Download or read book The Preparation and Characterization of RF Reactively Sputtered Nickel Zinc Ferrite Thin Films written by Thomas Lee Ritzdorf and published by . This book was released on 1989 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media written by Jong-Kai Lin and published by . This book was released on 1986 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Preparation and Characterization of Reactive RF Sputtered Nitride Thin Films written by Geok Loo Chen and published by . This book was released on 1999 with total page 226 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Masters Theses in the Pure and Applied Sciences written by Wade H. Shafer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 421 pages. Available in PDF, EPUB and Kindle. Book excerpt: Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS) * at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dissemination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all con cerned if the printing and distribution of the volumes were handled by an interna tional publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Cor poration of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 34 (thesis year 1989) a total of 13,377 theses titles from 26 Canadian and 184 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this important annual reference work. While Volume 34 reports theses submitted in 1989, on occasion, certain univer sities do report theses submitted in previous years but not reported at the time.
Download or read book The Preparation Characterization and Tribological Study of RF Sputtered Thin Films for Magnetic Memory Disk written by Chengyea Leu and published by . This book was released on 1987 with total page 638 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fabrication of Zinc Nitride Thin Films Using RF Magnetron Sputtering Deposition for Optoelectronic Applications written by Ting Wen and published by . This book was released on 2012 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt: Zinc nitride thin films possess a small optical band gap with direct transition, low resistivity, high mobility and carrier concentration. Therefore, it may be suitable as an optoelectronic material for infrared sensors, smart windows and energy conversion devices. The objective of this work is to grow zinc nitride thin films using RF magnetron sputtering, understand its mechanical, optical, and electrical properties, and investigate its performance as light sensing devices. Synthesis and characterization of zinc nitride thin films has been investigated in this work. An RF magnetron sputtering deposition was employed to synthesize zinc nitride thin films using pure metal zinc target in either N2-Ar or N2-Ar-H2 mixtures. The microstructural, optical and electrical characterizations of the representative films were investigated with stylus profilometry, XRD, AFM, SEM, TEM, UV-VIS-NIR double beam spectrometry, and Hall effect measurement. The photoresponse of the zinc nitride photoconductors was also studied under the irradiation of white light and NIR light. The as-deposited zinc nitride thin films were relatively soft and densely packed with smooth surface. It possesses a narrow optical band gap in the NIR range with direct transition. The zinc nitride showed n-type conductivity with low resistivity and high carrier concentration. To study the RF discharge power effect, the zinc nitride thin films were synthesized at different discharge powers densities. With discharge power density increasing, the film deposition rate increased, and the zinc nitride films acquired better crystalline structure, smaller optical band gap and less oxygen contaminations. After thermal annealing at moderate temperatures in either air or O2, the annealed zinc nitride thin films were photoconductive under irradiation of both NIR light and white light. The largest photoresponse and fastest response times were measured at the room temperature for the zinc nitride thin films annealed at 300 degree in the air. Hydrogen inclusion can modify the electrical and optical properties of crystalline semiconductor films by introducing impurity donor states. The ZnNx:H films deposited in N2-Ar-H2 mixture acquired less oxygen contamination and higher relative nitrogen atom concentration than the ZnNx films deposited in N2-Ar mixture. The as-deposited ZnNx:H films showed a clear photonic behavior under white light irradiation, and the annealed ZnNx:H films exhibited a pronounced change in resistance under both white light and NIR light irradiation comparing to the annealed ZnNx films. This was the first time to report photoresponse of zinc nitride thin films fabricated by reactive sputtering method. The photoconductivity was gradually improved by optimization of deposition conditions, annealing conditions and film compositions.
Download or read book Graduate School Commencement written by University of Minnesota. Graduate School and published by . This book was released on 1989 with total page 80 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Preparation and Characterization of Dielectric Thin Films by RF Magnetron Sputtering with Ba0 3Sr0 7 Zn1 written by Feng Shi and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization of Zinc Oxide Thin Films Prepared by Liquid Phase Deposition and RF Sputtering written by 李榕峻 and published by . This book was released on 2008 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Preparation and Characterization of Dielectric Thin Films by RF Magnetron Sputtering with Ba0 3Sr0 7 Zn1 3Nb2 3 O3 Ceramic Target written by Feng Shi and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Preparation and Characterization of Dielectric Thin Films by RF Magnetron-Sputtering with (Ba0.3Sr0.7)(Zn1/3Nb2/3)O3 Ceramic Target.
Download or read book Preparation and Characterization of Lithium Thiogermanate Thin Films Using RF Magnetron Sputtering written by Bryce W. Campbell and published by . This book was released on 2006 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ceramic Abstracts written by American Ceramic Society and published by . This book was released on 1996 with total page 1000 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Growth Optimization and Characterization of Reactively Sputtered Zirconium Nitride Thin Films for III V Buffer Layer Applications written by and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Zirconium nitride (ZrN) thin films were deposited by reactive dc magnetron sputtering to assess the effects of processing conditions upon film properties. Processing conditions and parameters were optimized to generate films of completely oriented (111) ZrN on silicon to be used as buffer layers for the growth of gallium nitride A single and double Langmuir probe were used to determine trends in electron temperature, ion density, ionization fraction, and floating potential during reactive sputtering of zirconium in argon and nitrogen. Reactive gas concentration, deposition pressure, deposition temperature, cathode current, film thickness and substrate orientation were investigated as variable processing conditions. Four-point probe, scanning electron microscopy (SEM), transmission electron microscopy (TEM), Raman spectroscopy, and x-ray diffraction (XRD) were used to characterize thin films produced. The optimum growth conditions for the (111) oriented growth of ZrN, for this work, were found to occur during reactive magnetron sputtering at a deposition temperature of 500 & deg;C, a constant cathode current of 0.5 ampere, a deposition pressure of 15 mTorr, a reactive nitrogen gas concentration of 4% in argon, deposited on (111) oriented silicon, with a thickness on the order of 600 nanometers. Gallium nitride was then deposited on films of ZrN to assess the crystallinity of films produced. The lattice mismatch between (111) oriented ZrN and c-axis oriented GaN was calculated at 1.6%. Microscopic evaluation showed the films to be of columnar structure with dense grains and smooth surfaces. A change in preferred orientation was noticed as a function of increasing film thickness and cathode current and was determined to be due to an increase in ion channeling and bombardment energy.
Download or read book Current Programs written by and published by . This book was released on 1977 with total page 506 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Comprehensive Dissertation Index written by and published by . This book was released on 1989 with total page 1116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1058 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition 1960 1980 written by Donald T. Hawkins and published by Springer. This book was released on 1981-11-30 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:
