Download or read book Use of low energy ion implantation for achieving ultra shallow junctions written by Akif Sultan and published by . This book was released on 1996 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optimization of ultra shallow junctions formed by low energy ion implantation written by Mark James Craig and published by . This book was released on 1995 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Implantation Technology 92 written by D.F. Downey and published by Elsevier. This book was released on 2012-12-02 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
Download or read book Ion Beam Processing of Materials and Deposition Processes of Protective Coatings written by P.L.F. Hemment and published by Newnes. This book was released on 2012-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
Download or read book ULSI Process Integration II written by Cor L. Claeys and published by The Electrochemical Society. This book was released on 2001 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Solid State Microelectronics Technology written by Sunipa Roy and published by Bentham Science Publishers. This book was released on 2023-06-30 with total page 407 pages. Available in PDF, EPUB and Kindle. Book excerpt: Solid State & Microelectronics Technology is a comprehensive textbook designed for courses in solid state device physics as part of electronics / electrical engineering and IT courses. The book has two main objectives aimed at students and the future engineer: 1) to deliver knowledge of quantum physics and 2) to familiarize them with modern device types and fabrication processes. The breadth of subjects covered in the book serves a useful integrative function in combining fundamental science with applications. Recent developments are illustrated thoughtfully to encourage the reader to adopt this field as their research area. Key features - Adopts a twin approach to learning about solid state devices by blending information about fundamental science with the latest fabrication technology - Covers topics recently introduced into current curricula to cater to the demands of modern engineering - Provides foundational information on quantum physics, semiconductors and electronics - Provides details about advanced devices such as BiCMOS, MESFET and FinFet devices - Encourages readers to pursue further research with detailed illustrations and references
Download or read book Rapid Thermal and Other Short time Processing Technologies II written by Dim-Lee Kwong and published by The Electrochemical Society. This book was released on 2001 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Download or read book Ultra shallow Junction Fabrication Using Plasma Immersion Ion Implantation and Epitaxial CoSi2 as a Dopant Source written by Erin Catherine Jones and published by . This book was released on 1996 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Silicon Devices and Process Integration written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2009-01-09 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author’s industrial and academic lecture notes and reflects years of experience in the development of silicon devices. Features include: A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon; State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS; CMOS-only applications, such as subthreshold current and parasitic latch-up; Advanced Enabling processes and process integration. This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science.
Download or read book Advanced Short time Thermal Processing for Si based CMOS Devices 2 written by Mehmet C. Öztürk and published by The Electrochemical Society. This book was released on 2004 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Implantation Technology written by Edmund G. Seebauer and published by American Institute of Physics. This book was released on 2008-12-11 with total page 582 pages. Available in PDF, EPUB and Kindle. Book excerpt: The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).
Download or read book Ultra shallow Junction Fabrication Using Recoil Implantation written by Henley Liu and published by . This book was released on 1999 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characteristics and Applications of Boron written by Chatchawal Wongchoosuk and published by BoD – Books on Demand. This book was released on 2022-10-26 with total page 229 pages. Available in PDF, EPUB and Kindle. Book excerpt: Boron is a chemical element with three valence electrons for forming covalent bonds, resulting in many compounds. Doping/integration of boron atoms into other atoms provides new wonder materials with unique physical, chemical, and electrical properties. This book provides an overview of the research and developments of boron-based materials such as boron nitride, boron clusters, boron doping, boron compounds, and so on. Chapters cover all aspects of boron-based materials including theoretical backgrounds of structure and properties, computer simulation, synthesis techniques, device fabrication, characterizations, and current state-of-the-art applications.
Download or read book ULSI Process Integration III written by Electrochemical Society. Meeting and published by The Electrochemical Society. This book was released on 2003 with total page 620 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamentals of Radiation Chemistry written by A. Mozumder and published by Elsevier. This book was released on 1999-08-16 with total page 409 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the physical and chemical effects of radiation interaction with matter. Beginning with the physical basis for the absorption of charged particle radiations, Fundamentals of Radiation Chemistry provides a systematic account of the formation of products, including the nature and properties of intermediate species. Developed from first principles, the coverage of fundamentals and applications will appeal to an interdisciplinary audience of radiation physicists and radiation biologists. Only an undergraduate background in chemistry and physics is assumed as a prerequisite for the understanding of applications in research and industry. - Provides a working knowledge of radiation effects for students and non-experts - Stresses the role of the electron both as a radiation and as a reactant species - Contains clear diagrams of track models - Includes a chapter on applications - Written by an expert with more than thirty years of experience in a premiere research laboratory - Culled from the author's painstaking research of journals and other publications over several decades
Download or read book Crystalline Silicon written by Sukumar Basu and published by BoD – Books on Demand. This book was released on 2011-07-27 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt: The exciting world of crystalline silicon is the source of the spectacular advancement of discrete electronic devices and solar cells. The exploitation of ever changing properties of crystalline silicon with dimensional transformation may indicate more innovative silicon based technologies in near future. For example, the discovery of nanocrystalline silicon has largely overcome the obstacles of using silicon as optoelectronic material. The further research and development is necessary to find out the treasures hidden within this material. The book presents different forms of silicon material, their preparation and properties. The modern techniques to study the surface and interface defect states, dislocations, and so on, in different crystalline forms have been highlighted in this book. This book presents basic and applied aspects of different crystalline forms of silicon in wide range of information from materials to devices.
Download or read book ULSI Process Integration 7 written by C. Claeys and published by The Electrochemical Society. This book was released on 2011 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt:
