Download or read book Ultra Clean Processing of Silicon Surfaces V written by Marc Heyns and published by Trans Tech Publications Ltd. This book was released on 2001-01-02 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume is indexed by Thomson Reuters CPCI-S (WoS). The proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
Download or read book Ultra Clean Processing of Silicon Surfaces 2000 written by Marc Heyns and published by . This book was released on 2001 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
Download or read book Ultra Clean Processing of Silicon Surfaces VI written by Marc Heyns and published by Trans Tech Publications Ltd. This book was released on 2003-05-02 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issues addressed by the Sixth International Symposium on the Ultra Clean Processing of Silicon Surfaces included all aspects of ultra-clean Si-technology, cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing. Volume is indexed by Thomson Reuters CPCI-S (WoS). This covered studies of Si-surface chemistry and topography and its relationship to device performance and process yield, cleaning in relationship to new gate stacks, cleaning at the interconnect level, resist stripping and polymer removal, cleaning and contamination control of various new materials, wafer backside cleaning and cleaning following Chemical-Mechanical-Polishing (CMP).
Download or read book Ultra Clean Processing of Silicon Surfaces VII written by Paul Mertens and published by Trans Tech Publications Ltd. This book was released on 2005-04-01 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume is indexed by Thomson Reuters CPCI-S (WoS). This book is sub-divided into 10 different topical sections; each dealing with important issues in surface cleaning and preparation.
Download or read book Ultra Clean Processing of Silicon Surfaces written by and published by . This book was released on 2004 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultra Clean Processing of Silicon Surfaces IV written by Marc Heyns and published by Trans Tech Publications Ltd. This book was released on 1998-11-21 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt: The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
Download or read book Ultra Clean Processing of Silicon Surfaces VI written by and published by . This book was released on 2003 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issues addressed by the Sixth International Symposium on the Ultra Clean Processing of Silicon Surfaces included all aspects of ultra-clean Si-technology, cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing. This covered studies of Si-surface chemistry and topography and its relationship to device performance and process yield, cleaning in relationship to new gate stacks, cleaning at the interconnect level, resist stripping and polymer removal, cleaning and contamination control of various new materials, wafer backside cleaning and cleaning following Chemical-Mechanical-Polishing (CMP). Judging from the large number of papers dealing with wet cleaning processes, it is clear that this is still the dominant cleaning technology at the moment. Various papers discussed simplified cleaning by the use of chelating additives, and single-wafer wet cleaning; which is expected to replace the more standard multi-step batch-type cleaning systems, in various applications, in the future. Several contributions dealt with new materials introduced into current process research and development: such as Cu, and especially (porous) low-k material, as well as high-k and metal gate stacks. Substantial progress had also been made in understanding the effects of megasonics, and in the area of cleaning following Chemical-Mechanical Polishing (CMP). Last, but not least, an encouraging number of contributions were presented on the relatively new topic of supercritical CO2 cleaning. Altogether, the 76 contributions presented at the symposium represent a timely and authoritative assessment of the state-of-the-art of this very interesting and essential field.
Download or read book Ultra Clean Processing of Silicon Surfaces 6th written by Marc Heyns and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Second International Symposium on Ultra Clean Processing of Silicon Surfaces written by Marc Heyns and published by . This book was released on 1994 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultra Clean Processing of Silicon Surfaces written by Marc Heyns and published by . This book was released on 1999 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
Download or read book Ultra Clean Processing of Silicon Surfaces written by Marc Heyns and published by Trans Tech Publication. This book was released on 1999 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
Download or read book Ultraclean Surface Processing of Silicon Wafers written by Takeshi Hattori and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Download or read book Ultra Clean Processing of Silicon Surfaces IV written by and published by . This book was released on 1998 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt: The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP). The large number of papers dealing with wet cleaning processes makes it clear that this is still the dominant technology, in spite of the fact that interesting new results have been obtained by using dry cleaning processes. Another important topic at this conference was the use of ozonated DI-water as a replacement for hydrogen peroxide, or even sulfuric-based mixtures, thus offering potentially great economic and environmental savings. Altogether, the 71 contributions presented at the symposium represent a timely and authoritative assessment of the state of the art of this very interesting field.
Download or read book Ultra Clean Processing of Semiconductor Surfaces IX written by Paul Mertens and published by Trans Tech Publications Ltd. This book was released on 2009-01-06 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume is indexed by Thomson Reuters CPCI-S (WoS). The contents of this publication include every conceivable issue related to contamination, cleaning and surface preparation during mainstream large-scale integrated circuit manufacture. Typically, silicon is used as the main semiconductor substrate. However, other semiconducting materials such as SiGe and SiC are currently being used in the source-sink junction areas, and materials such as Ge and III-V compounds are being considered for the transistor channel region of future-generation devices.
Download or read book Ultra Clean Processing of Semiconductor Surfaces XII written by Paul Mertens and published by Trans Tech Publications Ltd. This book was released on 2014-09-26 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications, Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications, Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics, Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: Cleaning for 3D Applications, Chapter 9: Contamination Control and AMC, Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells
Download or read book Crystalline Defects and Contamination written by Bernd O. Kolbesen and published by The Electrochemical Society. This book was released on 2001 with total page 380 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultra Clean Processing of Semiconductor Surfaces VIII written by Paul Mertens and published by . This book was released on 2008 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) held in Antwerp, Belgium, September 18-20, 2006
