Download or read book Vapor Deposited Titanium Dioxide Thin Films written by Eugene T. Fitzgibbons and published by . This book was released on 1970 with total page 141 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films of TiO2 are grown in a low temperature (150C) vapor deposition process by hydrolyzing tetraisopropyl titanate at the substrate. These films can be made uniform over a 1-1/4 in substrate to within 100 A and are found to be amorphous in the 'as grown' condition. Films in the amorphous state have an index of refraction of 2.0 and can be etched easily (50 A/sec) in 0.5% HF. Annealing in air at 350C converts the film to the anatase tetragonal crystalline form and at 700C to a mixture of anatase and rutile. Both forms are quite etch resistant, but the anatase can be etched by HF and warm H2SO4. At 1000C, the film is completely rutile with an index of refraction of 2.5. This form is extremely etch resistant even in 120C H2SO4 (1000 A/hour). The conversion from amorphous to rutile is accompanied by a thickness decrease of 36%. (Author).

Download or read book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films written by David Christopher Gilmer and published by . This book was released on 1998 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Vapor Deposited Titanium Dioxide Thin Films written by D. R. Chick and published by . This book was released on 1970 with total page 141 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films written by Polly Wanda Chu and published by . This book was released on 1994 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.

Download or read book Low Pressure Metal Organic Chemical Vapor Deposition of Titanium Dioxide Thin Films in Conjunction with Photocatalytic Investigations written by Abon Jason Manuel del Rosario and published by . This book was released on 2003 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Photocatalytically Active and Optically Transparent Titanium Dioxide Thin Films Prepared by Ion Assisted Physical Vapor Deposition written by Redouan Boughaled el Lakhmissi and published by . This book was released on 2013 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book An Examination of Precursor Chemistry and Its Effect on Microstructure Development in Chemical Vapor Deposition of Titanium Dioxide and Aluminum Thin Films written by Charles John Taylor and published by . This book was released on 1999 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Thin Film Titanium Dioxide by Chemical Vapor Deposition written by Dale Ralph Harbison and published by . This book was released on 1969 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Titanium Dioxide TiO2 Thin Film Deposition by Using Chemical vapor Deposition CVD Technique written by and published by . This book was released on 2014 with total page 49 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Metalorganic Chemical Vapour Deposited Titanium Dioxide Thin Films written by Ispran S. Kandasamy and published by . This book was released on 1988 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Enhanced Chemical Vapor Deposition of Titanium Oxide Thin Films for Dielectric Applicaitons written by Wenli Yang and published by . This book was released on 2006 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Photoelectrochemical Activity of Titanium Dioxide Thin Films written by Aida Mehdinezhad Roshan and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Titanium dioxide (TiO2) is considered as an oxide semiconductor with several unique properties, including environmental sensing capabilities, biocompatibility and photocurrent generation, long-term stability, cost efficiency, and chemical inertness. TiO2 thin films have a wide range of applications in dye-sensitized solar cells. TiO2 films have been deposited on two different substrates, aluminum and titanium. Two different methods used for deposition of the thin films namely: Plasma Electrolytic Oxidation (PEO) and Physical Vapor Deposition (PVD). In order to study the effect of roughness of the substrate on photocurrent generation of the deposited films, one group of substrates were "patterned" by Electrolytic Plasma Processing (EPP) prior to deposition. A "hill and valley" morphology was observed on the uppermost layer of the EPP-treated substrates. The microstructure and also roughness of the EPP-treated substrates were characterized by Scanning Electron Microscopy (SEM) and Profilometry. Similarly, the deposited TiO2 thin films were also characterized by SEM, Energy Dispersive Spectroscopy (EDS), Raman, Transmission Electron Microscopy (TEM), X-ray Diffractometry (XRD), and Profilometry. It was found that the PEO deposited film on titanium substrate was composed of anatase and the film on the aluminum substrate was amorphous. The average thickness of the PEO deposited films was about 6-10 microns. TiO2 thin films deposited by DC magnetron sputtering were found to be almost amorphous with an average thickness of 650 nm. High resolution TEM analysis showed some areas of crystallinity with a grain size of ~5 nm. Photoelectrocurrent measurements were then performed on all deposited films by a standard single-compartment, three-electrode electrochemical cell. It has been observed that the films deposited by PVD technique have a much higher quality and produce much higher photocurrent comparing to ones of PEO method.

Download or read book Metalorganic Chemical Vapor Deposition of Titanium Oxide Thin Films at Atmospheric Pressure with Analysis Via X ray Photoelectron Spectroscopy written by Anuj K. Basil and published by . This book was released on 2005 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atmospheric Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Titanium Nitride and Titanium Dioxide Thin Films written by Sarah R. Kurtz and published by . This book was released on 1985 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition of Metal Oxide Titanium Nitride and Niobium Nitride Thin Films written by Xinye Liu and published by . This book was released on 1999 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition of TiO2 Thin Films written by Qingming Zhang and published by . This book was released on 1993 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electric Field Assisted Chemical Vapour Deposition Processes on Titanium Dioxide Thin Films for Photocatalysis written by Luz Romero and published by . This book was released on 2014 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: