded by a conceptual approach and related recommendations to EPA for the periodic creation of future Drinking Water Contaminant Candidate Lists (CCLsâ€"produced every five yearsâ€"include currently unregulated chemical and microbiological substances that are known or anticipated to occur in public water systems and that may pose health risks).

Download or read book Index of Conference Proceedings written by British Library. Document Supply Centre and published by . This book was released on 2003 with total page 870 pages. Available in PDF, EPUB and Kindle. Book excerpt: