Download or read book The Effect of Deposition Pressure on Stress in Sputtered Molybdenum Thin Films written by Scott Sheppard and published by . This book was released on 1998 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: It is known that deposition parameters such as pressure, geometry, and deposition device affect the state of stress in a thin film (Thornton and Hoffman). We decided to find the stress vs. deposition pressure curve for a sputtered metal thin film. All other deposition variables remained the same for each film deposited. We looked at measuring the stress incurred in the thin film by x-ray diffraction and geometrical techniques. Measuring this stress dependence on pressure for sputtered thin films has been done for many metals already. It has been found that at low sputter pressures the stress tends to be compressive. As the sputter pressure is increased the stress gradually approaches the critical pressure. i.e, the pressure at which the thin film has zero stress. The stress then becomes tensile as the pressure is increased beyond the critical pressure. The tensile stress will peak at a certain pressure and eventually level off at a low tensile stress as the pressure is increased further. We are attempting to find this curve for a metal this hasn't been done for yet. A new technique for measuring the stress by geometrical optics is also being tested by comparing the results to x-ray stress measurements.
Download or read book Thin Film Materials written by L. B. Freund and published by Cambridge University Press. This book was released on 2004-01-08 with total page 772 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.
Download or read book Deposition of Sputtered Molybdenum Disulfide Films and Friction Characteristics of Such Films in Vacuum written by Talivaldis Spalvins and published by . This book was released on 1967 with total page 18 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Micromachining of Molybdenum and Tungsten Silicide Thin Films written by Muh-Ling Ger and published by . This book was released on 1994 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Deposition Characterization of Molybdenum Thin Films written by Majid Khan and published by LAP Lambert Academic Publishing. This book was released on 2012-07 with total page 96 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of this work is to prepare Molybdenum thin films to be used as efficient back contact materials and utilize characterization techniques for the investigation of the growth as well the physical properties of Mo thin films deposited through DC-plasma magnetron sputtering on soda lime glass substrate. The effects of process parameters, such as Ar pressure, deposition power and substrate temperature, on the properties of the deposited films have been studied. These process parameters were optimized to get high conductivity Mo thin films to be used in CIGS based thin films solar cells as a back contact.
Download or read book Tantalum Thin Films written by William Dickson Westwood and published by . This book was released on 1975 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Density Profiles in Sputtered Molybdenum Thin Films and Their Effects on Sodium Diffusion in Cu InxGa1 x Se2 Photovoltaics written by and published by . This book was released on 2011 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molybdenum (Mo) thin films were sputtered onto soda lime glass (SLG) substrates. The main variable in the deposition parameters, the argon (Ar) pressure pAr, was varied in the range of 6 - 20 mTorr. Ex situ spectroscopic ellipsometry (SE) was performed to find out that the dielectric functions of the Mo films were strongly dependent on pAr, indicating a consistent and significant decrease in the Mo film density pMo with increasing pAr. This trend was confirmed by high-angle-annular-dark-field scanning transmission electron microscopy. Dielectric functions of Mo were then found to be correlated with secondary ion mass spectroscopy profiles of Sodium (Na) in the Cu(InxGa1-x)Se2 (CIGS) layer grown on top of Mo/SLG. Therefore, in situ optical diagnostics can be applied for process monitoring and optimization in the deposition of Mo for CIGS solar cells. Such capability is demonstrated with simulated optical transmission and reflectance of variously polarized incident light, using dielectric functions deduced from SE.
Download or read book Sputtered Thin Films written by Frederick Madaraka Mwema and published by CRC Press. This book was released on 2021-04-12 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sputtered Thin Films: Theory and Fractal Descriptions provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes. Part 1 of the book describes the basics and theory of thin film sputtering and fractals. Part 2 consists of examples illustrating specific descriptions of thin films using fractal methods. Discusses thin film growth, structure, and properties Covers fractal theory Presents methods of fractal measurements Offers typical examples of fractal descriptions of thin films grown via magnetron sputtering processes Describes application of fractal theory in prediction of thin film growth and properties This reference book is aimed at engineers and scientists working across a variety of disciplines including materials science and metallurgy as well as mechanical, manufacturing, electrical, and biomedical engineering.
Download or read book Metallurgical Coatings and Thin Films 1992 written by G.E. McGuire and published by Elsevier. This book was released on 2012-12-02 with total page 638 pages. Available in PDF, EPUB and Kindle. Book excerpt: One of the increasingly important requirements for high technology materials is that they possess near-surface properties different to their bulk properties. Specific surface properties are generally achieved through the use of these films or coatings or by modifying the structure or composition of the near surface. This two-volume work contains 157 papers covering a wide range of topics involving films, coatings, and modified surfaces. All aspects of the development of deposition technologies are addressed including basic research, applied research, applications development and full scale industrial production. The work will be of interest to materials scientists, physicists, electronic, chemical and mechanical engineers, and chemists.
Download or read book Reactive Sputter Deposition of Molybdenum Nitride Thin Films written by Yimin Wang and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Molybdenum nitride thin film was deposited on silicon wafer by the reactive sputter deposition. Single phase?6Mo 2 N thin film was obtained with N 2 /(Ar+N 2) flow ratios in sputtering gas varying from 10% to 30% whereas an amorphous structure was obtained at N2/(Ar+N2) flow ratios of 50%. The deposition rate of the molybdenum nitride thin film varies significantly as nitrogen partial pressure in sputtering gas increases. A decrease in peak intensity along with peak shift and broadening was observed in X-ray diffraction spectra as the nitrogen partial pressure sputtering gas increased. The XPS analysis of the as-deposited thin films shows that the Mo 3d 3/2, Mo 3d 5/2 and Mo 2p 3/2 peak gradually shift to the higher binding energy direction as nitrogen partial pressure is increasing. The intensity of N 1s peak also increase with increasing nitrogen partial pressure. Although the XRD examination shows no evidence of long range order of the phase structure for the amorphous thin film sputtered at 50% N 2 /(Ar+N 2) flow ratio, the existence of Mo6N bond in the film was confirmed by XPS examination. The nitrogen partial pressure in the sputtering gas was found to have significant influence on the surface morphologies and cross section structures of the thin film. Thermal annealing of the amorphous thin film in a nitrogen atmosphere revealed that the film could survive 700ʻC,5min thermal annealing without obvious crystallization but failed after 800ʻC,5min thermal annealing, in which the crystalline?-Mo 2 N and h6MoSi 2 phases were observed simultaneously.
Download or read book Sputter deposition and Characterization of Molybdenum Disulfide Thin Films written by Jacob Aferi Obeng and published by . This book was released on 1992 with total page 322 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Physical Vapor Deposition PVD Processing written by Donald M. Mattox and published by William Andrew. This book was released on 1998-12-31 with total page 1061 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired.The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Download or read book Introduction to the Characterization of Residual Stress by Neutron Diffraction written by M.T. Hutchings and published by CRC Press. This book was released on 2005-02-28 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the past 25 years the field of neutron diffraction for residual stress characterization has grown tremendously, and has matured from the stage of trial demonstrations to provide a practical tool with widespread applications in materials science and engineering. While the literature on the subject has grown commensurately, it has also remained
Download or read book Advanced Strategies in Thin Film Engineering by Magnetron Sputtering written by Alberto Palmero and published by MDPI. This book was released on 2020-12-10 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-12-31 with total page 657 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
