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Book Modified Reactive Sputter Deposition of Titanium Nitride Thin Films Via HiPIMS with Kick pulse and Improvement of the Structure zone Model

Download or read book Modified Reactive Sputter Deposition of Titanium Nitride Thin Films Via HiPIMS with Kick pulse and Improvement of the Structure zone Model written by Andrew J. Miceli and published by . This book was released on 2023 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Direct current (DC) and radio frequency (RF) sputtering methods have been commonplace in industry for several decades and widely studied in literature. Hard films of nitrides, such as titanium nitride (TiN), have been deposited using reactive DC sputtering onto cutting tools and medical devices extensively as well. For these applications, the films require excellent adhesion, high density, and high hardness. High-Power Impulse Magnetron Sputtering (HIPIMS) has emerged over the last several years as a method to produce films with increased density and mechanical properties. Process-structure-property relationships for reactive HIPIMS are not yet well developed. Additionally, conventional HIPIMS suffers from relatively low deposition rates, which becomes a challenge or barrier of adoption for applied TiN coatings that are typically greater than several microns in thickness. This work aims to look at increasing this deposition rate while maintaining the beneficial effects of HIPIMS by utilizing the short duration "kick-pulse" in the voltage/current cycle, leading to higher instantaneous deposition rates and increased adatom energy level. TiN films are deposited onto silicon (Si) wafers under varied reactive sputtering conditions, including DC, HIPIMS, and HIPIMS with kick-pulse. Structural characterizations are performed using scanning electron microscopy (SEM) and X-ray diffraction (XRD). Optical properties of the resulting films are also characterized using reflection UV-Vis spectroscopy. The deposition rate, morphology, and chemical composition of the films are highly affected by the processing conditions, with the kick-pulse producing significant increase in deposition rate and observed grain size. Further investigation will aim to develop a modified structural zone model to include HIPIMS with and without kick-pulse.

Book Physical Properties of Thin Film  Metastable Titanium 0 5 aluminum 0 5 nitrogen Alloys Deposited by Reactive Magnetron Sputtering

Download or read book Physical Properties of Thin Film Metastable Titanium 0 5 aluminum 0 5 nitrogen Alloys Deposited by Reactive Magnetron Sputtering written by Dale Charles McIntyre and published by . This book was released on 1989 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Metastable, NaCl-structure, polycrystalline Ti$sb{0.5}$Al$sb{0.5}$N films, 3-5 $mu$m thick, have been deposited on stainless-steel substrates by d.c. reactive magnetron sputtering. The effects of low-energy (E $leq$ 250 eV) ion bombardment during deposition on thin film microstructure, oxidation properties, and optical reflectance of the metastable alloy were evaluated. The ion flux to deposition flux ratio was about unity and for an applied substrate bias V$sb{rm s}$, the average energy of the ions impinging on the growing film was $simeq$ eV$sb{rm s}$, for V$sb{rm s}$ $geq$ 50 V. Films deposited with V$sb{rm s}$ = 0 had a columnar microstructure, low dislocation density, and were voided and porous. The primary effect of ion-irradiation at low acceleration energies (V$sb{rm s}$ $leq$ 120 V) was film densification by the elimination of voids and pores, while at higher energies (V$sb{rm s}$ $>$ 120 V) the primary effect of ion-bombardment was an increase in dislocation density. Films deposited with V$sb{rm s}$ of O and 150 V were oxidized in O$sb2$ at temperatures between 750$spcirc$C and 900$spcirc$C. Oxidation involved both the initial formation of an oxide overlayer and the subsequent growth of oxide crystallites. The diffusion limited growth of the oxide overlayer involved the transport of Al and O through a Al-rich oxide/Ti-rich oxide bilayer and followed the same kinetics for both 0 and 150 V films. The oxide crystallites, primarily composed of Ti and O, were first observed at tensile cracks in the V$sb{rm s}$ = 0 films when oxide overlayer thicknesses, d$sb{rm ox}$, were approximately 150 nm, and were also later observed at intragranular defects when d$sb{rm ox}$ $simeq$ 400 nm. The initial appearance of crystallites was observed at larger d$sb{rm ox}$ for the V$sb{rm s}$ = 150 V samples. The optical reflectance, R, of the metastable films was measured in the visible and infrared spectral regions at wavelengths, $lambda$, in the range 250 nm $leq$ $lambda$ $leq$ 2400 nm. The near-infrared R the films showed the most dependence on V$sb{rm s}$, because of the variation in conduction-electron mobility with film defect density. Valance-band spectra from Ti$sb{0.5}$Al$sb{0.5}$N, collected using X-ray photoemission spectroscopy, showed that metastable Ti$sb{0.5}$Al$sb{0.5}$N had $simeq$ 40% fewer conduction electrons than NaCl structure TiN.

Book Photoelectrochemical Water Splitting

Download or read book Photoelectrochemical Water Splitting written by Inamuddin and published by Materials Research Forum LLC. This book was released on 2020-04-05 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt: Photoelectrochemical (PEC) water splitting is a highly promising process for converting solar energy into hydrogen energy. The book presents new cutting-edge research findings in this field. Subjects covered include fabrication and characteristics of various electrode materials, cell design and strategies for enhancing the properties of PEC electrode materials. Keywords: Renewable Energy Sources, Solar Energy Conversion, Hydrogen Production, Photoelectrochemical Water Splitting, Electrode Materials for Water Splitting, Transition Metal Chalcogenide Electrodes, Narrow Bandgap Semiconductor Electrodes, Ti-based Electrode Materials, BiVO4 Photoanodes, Noble Electrode Materials, Cell Design for Water Splitting.

