Download or read book Soft X Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2007-02-22 with total page 611 pages. Available in PDF, EPUB and Kindle. Book excerpt: This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Download or read book X Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2016 with total page 655 pages. Available in PDF, EPUB and Kindle. Book excerpt: Master the physics and understand the current applications of modern X-ray and EUV sources with this fully updated second edition.
Download or read book Extreme Nonlinear Optics written by Martin Wegener and published by Springer Science & Business Media. This book was released on 2006-03-30 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt: Following the birth of the laser in 1960, the field of "nonlinear optics" rapidly emerged. Today, laser intensities and pulse durations are readily available, for which the concepts and approximations of traditional nonlinear optics no longer apply. In this regime of "extreme nonlinear optics," a large variety of novel and unusual effects arise, for example frequency doubling in inversion symmetric materials or high-harmonic generation in gases, which can lead to attosecond electromagnetic pulses or pulse trains. Other examples of "extreme nonlinear optics" cover diverse areas such as solid-state physics, atomic physics, relativistic free electrons in a vacuum and even the vacuum itself. This book starts with an introduction to the field based primarily on extensions of two famous textbook examples, namely the Lorentz oscillator model and the Drude model. Here the level of sophistication should be accessible to any undergraduate physics student. Many graphical illustrations and examples are given. The following chapters gradually guide the student towards the current "state of the art" and provide a comprehensive overview of the field. Every chapter is accompanied by exercises to deepen the reader's understanding of important topics, with detailed solutions at the end of the book.
Download or read book Voyager 1 Encounter with Jupiter written by United States. National Aeronautics and Space Administration and published by . This book was released on 1979 with total page 48 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Vortex Dynamics and Optical Vortices written by Hector Perez-De-Tejada and published by BoD – Books on Demand. This book was released on 2017-03-01 with total page 346 pages. Available in PDF, EPUB and Kindle. Book excerpt: The contents of the book cover a wide variety of topics related to the analysis of the dynamics of vortices and describe the results of experiments, computational modeling and their interpretation. The book contains 13 chapters reaching areas of physics in vortex dynamics and optical vortices including vortices in superfluid atomic gases, vortex laser beams, vortex-antivortex in ferromagnetic hybrids, and optical vortices illumination in chiral nanostructures. Also, discussions are presented on particle motion in vortex flows, on the simulation of vortex-dominated flows, on vortices in saturable media, on achromatic vortices, and on ultraviolet vortices. Fractal light vortices, coherent vortex beams, together with vortices in electric dipole radiation, and spin wave dynamics in magnetic vortices are examined as well.
Download or read book Spectroscopy for Materials Characterization written by Simonpietro Agnello and published by John Wiley & Sons. This book was released on 2021-09-08 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt: SPECTROSCOPY FOR MATERIALS CHARACTERIZATION Learn foundational and advanced spectroscopy techniques from leading researchers in physics, chemistry, surface science, and nanoscience In Spectroscopy for Materials Characterization, accomplished researcher Simonpietro Agnello delivers a practical and accessible compilation of various spectroscopy techniques taught and used to today. The book offers a wide-ranging approach taught by leading researchers working in physics, chemistry, surface science, and nanoscience. It is ideal for both new students and advanced researchers studying and working with spectroscopy. Topics such as confocal and two photon spectroscopy, as well as infrared absorption and Raman and micro-Raman spectroscopy, are discussed, as are thermally stimulated luminescence and spectroscopic studies of radiation effects on optical materials. Each chapter includes a basic introduction to the theory necessary to understand a specific technique, details about the characteristic instrumental features and apparatuses used, including tips for the appropriate arrangement of a typical experiment, and a reproducible case study that shows the discussed techniques used in a real laboratory. Readers will benefit from the inclusion of: Complete and practical case studies at the conclusion of each chapter to highlight the concepts and techniques discussed in the material Citations of additional resources ideal for further study A thorough introduction to the basic aspects of radiation matter interaction in the visible-ultraviolet range and the fundamentals of absorption and emission A rigorous exploration of time resolved spectroscopy at the nanosecond and femtosecond intervals Perfect for Master and Ph.D. students and researchers in physics, chemistry, engineering, and biology, Spectroscopy for Materials Characterization will also earn a place in the libraries of materials science researchers and students seeking a one-stop reference to basic and advanced spectroscopy techniques.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book The Spectroscopy of the Extreme Ultraviolet written by Theodore Lyman (Writer on Physics.) and published by . This book was released on 1914 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Extreme Ultraviolet Astronomy written by Roger F. Malina and published by Elsevier. This book was released on 2013-10-22 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: The field of extreme ultraviolet astronomy will see two major satellite observatories to be launched in 1991, one by ESA (ROSAT mission), one by NASA (EUVE mission). These Proceedings discuss the potential for EUV Astronomy, results from recent missions, approved and possible future missions and new developments in EUV technology.
Download or read book Extreme Ultraviolet Astronomy written by Martin A. Barstow and published by Cambridge University Press. This book was released on 2003-03-13 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the development of astronomy in the Extreme Ultraviolet wavelength range, from the first rocket-based experiments to later satellite missions. It will be of great value to graduate students and researchers.
Download or read book On the Spectra of Helium Hydrogen and Carbon in the Extreme Ultraviolet written by John Cunningham McLennan and published by . This book was released on 1921 with total page 28 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultraviolet and X ray Spectroscopy of the Solar Atmosphere written by Kenneth J. H. Phillips and published by Cambridge University Press. This book was released on 2008-06-26 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book explores features of the Sun's atmosphere, for graduate students/researchers in astrophysics and solar physics.
Download or read book Spectra of Hydrogen Nitrogen and Oxygen in the Extreme Ultraviolet written by John Joseph Hopfield and published by . This book was released on 1923 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Efficient Extreme Ultra Violet Mirror Design written by Yen-Min Lee and published by IOP Publishing Limited. This book was released on 2021-09-23 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Key Features Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography. Establishes a relation between photonic bands and Fresnel's equation. Introduces the high reflectivity EUV mirror design rules. Applies numerical simulation for EUV mirror design. Details efficient finite-difference time-domain (FDTD) approach.
Download or read book Astrophysics in the Extreme Ultraviolet written by Stuart Bowyer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 603 pages. Available in PDF, EPUB and Kindle. Book excerpt: From the beginning of Space Astronomy, the Extreme Ultraviolet band of the spectrum (roughly defined as the decade in energy from 90-900 Å) was deemed to be the `unobservable ultraviolet'. Pioneering results from an EUV telescope on the Apollo-Soyuz Mission in 1975 forcibly demonstrated that this view was incorrect; but it required the all-sky surveys of the English Wide-Field Camera and the Extreme Ultraviolet Explorer to demonstrate the broad potential of this field. Over 700 EUV sources have now been detected. Over 150 researchers from 16 countries gathered to share results in this new field at the International Astronomical Union Colloquium No. 152. Papers were presented on a wide variety of topics including cool star coronae, white dwarf atmospheres and evolution, neutron stars, the Io torus, cataclysmic variable stars, active galactic nuclei, the interstellar medium, winds and atmospheres of early type stars, and EUV plasma diagnostics. Selected manuscripts from this meeting are provided in these Conference Proceedings.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
