Download or read book Towards Delafossite Structure of Cu Cr O Thin Films Deposited by Reactive Magnetron Sputtering Influence of Substrate Temperature Onoptoelectronics Properties written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Encyclopedia of Plasma Technology Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 3082 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Download or read book Effect of Substrate Bias on Properties and Microstructure of Nanotwinned Copper Thin Films Deposited by Magnetron Sputtering Systems written by Sun-Yi Chang and published by . This book was released on 2020 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Effect of Substrate Temperature on the Dielectric Properties of Ta2O5 Films Deposited by Reactive Pulsed Magnetron Sputtering written by Jasbir S. Juneja and published by . This book was released on 2002 with total page 31 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book DC Magnetron Sputtered Pure and Al Doped Cu2O Thin Films written by Sivasankar Reddy Akepati and published by LAP Lambert Academic Publishing. This book was released on 2015-11-04 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt: Transparent conducting metal oxide thin films received the attention of many researchers for application in transparent electronics such as heterojunction solar cells, gas sensors, electrochromic devices, optoelectronic devices etc. Cuprous oxide (Cu2O) and copper aluminum oxide (CuAlO2) are transparent oxides exhibiting p-type conductivity. The properties of these materials in thin film mainly depend on the method of preparation and deposition conditions maintained during film growth. This book restrains the optimized deposition conditions of Cu2O and CuAlO2 films deposited on glass substrates using dc reactive magnetron sputtering technique, and investigated their structural, composition, microstructure, surface morphology, optical and electrical properties.The promising approach to prepare device quality films for optoelectronic devices was discussed clearly in this book
Download or read book Structure of Copper Films Deposited on Porous Substrates by Magnetron Sputtering written by O.S Serebryannikova and published by . This book was released on 1989 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Effect of Stoichiometry and Deposition Conditions on the Properties of Amorphous Copper Oxide Thin Films Prepared by Reactive Magnetron Sputtering written by Tijjani Hassan Darma and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Controllable Growth Microstructure and Electronic Structure of Copper Oxide Thin Films written by Yong Wang and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Growth and Characterization of Epitaxial Oxide Thin Films written by Ashish Garg and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Epitaxial oxide thin films are used in many technologically important device applications. This work deals with the deposition and characterization of epitaxial WO3 and SrBi2Ta2O9 (SBT) thin films on single crystal oxide substrates. WO3 thin films were chosen as a subject of study because of recent findings of superconductivity at surfaces and twin boundaries in the bulk form of this oxide. Highly epitaxial thin films would be desirable in order to be able to create a device within a film without patterning it, by locally creating superconducting regions (e.g. twins) within an otherwise defect free film by reducing or doping the film with Na. Films were deposited by reactive magnetron sputtering at various temperatures on single crystal SrTiO3 (100) and R-sapphire substrates. X-ray diffraction studies showed that the optimised films were highly (001) oriented, quality of epitaxy improving with decreasing deposition temperature. AFM studies revealed columnar growth of these films. Films were heat treated with Na vapour in order to reduce or dope them with Na. Low temperature measurements of the reduced films did not show existence of any superconductivity. SBT is a ferroelectric oxide and its thin films are attractive candidates for non-volatile ferroelectric random access memory (FRAM) applications. High structural anisotropy leads to a high degree of anisotropy in its ferroelectric properties which makes it essential to study epitaxial SBT films of different orientations. In this study, SBT films of different orientations were deposited on different single crystal substrates by pulsed laser ablation. Highly epitaxial c-axis oriented and smooth SBT films were deposited on SrTiO3 (100) substrates. AFM studies revealed the growth of these films by 3-D Stranski-Krastanov mode. However, these films did not exhibit any ferroelectric activity. Highly epitaxial (116)-oriented films were deposited on SrTiO3 (110) substrates. These films were also very smooth with root mean square (RMS) roughness of 15-20 Å. Films deposited on TiO2 (110) were partially a-/b-axis oriented and showed the formation of c-axis oriented SBT and many impurities. Completely a-/b-axis oriented SBT films were deposited on LaSrAlO4 (110) substrates. Films deposited at non-optimal growth temperatures showed the formation of many impurities. Attempts were also made towards depositing Sr2RuO4 films on LaSrAlO4 (110) substrates, which can act as a bottom electrode for ferroelectric SBT films.