Book Surface Modifications and Growth of Titanium Dioxide for Photo Electrochemical Water Splitting

Download or read book Surface Modifications and Growth of Titanium Dioxide for Photo Electrochemical Water Splitting written by John Alexander and published by Springer. This book was released on 2016-05-21 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: This outstanding thesis provides a wide-ranging overview of the growth of titanium dioxide thin films and its use in photo-electrochemicals such as water splitting. The context for water splitting is introduced with the theory of semiconductor-liquid junctions, which are dealt with in detail. In particular plasmonic enhancement of TiO2 by the addition of gold nanoparticles is considered in depth, including a thorough and critical review of the literature, which discusses the possible mechanisms that may be at work. Plasmonic enhancement is demonstrated with gold nanoparticles on Nb-doped TiO2. Finally, the use of temperature and pressure to control the phase and morphology of thin films grown by pulsed laser deposition is presented.

Book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films

Download or read book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films written by Polly Wanda Chu and published by . This book was released on 1994 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.

Book Reactive Sputter Deposition

Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Book Structure and Properties of Plasma Deposited Titanium Nitride and Titanium Oxynitride

Download or read book Structure and Properties of Plasma Deposited Titanium Nitride and Titanium Oxynitride written by Edward Francis Gleason and published by . This book was released on 1987 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films

Download or read book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films written by David Christopher Gilmer and published by . This book was released on 1998 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book TiA1N Films Deposited by AC Reactive Magnetron Sputtering

Download or read book TiA1N Films Deposited by AC Reactive Magnetron Sputtering written by George Clinton Vandross and published by . This book was released on 2012 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt: TiAlN films were deposited on glass substrates by AC magnetron sputtering at 2 kW with constant Argon and Nitrogen gas flow rates to study the effects of positioning on the deposited films. The deposition system used was an ICM-10 IsoFlux cylindrical magnetron sputtering chamber. The samples were placed in different positions and tilts with respect to the location of the Titanium and Aluminum targets in the chamber. It was found that with change in position and application of tilts, deposited films acquired different physical and chemical properties. It is believed that the differences in these properties were caused by to the change in the incident angle of bombardment of the samples, and the change in surface areas of the samples presented to the targets at each location. As related to the physical traits of the samples, analysis using Scanning Electron Microscopy of the samples displayed variations in the topography, where differences in grain density could be noted as well as structure formations. The chemical properties were also noted to be affected by the variation of tilt and position applied to the sample. X-ray Diffraction Spectroscopy analysis of the samples showed the intensity of the TiAlN characteristic peak of the samples to differ from sample to sample. Results from the XRD analysis of this work showed a 157% and 176% increase in peak intensity of the 0° tilt sample of the Bottom Plate from the 45° tilt sample and 60° tilt sample respectively of the same plate. The results from the XRD analysis of this work also showed a 74% and 151% increase of the peak intensity for the 0° tilt sample of the Middle Plate when compared to the 45° tilt sample and 60° tilt sample respectively of the same plate. Whereas results for this work showed a 54% and 41% decrease in peak intensity of the 0° tilt sample of the Top Plate from the 45° tilt sample and 60° tilt sample respectively of the same plate. Energy Dispersive X-ray Spectroscopy was also performed and showed the deposited elements in each sample. A relationship between the distance from sample to target, and applied tilt of sample to the amount of Ti concentration was generated using the peak intensity information from the EDX. EDX analysis showed that as tilt was applied and the incident angle of bombardment approaches 0° the Ti concentration increased.

Book Energy Technology 2019

Download or read book Energy Technology 2019 written by Tao Wang and published by Springer. This book was released on 2019-02-09 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt: This collection addresses the need for sustainable technologies with reduced energy consumption and pollutants and the development and application of alternative sustainable energy to maintain a green environment and energy supply. Contributions focus on energy-efficient technologies including innovative ore beneficiation, smelting technologies, and recycling and waste heat recovery, as well as emerging novel energy technologies. Papers also cover various technological aspects of sustainable energy ecosystems, processes that improve energy efficiency, reduce thermal emissions, and reduce carbon dioxide and other greenhouse emissions. Papers from the following symposia are presented in the book: Energy Technologies and Carbon Dioxide Management Solar Cell Silicon Advanced Materials for Energy Conversion and Storage

Book Physics Briefs

Download or read book Physics Briefs written by and published by . This book was released on 1994 with total page 1118 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Self diffusion and Impurity Diffusion in Pure Metals

Download or read book Self diffusion and Impurity Diffusion in Pure Metals written by Gerhard Neumann and published by Elsevier. This book was released on 2011-08-19 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diffusion in metals is an important phenomenon, which has many applications, for example in all kinds of steel and aluminum production, and in alloy formation (technical applications e.g. in superconductivity and semiconductor science). In this book the data on diffusion in metals are shown, both in graphs and in equations. Reliable data on diffusion in metals are required by researchers who try to make sense of results from all kinds of metallurgical experiments, and they are equally needed by theorists and computer modelers. The previous compilation dates from 1990, and measurements relying on the electron microprobe and the recent Rutherford backscattering technique were hardly taken into account there. This reference book, containing all results on self-diffusion and impurity diffusion in pure metals with an indication of their reliability, will be useful to everyone in this field for the theory, fundamental research and industrial applications covered. • Up-to-date and complete (including EPMA and RBS investigations) • Indication of reliability of the measurements • Reassessment of many early results • Data can easily be extracted from Tables and Graphs

Book Niobium Nitride Based Thin Films Deposited by DC Reactive Magnetron Sputtering

Download or read book Niobium Nitride Based Thin Films Deposited by DC Reactive Magnetron Sputtering written by Moushab Benkahoul and published by . This book was released on 2005 with total page 82 pages. Available in PDF, EPUB and Kindle. Book excerpt: