Download or read book Ultraviolet nanoimprint lithography using flexible molds Process development and applications written by Namil Koo and published by . This book was released on 2012 with total page 113 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Micro Nanolithography written by Jagannathan Thirumalai and published by BoD – Books on Demand. This book was released on 2018-05-02 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.
Download or read book Ultraviolet Nanoimprint Lithography written by Elisabeth Lausecker and published by Sudwestdeutscher Verlag Fur Hochschulschriften AG. This book was released on 2012 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint lithography (NIL) is a lithographic technique that allows the patterning of substrates with nanostructures over large areas with high density. NIL relies on the simplicity of mechanically deforming a polymeric resist layer by a patterned mold. The author gives a detailed introduction to NIL and developed ultraviolet NIL for the pit-patterning of substrate surfaces. By combining the self-assembled growth of silicon-germanium (SiGe) islands by molecular-beam epitaxy with the pit-patterning of the Si substrate, an ordering of the islands is achieved. Both, a position-control of the SiGe islands and an improvement of their homogeneity and emission efficiency is accomplished. Moreover, the work towards integrating these ordered SiGe islands into a two-dimensional photonic crystal slab was pursued, demanding a second imprinted layer precisely aligned to the first one. Finally, self-aligned imprint lithography was developed at Princeton University, USA, for the fabrication of the first top-gate amorphous Si thin-film transistor. The book contains detailed descriptions of executed process steps.
Download or read book Self aligned Integrated Nanostructures Fabricated by UV nanoimprint Lithography written by Praveen Joseph and published by . This book was released on 2017 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fabricating large-area multilevel integrated nanostructures and 3D nanoshapes are of tremendous importance for applications in the fields of nanoelectronics, nanophotonics, semiconductor memory, biosensors, and high density displays. As the dimensions of such nanostructures are driven-down by design, in order to drive-up the performance of the overall device, we run into challenges such as nanoscale overlay and level-to-level alignment during the lithography process. State-of-the-art nanolithography tools can achieve a certain level of nanoscale overlay with their optical and thermo-mechanical mechanisms. But these tools are expensive and they have a limit to the best possible nanoscale overlay achievable. In particular, if integrated nanostructures are needed on a large area such as an entire wafer (without having to step-and-repeat), or on non-conventional substrates such as flexible substrates, nanoscale alignment cannot be achieved using these tools. Jet and Flash Imprint Lithography (J-FIL) is a high-throughput, inexpensive, mechanical nanopatterning technique that uses a mold or imprint template to create nanostructures by causing a polymer resist to flow into its etched shapes by capillary action. The imprint template is typically fabricated using available lithography techniques and hence there is a limitation on the achievable nanoscale overlay. In this research, methods are developed to fabricate large-area, multilevel nanostructures and 3D nanoshapes on nanoimprint templates without the need for level-to-level alignment and nanoscale overlay. These nanoimprint templates are essential to explore large-area multilevel integrated nanostructures and 3D nanoshapes by J-FIL replication. The general methodology for fabrication of multilevel nanoimprint templates relies on a combination of nanoscale lithography, atomic layer deposition’s (ALD) atomic precision, and choice of highly etch selective materials, to ensure precise self-alignment of multiple levels in the nanoscale. Such templates fabricated in this work are named self-aligned multilevel templates (SAMTs). Five specific self-aligned multilevel fabrication techniques have been demonstrated that result in symmetric multilevel structures, bilaterally symmetric multilevel structures, nanotube structures, asymmetric multilevel structures, and asymmetric sloped structures on SAMTs. When used in conjunction with a nanoimprint lithography process, the SAMTs can enable high-throughput patterning of various nanoelectronic and nanophotonic devices using a single patterning step with perfect alignment and overlay. SAMTs further enable large area patterning, such as wafer-scale patterning and roll-to-roll patterning on flexible substrates, without compromising perfect overlay.
