Download or read book Vector Modeling of Photolithography for VLSI Semiconductor Manufacturing written by Kevin D. Lucas and published by . This book was released on 1995 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "Extensions to an existing two dimensional (2D) rigorous optical lithography model for metrology and alignment are presented. New applications are shown for the existing model's numerical engine, the efficient waveguide method which solves Maxwell's equations in the spatial frequency domain. Using these extensions we have created a vector 2D photolithography simulator which incorporates non-planar photomasks, non-vertically travelling light, high numerical (NA) aperture projection lenses, extended light sources, time dependent bleaching of positive photoresists and non-planar substrate structures. The simulator, Metropole, runs on common engineering workstation platforms and is shown in multiple studies to be flexible, accurate and faster than other models. Also presented is a new model for three dimensional (3D) photolithography simulation based upon a unique vector potential waveguide method formulation. This is a rigorous 3D spatial frequency solution electromagnetic model. We have completed the 3D formulation, and implemented it into a computer simulation program, Metropole-3D, for the modeling of photomasks in VLSI semiconductor manufacturing. Examples are given in which the model is shown to be flexible and accurate. Run time and memory usage are given to highlight the program's usability on desktop workstations."
Download or read book Three Dimensional Modeling of Photolithography Process in VLSI Manufacturing written by Zhengrong Zhu and published by . This book was released on 2004 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microelectronic Manufacturing Yield Reliability and Failure Analysis written by and published by . This book was released on 1997 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamentals of Semiconductor Manufacturing and Process Control written by Gary S. May and published by John Wiley & Sons. This book was released on 2006-05-26 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Download or read book Optical Microlithography written by and published by . This book was released on 1998 with total page 1118 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Microlithography XI written by Luc Van den Hove and published by SPIE-International Society for Optical Engineering. This book was released on 1998 with total page 1114 pages. Available in PDF, EPUB and Kindle. Book excerpt: A study of optical microlithography. It contains papers on subjects such as phase-shifting masks, CD control scanners, process optimization, and advanced masks.
Download or read book Optimization Techniques for VLSI Process Modeling and TCAD in Semiconductor Manufacturing written by Luigi Capodieci and published by . This book was released on 1997 with total page 380 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Download or read book A New Vector 2D Photolithography Simulation Tool written by Kevin D. Lucas and published by . This book was released on 1992 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "A new vector optical lithography simulator, METROPOLE, is presented. Rigorous simulations run quickly on a workstation for complex 2D regular and phase shifting masks, substrate bleaching, optical metrology and alignment problems. An analysis of a novel phase shifting technique is undertaken to highlight the usefulness of the program."
Download or read book IEICE Transactions on Electronics written by and published by . This book was released on 1999 with total page 1116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Microlithography XVII written by and published by . This book was released on 2004 with total page 718 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Computational Lithography written by Xu Ma and published by John Wiley & Sons. This book was released on 2011-01-06 with total page 221 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Download or read book Modeling and Defect Analysis of Step and Flash Imprint Lithography and Photolithography written by Siddharth Chauhan and published by . This book was released on 2010 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: In 1960's Gordon Moore predicted that the increase in the number of components in integrated circuits would exponentially decrease the relative manufacturing cost per component with time. The semiconductor industry has managed to keep that pace for nearly 45 years and one of the main contributors to this phenomenal improvement in technology is advancement in the field of lithography. However, the technical challenges ahead are severe and the future roadmap laid by the International Technology Roadmap for Semiconductors looks mostly red (i.e. no solution has been found to specific problem). There are efforts in the industry and academia directed toward development of newer, alternative lithographic techniques. Step and Flash Imprint Lithography (SFIL) has recently emerged as one of the most promising alternatives, capable of producing high resolution patterns. While it has numerous advantages over conventional photolithography, several engineering challenges must be overcome to eliminate defects due to the nature of contact imprinting if SFIL is to be a viable alternative technique for manufacturing tomorrow's integrated circuits. The complete filling of template features is vital in order for the SFIL imprint process to truly replicate the template features. The feature filling phenomena for SFIL was analyzed by studying diffusion of a gas, entrapped in the features, through liquid imprint resist. A simulation of the dynamics of feature filling for different pattern configurations and process conditions during the SFIL imprint step is presented. Simulations show that initial filling is pressure-controlled and very rapid; while the rest of the feature filling is diffusion-controlled, but fast enough that diffusion of entrapped gas is not a cause for non-filling of features. A theory describing pinning of an air-liquid interface at the feature edge of a template during the SFIL imprint step was developed, which shows that pinning is the main cause of non-filling of features. Pinning occurs when the pressure at the air-liquid interface reaches the pressure of the bulk liquid. At this condition, there is no pressure gradient or driving force to move the liquid and fill the feature. The effect of several parameters on pinning was examined. A SFIL process window was established and template modifications are proposed that minimize the pinning at the feature edge while still preventing any extrusion along the mesa (pattern containing area on the template) edge. Part of semiconductor manufacturing community believes that optical lithography has the capability to drive this industry further and is committed to the continuous improvement of current optical patterning approaches. Some of the major challenges with shrinking critical dimensions (CDs) in coming years are the control of line-edge roughness (LER) and other related defects. The current CDs are such that the presence or absence of even a single polymer molecule can have a considerable impact on LER. Therefore molecular level understanding of each step in the patterning process is required. Computer simulations are a cost-effective approach to explore the huge process space. Mesoscale modeling is one promising approach to simulations because it captures the stochastic phenomena at a molecular level within reasonable computational time. The modeling and simulation of the post-exposure bake (PEB) and the photoresist dissolution steps are presented. The new simulator enables efficient exploration of the statistical excursions that lead to LER and the formation of insoluble residues during the dissolution process. The relative contributions of the PEB and the dissolution step to the LER have also been examined in the low/high frequency domain. The simulations were also used to assess the commonly proposed measures to reduce LER. The goal of the work was to achieve quantification of the effect of changes in resist composition, developer concentration, and process variables on LER and the associated defectivity.
Download or read book A New Vector Model for Photoresist Bleaching in Optical Lithography written by Kevin D. Lucas and published by . This book was released on 1992 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "This paper describes a two-dimensional model for photoresist bleaching in optical lithography. The bleaching model incoporates an existing imaging simulator, METRO, with the vector waveguide method to calculate the electric field amplitudes within arbitrary structures upon a substrate being exposed by actinic light. Dill's model for positive photoresists is used to determine the changing photoactive compound concentrations within photoresist throughout the exposure. The resulting bleaching model comes considerably closer than current models to satisfying the simulation needs of process engineers."
Download or read book Dissertation Abstracts International written by and published by . This book was released on 1995 with total page 796 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2003 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Rigorous and Practical Vector Model for Phase Shifting Masks in Optical Lithography written by Kevin D. Lucas and published by . This book was released on 1992 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "A new vector (true two-dimensional) optical lithography modeling program, METROPOLE, is presented which incorporates arbitrary mask geometries. This rigorous model is thus ideally suited for the simulation of phase shifting masks. The efficiency of the electric field calculations, both within the mask and on the substrate structures, allows its use on accessible engineering workstations. Several simulation examples are presented, and include the new phase shifting on the substrate technique (POST)."
