Download or read book The Selective Low Pressure Chemical Vapor Deposition of Tungsten on Silicon Implanted SiO2 S written by William A. Hennessy and published by . This book was released on 1987 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Selective Low Pressure Chemical Vapor Deposition of TaSi 2 on Silicon written by Thomas P. Wendling and published by . This book was released on 1990 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.

Download or read book Selective Low Pressure Chemical Vapor Deposition of TaSi 2 on Silicon written by Thomas P. Wendling and published by . This book was released on 1991 with total page 157 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Tungsten and Other Refractory Metals for VLSI Applications II Volume 2 written by Eliot K. Broadbent and published by . This book was released on 1987-12 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Download or read book A Multilevel Planar Interconnect Technology Utilizing the Selective Deposition of Tungsten written by David Charles Thomas and published by . This book was released on 1990 with total page 490 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Microstructural Characterization of LPCVD Low Pressure Chemical Vapor Deposition Tungsten Interfaces written by D. C. Paine and published by . This book was released on 1985 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: Three important interfacial morphologies are observed in LPCVD tungsten on silicon: lateral encroachment, interface roughness, and wormhole structures. They have been shown to be, in part at least, a result of defect condition. Defects which have been positively identified using XTEM include residual native oxide and dislocations from ion implantation. A third phase, possibly tungsten silicide, has been observed but not uniquely identified. Extensive lateral encroachment has been shown to be related to the presence of residual implant damage. Specifically, dislocation loops under oxide grown over arsenic implanted silicon were implicated. Interface roughness appears to result from both residual native oxide patches on the silicon surface as well as to the formation of small protrusions of a third, probably silicide phase. The electron microscopy techniques of microdiffraction and Moire analysis were used in an attempt to identify the third phase. The presence of a third phase has lead to the proposal of a mechanism for the formation of the wormhole structure. Additional work, currently underway, will establish the identity of both the interfacial phase and the wormhole particles.

Download or read book Investigation of the Selective Low Pressure Chemical Vapour Deposition of Tungsten written by John A. MacMillan and published by . This book was released on 1992 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Low Pressure Chemical Vapor Deposition of Silicon Dioxide from Tetraethylorthosilicate written by Frank Allen Shemansky and published by . This book was released on 1991 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book A Study of the Low Pressure Chemical Vapor Deposition of Tungsten for Applications in Integrated Circuits written by Han-Cheng Wulu and published by . This book was released on 1989 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Study of Selective CVD Tungsten as a Diffusion Barrier for Electroless Copper Depositions written by Yeeli Lee and published by . This book was released on 1994 with total page 96 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten written by Kumar P. Krishnamani and published by . This book was released on 1985 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Low Pressure Chemical Vapor Deposition LPCVD of Silicon Dioxide at High Temperatures written by Ara Philipossian and published by . This book was released on 1985 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Symposia on Interconnects Contact Metallization and Multilevel Metallization and Reliability for Semiconductor Devices Interconnects and Thin Insulator Materials written by T. O. Herndon and published by . This book was released on 1993 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten Silicide written by Damodaran Srinivas and published by . This book was released on 1989 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Microscopy of Semiconducting Materials 1987 Proceedings of the Institute of Physics Conference Oxford University April 1987 written by A.G. Cullis and published by CRC Press. This book was released on 2021-02-01 with total page 836 pages. Available in PDF, EPUB and Kindle. Book excerpt: The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.

Download or read book Tungsten and Other Advanced Metals for VLSI ULSI Applications written by and published by . This book was released on 1990 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: