Download or read book Pulsed Laser Deposition of Thin Films written by Robert Eason and published by John Wiley & Sons. This book was released on 2007-12-14 with total page 754 pages. Available in PDF, EPUB and Kindle. Book excerpt: Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.
Download or read book Thin Film Growth of Dielectric Materials by Pulsed Laser Deposition written by Jason Christopher Anders and published by . This book was released on 2014 with total page 71 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films of SryCa1-yZr1-xTixO3 (SCZT) with x = 0.8, y = 0.01, CaHf1-xTixO3 (CHT) with x = 0.8, and xBiScO3 - (1-x) BaTiO3 with x = 0.36 (BSBT(36/64)) showing a high permittivity are useful both in capacitor applications. These dielectric thin films with a SrRuO3 (SRO) conductive bottom electrodes were prepared by using pulsed laser deposition on 100 La0.3Sr0.7Al0.65Ta0.35O3 (LSAT) single crystal substrates. In a search of optimal conditions to achieve epitaxially grown SCZT, CHT, BSBT(36/64), and SRO thin films, different substrate temperatures (600 C, 650 C, 750 C, and 800 C) and different partial pressures of oxygen (50 mTorr, 100 mTorr and 300 mTorr) in the chamber were used during deposition onto LSAT substrates. The optimized deposition conditions for conductive buffer layer of SRO film required 300 mTorr of oxygen partial pressure and substrate temperature of 750 C. The thorough structural and chemical studies of SCZT, CHT and BSBT(36/64) films were done by using SEM (scanning electron microscopy), AFM (atomic force microscopy), and XRD (X-ray diffraction) measurements. Sputtered gold top electrodes were added to the samples, along with etching to the SRO conductive buffer layer. These conductive electrodes were used to generate an AC electric field between the top electrodes and conductive buffer layer. Electrical characterizations of thin films such as complex permittivity, resistance and capacitance of grains and grain boundaries were performed using AC impedance spectroscopy, with curve fitting using Z-View software.
Download or read book Pulsed Laser Ablation written by Ion N. Mihailescu and published by CRC Press. This book was released on 2018-01-09 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pulsed laser–based techniques for depositing and processing materials are an important area of modern experimental and theoretical scientific research and development, with promising, challenging opportunities in the fields of nanofabrication and nanostructuring. Understanding the interplay between deposition/processing conditions, laser parameters, as well as material properties and dimensionality is demanding for improved fundamental knowledge and novel applications. This book introduces and discusses the basic principles of pulsed laser–matter interaction, with a focus on its peculiarities and perspectives compared to other conventional techniques and state-of-the-art applications. The book starts with an overview of the growth topics, followed by a discussion of laser–matter interaction depending on laser pulse duration, background conditions, materials, and combination of materials and structures. The information outlines the foundation to introduce examples of laser nanostructuring/processing of materials, pointing out the importance of pulsed laser–based technologies in modern (nano)science. With respect to similar texts and monographs, the book offers a comprehensive review including bottom-up and top-down laser-induced processes for nanoparticles and nanomicrostructure generation. Theoretical models are discussed by correlation with advanced experimental protocols in order to account for the fundamentals and underline physical mechanisms of laser–matter interaction. Reputed, internationally recognized experts in the field have contributed to this book. In particular, this book is suitable for a reader (graduate students as well as postgraduates and more generally researchers) new to the subject of pulsed laser ablation in order to gain physical insight into and advanced knowledge of mechanisms and processes involved in any deposition/processing experiment based on pulsed laser–matter interaction. Since knowledge in the field is given step by step comprehensively, this book serves as a valid introduction to the field as well as a foundation for further specific readings.
Download or read book Handbook of Laser Micro and Nano Engineering written by KOJI SUGIOKA. and published by . This book was released on 2019 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.
Download or read book Heteroepitaxial Growth of High K Dielectric Thin Films by Pulsed Laser Deposition written by Wai-ming Yu and published by . This book was released on 2004 with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Advanced Nano Deposition Methods written by Yuan Lin and published by John Wiley & Sons. This book was released on 2016-08-29 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.
Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2012-06-27 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: Resumen: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Download or read book Advanced Dielectric Piezoelectric and Ferroelectric Thin Films written by Bruce A. Tuttle and published by John Wiley & Sons. This book was released on 2012-04-17 with total page 86 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in synthesis and characterization of dielectric, piezoelectric and ferroelectric thin films are included in this volume. Dielectric, piezoelectric and ferroelectric thin films have a tremendous impact on a variety of commercial and military systems including tunable microwave devices, memories, MEMS devices, actuators and sensors. Recent work on piezoelectric characterization, AFE to FE dielectric phase transformation dielectrics, solution and vapor deposited thin films, and materials integration are among the topics included. Novel approaches to nanostructuring, characterization of material properties and physical responses at the nanoscale also is included.
Download or read book Thin Films and Coatings written by B. M. Caruta and published by Nova Publishers. This book was released on 2005 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: The broad field of thin film technology is based first of all on the film growth processes in general. The concepts of crystal structure and defects in crystalline thin films such as grain boundaries, dislocations and vacancies are examined. The general nature of film growth from atoms equilibrating with the service, through the initial stages of growth to film coalescence and zone models is also within the scope of this book as are evaporation, sputter deposition and chemical vapour deposition. Thin films are widely used in microelectronics, chemistry and a wide array of related fields. This book offers new research in this exploding field.
Download or read book An Investigation Into Controlling the Growth Modes of Ferroelectric Thin Films Using Pulsed Laser Deposition and RHEED written by and published by . This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin film ferroelectricss are widely considered for tunable microwave applications, the reduced small dimensions leading to low tuning voltages. The incipient ferroelectric strontium titanate is an ideal solution for tunable microwave devices, particularly in conjunction with high temperature superconductors. It has no spontaneous polarisation yet possesses a large permittivity at low temperatures that is sensitive to an electric field bias with relatively low loss. For such applications it is essential to use a low loss substrate such as magnesium oxide. In general, thin films have less favourable dielectric properties compared with their bulk counterparts due to differences in microstructure. strontium titanate films on MgO substrate prove difficult to grow due to the high lattice mismatch and issues connected with chemical incompatibility at the film/substrate interface. It has been shown here that it is possible to engineer the growth mode of this system, altering the strain and the defect concentration. These are both known factors influencing the dielectric properties of thin films. Reflection high energy electron diffraction (RHEED) in combination with interval pulsed laser deposition (PLD) has been used to achieve a two dimensional, layer-by-layer growth mode. Crucial to this was the deposition of a unit-cell thick titanium dioxide buffer layer on the surface, the deposition of which was also controlled by RHEED. The growth mode and microstructure of films grown using standard PLD with and without the buffer layer and films grown by interval PLD with and without the buffer layer have been compared by analysis of the RHEED data and transmission electron microscopy. This is the first time layer-by-layer growth has been achieved in this highly-mismatched epitaxial systems. The results point the way towards control of defects in oxide thin films from which microstructure-property relationships may be more clearly determined.
Download or read book Laser Processing of Thin Films and Microstructures written by Ian W. Boyd and published by Springer Science & Business Media. This book was released on 2013-03-08 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro cessing of thin films, particularly, though by no means exclu sively, of recent progress in the dielectrics area. The volume covers all the major aspects of laser processing technology in general, from the background and history to its many potential applications, and from the theory to the necessary experimental considerations. It highlights and compares the vast array of processing conditions now available with intense photon beams, as well as the properties of the films and microstructures pro duced. Separate chapters deal with the fundamentals of laser interactions with matter, and with experimental considerations. Detailed consideration is also given to film deposition, nuclea tion and growth, oxidation and annealing, as well as selective and localized. etching and ablation, not only in terms of the various photon-induced processes, but also with respect to traditional as well as other competing new technologies.
Download or read book Thin Films and Heterostructures for Oxide Electronics written by Satishchandra B. Ogale and published by Springer Science & Business Media. This book was released on 2005-11-21 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.
Download or read book Thin Film Physics And Devices Fundamental Mechanism Materials And Applications For Thin Films written by Jianguo Zhu and published by World Scientific. This book was released on 2021-06-18 with total page 706 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films have an extremely broad range of applications from electronics and optics to new materials and devices. Collaborative and multidisciplinary efforts from physicists, materials scientists, engineers and others have established and advanced a field with key pillars constituting (i) the synthesis and processing of thin films, (ii) the understanding of physical properties in relation to the nanometer scale, (iii) the design and fabrication of nano-devices or devices with thin film materials as building blocks, and (iv) the design and construction of novel tools for characterization of thin films.Against the backdrop of the increasingly interdisciplinary field, this book sets off to inform the basics of thin film physics and thin film devices. Readers are systematically introduced to the synthesis, processing and application of thin films; they will also study the formation of thin films, their structure and defects, and their various properties — mechanical, electrical, semiconducting, magnetic, and superconducting. With a primary focus on inorganic thin film materials, the book also ventures on organic materials such as self-assembled monolayers and Langmuir-Blodgett films.This book will be effective as a teaching or reference material in the various disciplines, ranging from Materials Science and Engineering, Electronic Science and Engineering, Electronic Materials and Components, Semiconductor Physics and Devices, to Applied Physics and more. The original Chinese publication has been instrumental in this purpose across many Chinese universities and colleges.
Download or read book Handbook of Thin Film Deposition Processes and Techniques written by Krishna Seshan and published by William Andrew. This book was released on 2001-02-01 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt: New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Download or read book Epitaxial Oxide Thin Films II Volume 401 written by James S. Speck and published by . This book was released on 1996-03-29 with total page 588 pages. Available in PDF, EPUB and Kindle. Book excerpt: Our understanding and control of epitaxial oxide heterostructures has progressed along multiple frontiers including magnetic, dielectric, ferroelectric, and superconducting oxide materials. This has resulted in both independent rediscovery and the successful borrowing of ideas from ceramic science, solid-state physics, and semiconductor epitaxy. A new field of materials science has emerged which aims at the use of the intrinsic properties of various oxide materials in single-crystal thin-film form. Exploiting the potential of these materials, however, will only be possible if many fundamental and engineering questions can be answered. This book represents continued progress toward fulfilling that promise. Technical information on epitaxial oxide thin films from industry, academia and government laboratories is presented. Topics include: dielectrics; ferroelectrics; optics; superconductors; magnetics; magnetoresistance.
Download or read book Laser induced Thin Film Processing written by J. J. Dubowski and published by . This book was released on 1995 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ferroelectric Thin Films VIII Volume 596 written by R. W. Schwartz and published by . This book was released on 2000-08-17 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, the eighth in a popular series from MRS, features the latest technical information on ferroelectric thin films from an international mix of academia, industry and government organizations. Recent results for DRAM and FERAM devices, as well as enhancements in material performance for these applications, are presented. Significant advances in understanding leakage current, frequency dependence of the coercive field, hydrogen annealing effects, piezoelectric constants, and domain switching responses are highlighted. The development of ferroelectric thin films for piezoelectric applications are also reviewed, as are improved film-fabrication procedures including chemical vapor deposition and chemical solution deposition. Topics include: BST thin films and DRAM; integration and electrodes; Bi-based thin-film ferroelectrics; Pb-based thin-film ferroelectrics; fundamental properties of thin-film ferroelectrics; ferroelectric gate materials and devices; and piezoelectric, pyro-electric and capacitor devices and novel processing strategies.
