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Book Time of flight Detector for Heavy Ion Backscattering Spectrometry

Download or read book Time of flight Detector for Heavy Ion Backscattering Spectrometry written by and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Time of flight Heavy Ion Backscattering Spectrometry

Download or read book Time of flight Heavy Ion Backscattering Spectrometry written by and published by . This book was released on 1993 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new time-of-flight (TOF) ion detection system for Heavy Ion Backscattering Spectrometry (HIBS) is described. Examples are also given of the use of the system for measuring low-level contamination on Si wafers. Currently, the TOF-HBIS system has a sensitivity of 1 x 109/cm2 for the heaviest of surface impurity atoms and a mass resolution capable of separating Fe from Cu. The sensitivity is expected to improve by an additional order of magnitude on a industrial TOF-HIBS system being constructed for SEMATECH.

Book Backscattering Spectrometry

Download or read book Backscattering Spectrometry written by Wei-Kan Chu and published by Elsevier. This book was released on 2012-12-02 with total page 401 pages. Available in PDF, EPUB and Kindle. Book excerpt: Backscattering Spectrometry reviews developments in backscattering spectrometry and covers topics ranging from instrumentation and experimental techniques to beam parameters and energy loss measurements. Backscattering spectrometry of thin films is also considered, and examples of backscattering analysis are given. This book is comprised of 10 chapters and begins with an introduction to backscattering spectrometry, what it can and what it cannot accomplish, and some ""rules of thumb"" for interpreting or reading spectra. The relative strengths and weaknesses of backscattering spectrometry in the framework of materials analysis are outlined. The following chapters focus on kinematics, scattering cross sections, energy loss, and energy straggling; backscattering analysis of thin films of various degrees of complications; the influence of beam parameters; and mass and depth resolutions and their relationships to the mass and energy of projectiles. Many examples of backscattering analysis are also presented to illustrate the capability and limitation of backscattering. Backscattering applications when combined with channeling effects are considered as well. The final chapter provides a list of references on the applications of backscattering spectrometry. This monograph will be a useful resource for physicists.

Book Scientific and Technical Aerospace Reports

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 702 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices

Download or read book Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices written by P. Rai-Choudhury and published by The Electrochemical Society. This book was released on 1997 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Energy Research Abstracts

Download or read book Energy Research Abstracts written by and published by . This book was released on 1995 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Surface and Thin Film Analysis

Download or read book Surface and Thin Film Analysis written by Gernot Friedbacher and published by John Wiley & Sons. This book was released on 2011-03-31 with total page 514 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surveying and comparing all techniques relevant for practical applications in surface and thin film analysis, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. This new book has been revised and updated and is divided into four parts - electron, ion, and photon detection, as well as scanning probe microscopy. New chapters have been added to cover such techniques as SNOM, FIM, atom probe (AP),and sum frequency generation (SFG). Appendices with a summary and comparison of techniques and a list of equipment suppliers make this book a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. From a Review of the First Edition (edited by Bubert and Jenett) "... a useful resource..." (Journal of the American Chemical Society)

Book Energy Research Abstracts

Download or read book Energy Research Abstracts written by and published by . This book was released on 1984-03 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices

Download or read book Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices written by Dieter K. Schroder and published by The Electrochemical Society. This book was released on 1994 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Handbook of Silicon Semiconductor Metrology

Download or read book Handbook of Silicon Semiconductor Metrology written by Alain C. Diebold and published by CRC Press. This book was released on 2001-06-29 with total page 703 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay

Book ERDA Energy Research Abstracts

Download or read book ERDA Energy Research Abstracts written by and published by . This book was released on 1985 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Using Heavy Ion Backscattering Spectrometry  HIBS  to Solve Integrated Circuit Manufacturing Problems

Download or read book Using Heavy Ion Backscattering Spectrometry HIBS to Solve Integrated Circuit Manufacturing Problems written by and published by . This book was released on 1997 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: Heavy Ion Backscattering Spectrometry (HIBS) is a new IBA tool for measuring extremely low levels of surface contamination on very pure substrates, such as Si wafers used in the manufacture of integrated circuits. HIBS derives its high sensitivity through the use of moderately low energy ((approximately) 100 keV) heavy ions (e.g., C12) to boost the RBS cross-section to levels approaching 1,000 barns, and by using specially designed time-of-flight detectors which have been optimized to provide a large scattering solid angle with minimal kinematic broadening. A HIBS User Facility has been created which provides US industry, national laboratories, and universities with a place for conducting ultra-trace level surface contamination studies. A review of the HIBS technique is given and examples of using the facility to calibrate Total-Reflection X-ray Fluorescence Spectroscopy (TXRF) instruments and develop wafer cleaning processes are discussed.

Book INIS Atomindex

Download or read book INIS Atomindex written by and published by . This book was released on 1995 with total page 682 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Nondestructive Characterization of Materials VI

Download or read book Nondestructive Characterization of Materials VI written by Robert E. Green and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 822 pages. Available in PDF, EPUB and Kindle. Book excerpt: Traditionally the vast majority of materials characterization techniques have been destructive, e. g. , chemical compositional analysis, metallographic determination of microstructure, tensile test measurement of mechanical properties, etc. Also, traditionally, nondestructive techniques have been used almost exclusively for the detection of macroscopic defects, mostly cracks, in structures and devices which have already been constructed and have already been in service for an extended period of time. Following these conventional nondestructive tests, it has been common practice to use somewhat arbitrary accept-reject criteria to decide whether or not the structure or device should be removed from service. The present unfavorable status of a large segment of industry, coupled with the desire to keep structures in service well past their original design life, dramatically show that our traditional approaches must be drastically modified if we are to be able to meet future needs. The role of nondestructive characterization of materials is changing and will continue to change dramatically. It has become increasingly evident that it is both practical and cost effective to expand the role of nondestructive evaluation to include all aspects of materials' production and application and to introduce it much earlier in the manufacturing cycle. In fact, the recovery of a large portion of industry from severe economic problems is dependent, in part, on the successful implementation of this expanded role.

Book Nuclear Science Abstracts

Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1975 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Control of Semiconductor Interfaces

Download or read book Control of Semiconductor Interfaces written by I. Ohdomari and published by Elsevier. This book was released on 2017-05-03 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses exclusively on control of interfacial properties and structures for semiconductor device applications from the point of view of improving and developing novel electrical properties. The following topics are covered: metal-semiconductors, semiconductor hetero-interfaces, characterization, semiconducting new materials, insulator-semiconductor, interfaces in device, control of interface formation, control of interface properties, contact metallization. A variety of up-to-date research topics such as atomic layer epitaxy, atomic layer passivation, atomic scale characterization including STM and SR techniques, single ion implementation, self-organization crystal growth, in situ measurements for process control and extremely high-spatial resolution analysis techniques, are also included. Furthermore it bridges the macroscopic, mesoscopic, and atomic-scale regimes of semicondutor interfaces, describing the state of the art in forming, controlling and characterizating unique semiconductor interfaces, which will be of practical importance in advanced devices. Intended for both technologists who require an up-to-date assessment of methods for interface formation, processing and characterization, and solid state researchers who desire the latest developments in understanding the basic mechanisms of interface physics, chemistry and electronics, this book will be a welcome addition to the existing literature.