Download or read book Optical Properties of Thin Solid Films written by O. S. Heavens and published by Courier Corporation. This book was released on 1991-01-01 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Authoritative reference treats the formation, structure, optical properties, and uses of thin solid films, emphasizing causes of their unusual qualities. 162 figures. 19 tables. 1955 edition.

Download or read book Thin Solid Films Process And Applications written by S. C. Nam and published by . This book was released on 2008-01-01 with total page 318 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the past 50 years thin-film technologies, ranging from deposition techniques to their applications have been rapidly developed in the industrial field. Although we are not directly exposed to such technologies, they have become indispensable to the progress of human life. This book deals with a unique collection of deposition techniques and their state-of-the-art applications. Among various thin-film deposition technologies, physical vapor deposition (PVD) and chemical vapor deposition (CVD) techniques are widely used in the deposition of thin-films ranging from semiconductors to decorative coatings. A variety of all types of PVD and CVD processes are used to deposit single- or multilayered coatings in the thickness range of a few nanometers to several microns. In chapter 1, modern PVD technologies such as reactive magnetron sputtering, arc source deposition, pulsed laser ablation deposition, and ion plating are reviewed in order to understand their concept and mechanism. In particular, the review is focused on the recent developments of plasma- and ion-assisted PVD processes and their properties and applications. In chapter 2, the CVD process, particularly metal organic chemical vapor deposition (MOCVD), is introduced. In this chapter, the basic concept of MOCVD as a promising deposition technique and the fabrication of ZnO thin-films using MOCVD are presented. Zinc oxide (ZnO) has been considered to be a promising material for optoelectronic, spintronic, and nanostructure devices and other applications because of its wide direct bandgap and large exciton binding energy. Currently it is used in blue-light-emitting devices and laser applications. This use of ZnO in such applications has been made possible by MOCVD and molecular beam epitaxy (MBE) techniques. Thin-films such as metals or oxides could be deposited by electrochemical methods. Chapter 3 describes a novel approach to the fabrication of thin-film metal oxides such as Cu2O, PbO2, and ZnO by two distinct electrochemical techniques of deposition and anodization. Some polymers are selected as applications of thin-films. The fabrication of polymer thin-films using vacuum technologies offers many advantages such as excellent step coverage in three-dimensional structures, physicochemical stability, and easy control of thickness. Furthermore, this fabrication process does not require liquid solvents and is essentially a dry process. Basically, polymers are formed on the surface of a surface by reaction with radicals generated by thermal energy. Chapter 4 introduces the principle of the deposition process of parylene polymer thin-films as a type of thermal CVD technique along with its properties and application fields. Chapter 5 gives an overview of the state-of-the-art applications of photocatalytic TiO2 thin-films. TiO2 is a wide bandgap semiconductor, which has become a well-known photoactivated catalyst for water and air purification and self-cleaning surfaces. In this chapter, an introduction to the activity of TiO2 including important factors that determine the photocatalytic activity, deposition techniques, and general considerations are presented. Thin-film deposition processes such as sputtering, MOCVD, and plasma etching could be useful techniques for the fabrication of perovskite ceramic oxide thin-films, which are used in non-volatile memory chips and piezoelectric devices in micro electro mechanical system (MEMS) applications. Chapter 6 describes thin-film technologies for the fabrication of perovskite ceramic oxide thin-films and explores key technologies for their production and integration and improvements for their performances. Display technology has enhanced rapidly due to the urgent requirement of thin, light-weight, and high-performance devices that consume low power consuming for receiving and transmitting information anywhere and at any time. Organic light-emitting devices (OLEDs) have attracted attention in recent years because of their applications in displays. Top-emission OLEDs have been recognized as applications of thin-film technology. In chapter 7, transparent cathodes for top emission OLEDs are reviewed. Since, it is necessary to perform a proper analysis in thin-film technology, the use of TEM for such analysis is reviewed in chapter 8. For more than 30 years, TEM has been employed as a powerful analytical technique for nanoscale materials. Currently, it is the most widely used method for structural analysis of thin-films. Although TEM observations provide a considerable amount of information, it is difficult to prepare TEM samples by conventional ion milling techniques. A recently developed focused ion beam (FIB) technique has enabled us to reduce the long sample preparation time, resulting in the extension of analytical TEM fields to material sciences. This chapter explains the TEM sample preparation method using FIB milling and its recent applications. Finally, thin-film technologies that are expected to develop new cathode and anode materials with arbitrary compositions as well as the mechanism in lithium batteries are introduced in chapter 9. Thin-films can play an important role in lithium batteries. This chapter describes the preparation of cathode and anode thin-film electrodes by a suitable deposition technique, characterization of the thin-film structure, electrochemical characterization in lithium cells, and relationship between micro- and macroscale electrochemical characteristics of the electrode materials. It is hoped that this book will provide valuable information to readers who are interested in thin-film technology and its application fields. Finally, I would like to acknowledge all the authors who have contributed to this review book.

Download or read book Thin Film Processes II written by Werner Kern and published by Elsevier. This book was released on 2012-12-02 with total page 881 pages. Available in PDF, EPUB and Kindle. Book excerpt: This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Provides an all-new sequel to the 1978 classic, Thin Film Processes Introduces new topics, and several key topics presented in the original volume are updated Emphasizes practical applications of major thin film deposition and etching processes Helps readers find the appropriate technology for a particular application

Download or read book Spectroscopic Ellipsometry written by Hiroyuki Fujiwara and published by John Wiley & Sons. This book was released on 2007-09-27 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.

Download or read book Nanostructured Thin Films written by Maria Benelmekki and published by Elsevier. This book was released on 2019-08-25 with total page 334 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanostructured Thin Films: Fundamentals and Applications presents an overview of the synthesis and characterization of thin films and their nanocomposites. Both vapor phase and liquid phase approaches are discussed, along with the methods that are sufficiently attractive for large-scale production. Examples of applications in clean energy, sensors, biomedicine, anticorrosion and surface modification are also included. As the applications of thin films in nanomedicine, cell phones, solar cell-powered devices, and in the protection of structural materials continues to grow, this book presents an important research reference for anyone seeking an informed overview on their structure and applications. Shows how thin films are being used to create more efficient devices in the fields of medicine and energy harvesting Discusses how to alter the design of nanostructured thin films by vapor phase and liquid phase methods Explores how modifying the structure of thin films for specific applications enhances their performance

Download or read book Advances in Ferroelectrics written by Aimé Peláiz-Barranco and published by BoD – Books on Demand. This book was released on 2012-11-19 with total page 546 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ferroelectricity is one of the most studied phenomena in the scientific community due the importance of ferroelectric materials in a wide range of applications including high dielectric constant capacitors, pyroelectric devices, transducers for medical diagnostic, piezoelectric sonars, electrooptic light valves, electromechanical transducers and ferroelectric random access memories. Actually the ferroelectricity at nanoscale receives a great attention to the development of new technologies. The demand for ferroelectric systems with specific applications enforced the in-depth research in addition to the improvement of processing and characterization techniques. This book contains twenty two chapters and offers an up-to-date view of recent research into ferroelectricity. The chapters cover various formulations, their forms (bulk, thin films, ferroelectric liquid crystals), fabrication, properties, theoretical topics and ferroelectricity at nanoscale.

Download or read book Optical Characterization of Thin Solid Films written by Olaf Stenzel and published by Springer. This book was released on 2018-03-09 with total page 462 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Emphasis is placed on practicability of the various approaches. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics. The book is written by international top experts, all of whom are involved in industrial research and development projects.

Download or read book Thin Films by Chemical Vapour Deposition written by C.E. Morosanu and published by Elsevier. This book was released on 2016-06-22 with total page 720 pages. Available in PDF, EPUB and Kindle. Book excerpt: The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.

Download or read book Thin Films on Glass written by Hans Bach and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 445 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, entitled Thin Films on Glass, is one of a series reporting on research and development activities on products and processes conducted by the Schott Group. The scientifically founded development of new products and technical pro cesses has traditionally been of vital importance to Schott and has always been performed on a scale determined by the prospects for application of our special glasses. Since the reconstruction of the Schott Glaswerke in Mainz, the scale has increased enormously. The range of expert knowledge required could never have been supplied by Schott alone. It is also a tradition in our company to cultivate collaboration with customers, universities, and research institutes. Publications in numerous technical journals, which since 1969 we have edited to a regular schedule as Forschungsberichte - 'research reports' - describe the results of these cooperations. They contain up-to-date infor mation on various topics for the expert but are not suited as survey material for those whose standpoint is more remote. This is the point where we would like to place our series, to stimulate the exchange of thoughts, so that we can consider from different points of view the possibilities offered by those incredibly versatile materials, glass and glass ceramics. We would like to share the knowledge won through our research and development at Schott in cooperation with the users of our materials with scientists and engineers, interested customers and friends, and with the employees of our firm.

Download or read book Chemical Solution Synthesis for Materials Design and Thin Film Device Applications written by Soumen Das and published by Elsevier. This book was released on 2021-01-29 with total page 746 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical Solution Synthesis for Materials Design and Thin Film Device Applications presents current research on wet chemical techniques for thin-film based devices. Sections cover the quality of thin films, types of common films used in devices, various thermodynamic properties, thin film patterning, device configuration and applications. As a whole, these topics create a roadmap for developing new materials and incorporating the results in device fabrication. This book is suitable for graduate, undergraduate, doctoral students, and researchers looking for quick guidance on material synthesis and device fabrication through wet chemical routes. Provides the different wet chemical routes for materials synthesis, along with the most relevant thin film structured materials for device applications Discusses patterning and solution processing of inorganic thin films, along with solvent-based processing techniques Includes an overview of key processes and methods in thin film synthesis, processing and device fabrication, such as nucleation, lithography and solution processing

Download or read book Thin Film Processes written by John L. Vossen and published by . This book was released on 1978 with total page 888 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Thin Film Techniques and Applications written by and published by Allied Publishers. This book was released on 2004 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Thin Film Processes written by John L. Vossen and published by Elsevier. This book was released on 2012-12-02 with total page 577 pages. Available in PDF, EPUB and Kindle. Book excerpt: Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

Download or read book Physics of Thin Films written by Maurice H. Francombe and published by Elsevier. This book was released on 2013-10-22 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films: Advances in Research and Development primarily deals with the influence of ions or optical energy on the deposition, properties, and etching on thin films. The book is a collection of five articles, with one article per chapter. Chapter 1 covers ionized cluster beam deposition; epitaxy; and film-formation mechanism. Chapter 2 discusses the activated reactive evaporation process; the deposition of refractory compounds; the role of plasma in the process; and its applications. Chapter 3 focuses on ion-beam processing of optical thin films; ion sources and ion-surface interactions; and the different kinds of bombardment involved. Chapter 4 deals with laser induced etching - its mechanisms, methods, and applications. Chapter 5 talks about contacts to GaAs devices; Fermi-level pinning; and heterojunction contacts. The book is recommended for physicists and engineers in the field of electronics who would like to know more about thin films and the progresses in the field.

Download or read book Handbook of Deposition Technologies for Films and Coatings written by Peter M. Martin and published by William Andrew. This book was released on 2009-12-01 with total page 932 pages. Available in PDF, EPUB and Kindle. Book excerpt: This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.

Download or read book Handbook of Thin Film Process Technology written by David A Glocker and published by CRC Press. This book was released on 2018-01-18 with total page 90 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.

Download or read book Optical Properties of Materials and Their Applications written by Jai Singh and published by John Wiley & Sons. This book was released on 2020-01-07 with total page 667 pages. Available in PDF, EPUB and Kindle. Book excerpt: Provides a semi-quantitative approach to recent developments in the study of optical properties of condensed matter systems Featuring contributions by noted experts in the field of electronic and optoelectronic materials and photonics, this book looks at the optical properties of materials as well as their physical processes and various classes. Taking a semi-quantitative approach to the subject, it presents a summary of the basic concepts, reviews recent developments in the study of optical properties of materials and offers many examples and applications. Optical Properties of Materials and Their Applications, 2nd Edition starts by identifying the processes that should be described in detail and follows with the relevant classes of materials. In addition to featuring four new chapters on optoelectronic properties of organic semiconductors, recent advances in electroluminescence, perovskites, and ellipsometry, the book covers: optical properties of disordered condensed matter and glasses; concept of excitons; photoluminescence, photoinduced changes, and electroluminescence in noncrystalline semiconductors; and photoinduced bond breaking and volume change in chalcogenide glasses. Also included are chapters on: nonlinear optical properties of photonic glasses; kinetics of the persistent photoconductivity in crystalline III-V semiconductors; and transparent white OLEDs. In addition, readers will learn about excitonic processes in quantum wells; optoelectronic properties and applications of quantum dots; and more. Covers all of the fundamentals and applications of optical properties of materials Includes theory, experimental techniques, and current and developing applications Includes four new chapters on optoelectronic properties of organic semiconductors, recent advances in electroluminescence, perovskites, and ellipsometry Appropriate for materials scientists, chemists, physicists and electrical engineers involved in development of electronic materials Written by internationally respected professionals working in physics and electrical engineering departments and government laboratories Optical Properties of Materials and Their Applications, 2nd Edition is an ideal book for senior undergraduate and postgraduate students, and teaching and research professionals in the fields of physics, chemistry, chemical engineering, materials science, and materials engineering.