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 770 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Download or read book Comprehensive Nanoscience and Nanotechnology written by and published by Academic Press. This book was released on 2019-01-02 with total page 1881 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive Nanoscience and Technology, Second Edition, Five Volume Set allows researchers to navigate a very diverse, interdisciplinary and rapidly-changing field with up-to-date, comprehensive and authoritative coverage of every aspect of modern nanoscience and nanotechnology. Presents new chapters on the latest developments in the field Covers topics not discussed to this degree of detail in other works, such as biological devices and applications of nanotechnology Compiled and written by top international authorities in the field
Download or read book Nanostructured Surfaces Using Thermal Nanoimprint Lithography written by Bhargav Pradip Nabar and published by . This book was released on 2014 with total page 175 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint lighography (NIL) is emerging as a viable contender for fabrication of large-scale arrays of 5-500 nm features. The work presented in this dissertation aims to leverage the advantages of NIL for realization of novel Nano Electro Mechanical Systems (NEMS). The first application is a nanoporous membrane blood oxygenator system. A fabrication process for realization of thin nanoporous membranes using thermal nanoimprint lithography is presented. Suspended silicon nitried membranes were fabricated by Lowe-Pressure Chemical Vapor Deposition (LPCVD) in conjunction with a potassium hydroxide-based bulk michromachining process. Nanoscale features were imprinted into a commercially available thermoplastic polymer resist using a prefabricated silicon mold. The pattern was reversed and transferred to a thin aluminum oxide layer by means of a novel two stage lift-off technique. The pattern aluminum oxide was used as an etch mask in a CHF3/He based reactive ion etch process to transfer the pattern to silicon nitride. Highly directional etch profiles with near vertical sidewalls and excellent Si3N4/Al2O3 etch selectivity was observed. One-micrometer-thick porous membranes with varying dimensions of 250x250 um2 to 450x450 um2 and pore diameter of 400 nm have been engineered and evaluated. Results indicate that the membranes have consistent nanopore dimensions and precisely define porosity, which makes them ideal as gas exchange interfaces in blood oxygenation systems as well as other applications such as dialysis. Additionally, bulk - micromachined microfluidic channels have been developed for uniform, laminar blood flow with minimal cell trauma. NIL has been used for ordered growith of crystalline nanostructures for sensing and energy harvesting. Highly ordered arrays of crystalline ZnO nanorods have been fabricated using a polymer template patterned by thermal nanoimprint lithography, in conjuction iwth a low temperature hydrothermal growth process. Zinc Oxide nanorods were characterized to determine their piezoelectric response to an applied force. An atomic force microscope operating in the force spectroscopymode was used to apply forces in the nN range. In contrast to previously published reports using lateral tip motion (C-AFM), the action of the tip in our experiment was perpendicular to the plane of the nanorods, allowing a more defined tip-nanorod interaction. Voltage pulses of a positive polarity with amplitude ranging from hundreds of uV to few mV were observed. The tip - nanorod interaction was modeled using commercial soid modeling software and was simulated using finite element analysis. Comparison of the results yielded useful observations for design of piezoelectric energy harvesters/sensors suing ZnO nanorods. A nanoelectromechanical (NEMS) piezoelectric energy harvester suing crystalline ZnO nanowires developed. The device converst ambient vibrations into usable electrical energy for low power sensor applications. This is accomplished by mechanical excitation of an ordered ZnO nanorod array using a suspended buld micromachined proof mass. The device is capable of generating up to 14.2 mV single polarity voltage under an input vibration of amplitude 1 g (9.8 m/s2) at a frequency of 1.10 KHz. Finally, large area arrays of ordered ZnO piezoelectric nanorods are developed on flexible substrates towards self-powered sensing skin for robots. The sensor array is designed to measure tactile pressure in the 10 kPa - 200 kPa range with 1 mm spatial resolution. A voltage signal in the range of few mV is observed in response to applied pressure. This work represents the first demonstration of perfectly oredered, vertically aligned, crystalline ZnO nanorod arrays, fabricated in polyimides to ensure conformity to non-planar surfaces such as a robot's. The sensors are self-packaged using a flexible substrate and a superstate. in addition to the novelty of the sensor structure itself, the work includes an innovative low-temperature hydrothermal ZnO growth process compatible with the temperature restrictions imposed by the polyimide substrate/superstrate.
Download or read book Nanoimprint Lithography Technology and Applications written by Michael Mühlberger and published by Mdpi AG. This book was released on 2022-07-13 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting.
Download or read book Lithography written by Michael Wang and published by BoD – Books on Demand. This book was released on 2010-02-01 with total page 680 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
Download or read book Hot Embossing written by Matthias Worgull and published by William Andrew. This book was released on 2009-09-28 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is an overview of replication technology for micro- and nanostructures, focusing on the techniques and technology of hot embossing, a scaleable and multi-purpose technology for the manufacture of devices such as BioMEMS and microfluidic devices which are expected to revolutionize a wide range of medical and industrial processes over the coming decade.The hot embossing process for replicating microstructures was developed by the Forschungszentrum Karlsruhe (Karlsruhe Institute of Technology) where the author is head of the Nanoreplication Group. Worgull fills a gap in existing information by fully detailing the technology and techniques of hot embossing. He also covers nanoimprinting, a process related to hot embossing, with examples of actual research topics and new applications in nanoreplication. A practical and theoretical guide to selecting the materials, machinery and processes involved in microreplication using hot embossing techniques Compares different replication processes such as: micro injection molding, micro thermoforming, micro hot embossing, and nanoimprinting Details commercially available hot embossing machinery and components like tools and mold inserts
Download or read book Evaluation of Processes in Nanoimprint Lithography written by Santosh Pabba and published by . This book was released on 2005 with total page 96 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint lithography which uses stamping, molding and casting to reproduce nanometer scale features from a mold, is showing great promise in being able to pattern a wider range of materials, at much lower cost, with greatly simplified use, with far fewer defects and with a resolution far below the optical diffraction limit. Key to achieving the ultimate resolution and accuracy limits of imprint lithography is the ability to fabricate molds to extremely fine dimensional tolerances and features sizes. This report presents an evaluation of several process steps involved in Nanoimprint lithography. Molds with custom defined features are used for transferring the patterns onto different thermoplastic polymeric films and ultraviolet curable monomers. A new method of fabricating molds by vacuum deposition techniques is reported. The characterization of molds and the imprints was carried out using scanning electron microscopy, atomic force microscopy and optical profilometry. Outcomes of this study include successful pattern transfer with an aspect ratio of 4:1, for different curable monomers.
Download or read book Simulation of UV Nanoimprint Lithography on Rigid and Flexible Substrates written by Akhilesh Jain and published by . This book was released on 2016 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint lithography (NIL) is a low cost, high throughput process used to replicate sub-20 nm feature from a patterned template to a rigid or flexible substrate. Various configurations for NIL are analyzed and classified based on type of template and substrate. The steps involved in pattern transfer using roller template based NIL are identified and models to study these steps are proposed. Important process parameters such as maximum web speed possible, required UV intensity, minimum droplet size and pitch and required force on the roller are calculated. The advantages, disadvantages and optimal process window for the different configurations are identified. Droplet spreading is simulated in NIL with rigid substrates in order to study the effect of droplet size, droplet placement error, gas diffusion and template pattern on throughput and defectivity. Square arrangement is found to be the optimum arrangement for achieving minimum throughput. Large droplet-free regions on the substrate edge and error in droplet placement error have significant impact on the throughput. A fluid flow model with average flow permeability is presented to account for flow in the template patterns. Optimum droplet dispensing for multi-patterned templates is achieved by distributing droplet volume according to local filling requirements. Non-fill defects in NIL are classified into pocket, edge and channel defects. A model to predict the size of non-fill defects based on imprint time and droplet size is presented. Defect characterization is presented for various pattern-types. A model is presented to determine the time required for the encapsulated gas to diffuse into the resist. The coupled fluid-structure interaction in NIL with flexible substrate is studied by simulating the web deformation as the droplet spreads on the substrate. It is found that the flexible substrate can be modeled as a membrane due to the lack of rigidity. RLT variation reduces as the number of droplets or the web tension increases. For the magnitude of RLT variation, thinner residual layers require higher web tension. The position of the template on the substrate is important and template positioned at the corner of the substrate is found to provide the least RLT variation.