Download or read book The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films written by John Gerald Kavanagh and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An investigation was made into the effect of rf magnetron deposition parameters on the resulting properties of chromium oxide thin films. The films were sputtered in an argon/ oxygen plasma environment with the main deposition parameters being the argon and oxygen flow rate, chamber pressure, deposition-time and the deposition power (forward and back). Tire effect of the sputter deposition regime which is controlled by the sputtering hysteresis phenomenon i.e. the reactive and metallic regimes, are expected to have a significant effect on the properties of the sputtered films and will have to be taken into account. The films were deposited on a range of substrates such as silicon, glass micro-slides and stainless steel 304 and the composition of the mainly amorphous sputtered films was determined through XPS, EDX and XRD. Optical characterisation and determination of optical constants was undertaken by transmission/reflection spectrophotometry, ellipsometry and Raman and FTIR analysis. Two designs of a solar thermal absorber (multilayer interference and tandem absorber) were designed and fabricated based on the optical constants measured by the methods previously stated and their performance analysed. The surface energy was calculated through measurement of the contact angle with three different liquids and the corrosion resistance of the films measured by OCP, linear sweep and EIS analysis in 3.5wt% NaCI solution. The mechanical properties were measured by nanoindentation, from which the hardness and elastic modulus of the samples could be obtained. The electrical properties were measured using a four point probe to calculate the thin film resistivity and the Kelvin probe analysis was used to measure the work function of the samples.
Download or read book Temperature Impact on Thermal Evolution of Advanced PVD Ceramic and Metallic Glass Thin Films written by Mihai Apreutesei and published by . This book was released on 2015 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the recent years the industrial requirements to develop new functional materials able to overcome the severe conditions during machining operation are continuously increasing. Researchers then must find novel solutions to respond to their severe industrial requirements. To coat the tool surface with advanced coatings is the most efficient solution. New nanostructured materials may nowadays exhibit unique mechanical, physical and chemical properties ensuring notable degradation resistance where the surface protection of materials against corrosion, wear, friction or oxidation is a key issue, particularly when operating in hostile environments. Within the scope of this Ph.D. thesis the influence of the temperature on the structural stability of two different PVD ceramic and metallic glass thin films is proposed. The main goal consists in the development of two distinct classes of thin films, with a wide range of properties. In order to prepare these films, the project will be focused on the study on the influence of PVD deposition conditions in the particular film's growth characteristics: chemical composition, structure, morphology and the subsequent changes in the main properties of the thin films, namely oxidation and crystallization resistance, especially. For that purpose we adopted the multiscale approach. The first part is related to the ceramic CrN-based coatings to give new functionalities and improve the tools' surface with the primary aim to increase their lifetime. Secondly, new protective materials able to better protect the exposed surfaces against high temperature oxidation have been proposed, namely CrAlN and CrAlYN coatings as will be evidenced in this manuscript. The second part of the manuscript is dedicated to the innovative Zr-Cu thin films metallic glasses prepared by a PVD magnetron co-sputtering method with the objective to investigate the amorphization ability and their structural properties. Their excellent properties at room temperature have recently attracted attention as a new class of materials with great potential for engineering applications due to unique mechanical and physico-chemical characteristics (high elastic strain limit, corrosion resistance...). Finally, an important approach during the course of this thesis was the real time observation of the structure and surface modifications during heating by means of in situ methods. The thin films proposed during the course of the work could be straightforward used as surface engineering solutions to protect and extend the lifetime of the materials and components.
Download or read book Diffusion Charateristics of Copper in Novel Metallic Films written by and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of this work was to synthesize refractory materials like TiN, Ta and alloys of TiN-TaN in the form of thin films which are used as diffusion barriers in integrated circuits to prevent diffusion of Cu into the Si substrate. The primary emphasis of this research was to synthesize different microstructures of these films like amorphous, nanocrystalline, textured polycrystalline and single crystalline films, and to study the effect of these microstructures on their mechanical and electrical properties and on diffusion characteristics of Cu. Microstructures ranging from nanocrystalline to single crystalline TiN films on Si(100) substrates were synthesized by Pulsed Laser Deposition technique by varying the substrate temperature from 25 & deg;C to 650 & deg;C. Experimental techniques like XRD, TEM, HRTEM, STEM-Z, EELS, SIMS and four-point probe resistivity measurement were used for in-depth analysis. Effect of microstructures of these films on their mechanical and electrical properties, and on diffusion behavior of Cu was analyzed. An important finding of this research was that polycrystalline TiN films showed significantly more diffusion of Cu along the columnar grain boundaries, whereas nanocrystalline films exhibited significantly less diffusion of Cu comparable to that in single crystalline TiN films. Impurity induced amorphous Ta films stable up to high temperatures (~650 & deg;C) were synthesized by the Pulsed Laser Deposition and polycrystalline Ta films were processed by magnetron sputtering technique. Effects of different microstructures of these films on their electrical properties and on the diffusion characteristics of Cu were analyzed. Using the above experimental techniques along with RBS, stable amorphous Ta films showed insignificant diffusion of Cu. Polycrystalline Ta films showed significant diffusion of Cu along the grain boundaries. Recrystallization of amorphous Ta films and diffusion along the grain boundaries were observed at higher temperatures.
Download or read book Deposition and Properties of Co and Ru based Ultra thin Films written by Lucas Benjamin Henderson and published by . This book was released on 2009 with total page 284 pages. Available in PDF, EPUB and Kindle. Book excerpt: Future copper interconnect systems will require replacement of the materials that currently comprise both the liner layer(s) and the capping layer. Ruthenium has previously been considered as a material that could function as a single material liner, however its poor ability to prevent copper diffusion makes it incompatible with liner requirements. A recently described chemical vapor deposition route to amorphous ruthenium-phosphorus alloy films could correct this problem by eliminating the grain boundaries found in pure ruthenium films. Bias-temperature stressing of capacitor structures using 5 nm ruthenium-phosphorus film as a barrier to copper diffusion and analysis of the times-to-failure at accelerated temperature and field conditions implies that ruthenium-phosphorus performs acceptably as a diffusion barrier for temperatures above 165 °C. The future problems associated with the copper capping layer are primarily due to the poor adhesion between copper and the current Si-based capping layers. Cobalt, which adheres well to copper, has been widely proposed to replace the Si-based materials, but its ability to prevent copper diffusion must be improved if it is to be successfully implemented in the interconnect. Using a dual-source chemistry of dicobaltoctacarbonyl and trimethylphosphine at temperatures from 250-350 °C, amorphous cobalt-phosphorus can be deposited by chemical vapor deposition. The films contain elemental cobalt and phosphorus, plus some carbon impurity, which is incorporated in the film as both graphitic and carbidic (bonded to cobalt) carbon. When deposited on copper, the adhesion between the two materials remains strong despite the presence of phosphorus and carbon at the interface, but the selectivity for growth on copper compared to silicon dioxide is poor and must be improved prior to consideration for application in interconnect systems. A single molecule precursor containing both cobalt and phosphorus atoms, tetrakis(trimethylphosphine)cobalt(0), yields cobalt-phosphorus films without any co-reactant. However, the molecule does not contain sufficient amounts of amorphizing agents to fully eliminate grain boundaries, and the resulting film is nanocrystalline.
Download or read book Thermal Spray Fundamentals written by Pierre L. Fauchais and published by Springer Science & Business Media. This book was released on 2014-01-24 with total page 1587 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides readers with the fundamentals necessary for understanding thermal spray technology. Coverage includes in-depth discussions of various thermal spray processes, feedstock materials, particle-jet interactions, and associated yet very critical topics: diagnostics, current and emerging applications, surface science, and pre and post-treatment. This book will serve as an invaluable resource as a textbook for graduate courses in the field and as an exhaustive reference for professionals involved in thermal spray technology.
Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-12-31 with total page 657 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Download or read book Spark Erosion Machining written by Neelesh Kumar Jain and published by CRC Press. This book was released on 2020-11-01 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book bridges the gaps where limited resources are available on comprehensive coverage of spark erosion machining (SEM) based processes. It provides researchers and scholars a vast amount of information on recent research on the subject. It also serves as a resource of novel and specialized applications of spark erosion machining and its variants, for students and faculties involved with advanced machining processes. Some salient features of the book: Describes various important aspects of spark-erosion based processes including their derived and hybrid processes. Includes a broad scope of SEM applications from industrial, commercial, and scientific to aerospace, automobiles and biomedical domains. Covers a wide range of materials applications of SE-based processes to different exotic and difficult-to-machine materials, i.e. superalloys, composites, ceramics, shape memory alloys, etc. Provides details micro version of EDM and WEDM processes and their specialized applications.
Download or read book Nanomaterials for Hydrogen Storage Applications written by Fatih Şen and published by Elsevier. This book was released on 2020-09-09 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanomaterials for Hydrogen Storage Applications introduces nanomaterials and nanocomposites manufacturing and design for hydrogen storage applications. The book covers the manufacturing, design, characterization techniques and hydrogen storage applications of a range of nanomaterials. It outlines fundamental characterization techniques for nanocomposites to establish their suitability for hydrogen storage applications. Offering a sound knowledge of hydrogen storage application of nanocomposites, this book is an important resource for both materials scientists and engineers who are seeking to understand how nanomaterials can be used to create more efficient energy storage solutions. - Assesses the characterization, design, manufacture and application of different types of nanomaterials for hydrogen storage - Outlines the major challenges of using nanomaterials in hydrogen storage - Discusses how the use of nanotechnology is helping engineers create more effective hydrogen storage systems