Download or read book Nanoimprint Lithography written by Hongbo Lan and published by Nova Science Publishers. This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Download or read book Nanoimprint Lithography for Functional Polymer Patterning written by Dehu Cui and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Organic semiconductors have generated huge interested in recent years for low-cost and flexible electronics. Current and future device applications for semiconducting polymers include light-emitting diodes, thin-film transistors, photovoltaic cells, chemical and biological sensors, photodetectors, lasers, and memories. The performance of conjugated polymer devices depends on two major factors: the chain conformation in polymer film and the device architecture. Highly ordered chain structure usually leads to much improved performance by enhancing interchain interaction to facilitate carrier transport. The goal of this research is to improve the performance of organic devices with the nanoimprint lithography. The work begins with the controlling of polymer chain orientation in patterned nanostructures through nanoimprint mold design and process parameter manipulation, and studying the effect of chain ordering on material properties. After that, step-and-repeat thermal nanoimprint technique for large-scale continuous manufacturing of conjugated polymer nanostructures is developed. The actual chain orientation of molecular groups in polymer micro- and nanostructures patterning by nanoimprint is complicated. However, this information is crucial for intelligently controlling the electrical and photophysical properties of conjugated polymers by nanoimprint. Systematic investigation of polymer chain configuration by Raman spectroscopy is carried out to understand how nanoimprint process parameters, such as mold pattern size, temperature, and polymer molecular weight, affects polymer chain configuration. The results indicate that chain orientation in nanoimprinted polymer micro- and nanostructures is highly related to the nanoimprint temperature and the dimensions of the mold structures. The ability to create nanoscale polymer micro- and nanostructures and manipulate their internal chain conformation establishes an original experimental platform that enables studying the properties of functional polymers at the micro- and nanoscale and understanding their fundamental structure-property relationships. In addition to the impact on basic research, the techniques developed in this work are important in applied research and development. Large-area conjugated polymer micro- and nanostructures can be easily fabricated by thermal step-and-repeat nanoimprint for organic flat-panel displays, organic circuits and organic solar panels. The ability to manipulate chain orientation through nanoimprint presents a new route to fine-tune the electrical and photophysical properties of conjugated polymers, which can lead to improved performance for all organic electronics. The techniques developed here also allow for easy incorporation of other micro- and nanoscale soft functional polymers in miniaturized devices and systems for new applications in electronics, photonics, sensors and bioengineering.
Download or read book Nanoimprint Lithography Technology and Applications written by Michael Mühlberger and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting.
Download or read book Handbook of Nanophysics written by Klaus D. Sattler and published by CRC Press. This book was released on 2010-09-17 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Download or read book Micro Nano Replication written by Shinill Kang and published by John Wiley & Sons. This book was released on 2012-04-03 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt: An introduction to micro and nano replication processes and applications Micro/Nano Replication: Processes and Applications provides an overview of the fundamentals, processes, and applications involved in micro and nano replication in the manufacturing of product parts. A major field of nanotechnology, the study of micro/nano replication is sure to become one of increasing importance as the construction of completely new devices based on innovative concepts and crafted at the molecular level increases. Designed to help the reader understand and learn to work with the growing number of tools for molding plastic components, the book covers the key topics related to replication, including patterning technology, the modification of mold surface properties, and much more. In addition, it addresses the strengths and weaknesses of different molding processes. With a strong focus not only on how micro/nano replication works, but also the broader implications for the industry, the book is packed with examples of real world applications. These are drawn from a variety of fields, including information storage devices, optoelectronic elements, optical communication, and biosensors, in order to provide a complete view of the importance of micro and nano processes. A valuable introduction to a new but fast-growing field, Micro/Nano Replication is an essential resource for anyone looking to get a head start on understanding this emerging discipline.
