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Book Some Properties of Thin Metal Films in Reacting and Non reacting Substrates

Download or read book Some Properties of Thin Metal Films in Reacting and Non reacting Substrates written by J. B. Al-Dabbagh and published by . This book was released on 1989 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Chemisorption and Reactions on Metallic Films

Download or read book Chemisorption and Reactions on Metallic Films written by J. R. Anderson and published by . This book was released on 1971 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemisorption And Reactions On Metallic Films V2 ...

Book The Physical Properties of Thin Metal Films

Download or read book The Physical Properties of Thin Metal Films written by G.P. Zhigal'skii and published by CRC Press. This book was released on 2003-07-10 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films of conducting materials, such as metals, alloys and semiconductors are currently in use in many areas of science and technology, particularly in modern integrated circuit microelectronics that require high quality thin films for the manufacture of connection layers, resistors and ohmic contacts. These conducting films are also important for fundamental investigations in physics, radio-physics and physical chemistry. Physical Properties of Thin Metal Films provides a clear presentation of the complex physical properties particular to thin conducting films and includes the necessary theory, confirming experiments and applications. The volume will be an invaluable reference for graduates, engineers and scientists working in the electronics industry and fields of pure and applied science.

Book Thin metal films on weakly interacting substrates

Download or read book Thin metal films on weakly interacting substrates written by Andreas Jamnig and published by Linköping University Electronic Press. This book was released on 2020-09-30 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt: Vapor-based growth of thin metal films with controlled morphology on weakly-interacting substrates (WIS), including oxides and van der Waals materials, is essential for the fabrication of multifunctional metal contacts in a wide array of optoelectronic devices. Achieving this entails a great challenge, since weak film/substrate interactions yield a pronounced and uncontrolled 3D morphology. Moreover, the far-from-equilibrium nature of vapor-based film growth often leads to generation of mechanical stress, which may further compromise device reliability and functionality. The objectives of this thesis are related to metal film growth on WIS and seek to: (i) contribute to the understanding of atomic-scale processes that control film morphological evolution; (ii) elucidate the dynamic competition between nanoscale processes that govern film stress generation and evolution; and (iii) develop methodologies for manipulating and controlling nanoscale film morphology between 2D and 3D. Investigations focus on magnetron sputter-deposited Ag and Cu films on SiO2 and amorphous carbon (a-C) substrates. Research is conducted by strategically combining of in situ and real-time film growth monitoring, ex situ chemical and (micro)-structural analysis, optical modelling, and deterministic growth simulations. In the first part, the scaling behavior of characteristic morphological transition thicknesses (i.e., percolation and continuous film formation thickness) during growth of Ag and Cu films on a-C are established as function of deposition rate and temperature. These data are interpreted using a theoretical framework based on the droplet growth theory and the kinetic freezing model for island coalescence, from which the diffusion rates of film forming species during Ag and Cu growth are estimated. By combining experimental data with ab initio molecular dynamics simulations, diffusion of multiatomic clusters, rather than monomers, is identified as the rate-limiting structure-forming process. In the second part, the effect of minority metallic or gaseous species (Cu, N2, O2) on Ag film morphological evolution on SiO2 is studied. By employing in situ spectroscopic ellipsometry, it is found that addition of minority species at the film growth front promotes 2D morphology, but also yields an increased continuous-layer resistivity. Ex situ analyses show that 2D morphology is favored because minority species hinder the rate of coalescence completion. Hence, a novel growth manipulation strategy is compiled in which minority species are deployed with high temporal precision to selectively target specific film growth stages and achieve 2D morphology, while retaining opto-electronic properties of pure Ag films. In the third part, the evolution of stress during Ag and Cu film growth on a-C and its dependence on growth kinetics (as determined by deposition rate, substrate temperature) is systematically investigated. A general trend toward smaller compressive stress magnitudes with increasing temperature/deposition rate is found, related to increasing grain size/decreasing adatom diffusion length. Exception to this trend is found for Cu films, in which oxygen incorporation from the residual growth atmosphere at low deposition rates inhibits adatom diffusivity and decreases the magnitude of compressive stress. The effect of N2 on stress type and magnitude in Ag films is also studied. While Ag grown in N2-free atmosphere exhibits a typical compressive-tensile-compressive stress evolution as function of thickness, addition of a few percent of N2 yields to a stress turnaround from compressive to tensile stress after film continuity which is attributed to giant grain growth and film roughening. The overall results of the thesis provide the foundation to: (i) determine diffusion rates over a wide range of WIS film/substrates systems; (ii) design non-invasive strategies for multifunctional contacts in optoelectronic devices; (iii) complete important missing pieces in the fundamental understanding of stress, which can be used to expand theoretical descriptions for predicting and tuning stress magnitude. La morphologie de films minces métalliques polycristallins élaborés par condensation d’une phase vapeur sur des substrats à faible interaction (SFI) possède un caractère 3D intrinsèque. De plus, la nature hors équilibre de la croissance du film depuis une phase vapeur conduit souvent à la génération de contraintes mécaniques, ce qui peut compromettre davantage la fiabilité et la fonctionnalité des dispositifs optoélectroniques. Les objectifs de cette thèse sont liés à la croissance de films métalliques sur SFI et visent à: (i) contribuer à une meilleure compréhension des processus à l'échelle atomique qui contrôlent l'évolution morphologique des films; (ii) élucider les processus dynamiques qui régissent la génération et l'évolution des contraintes en cours de croissance; et (iii) développer des méthodologies pour manipuler et contrôler la morphologie des films à l'échelle nanométrique. L’originalité de l’approche mise en œuvre consiste à suivre la croissance des films in situ et en temps réel par couplage de plusieurs diagnostics, complété par des analyses microstructurales ex situ. Les grandeurs mesurées sont confrontées à des modèles optiques et des simulations atomistiques. La première partie est consacrée à une étude de comportement d’échelonnement des épaisseurs de transition morphologiques caractéristiques, à savoir la percolation et la continuité du film, lors de la croissance de films polycristallins d'Ag et de Cu sur carbone amorphe (a-C). Ces grandeurs sont examinées de façon systématique en fonction de la vitesse de dépôt et de la température du substrat, et interprétées dans le cadre de la théorie de la croissance de gouttelettes suivant un modèle cinétique décrivant la coalescence d’îlots, à partir duquel les coefficients de diffusion des espèces métalliques sont estimés. En confrontant les données expérimentales à des simulations par dynamique moléculaire ab initio, la diffusion de clusters multiatomiques est identifiée comme l’étape limitante le processus de croissance. Dans la seconde partie, l’incorporation, et l’impact sur la morphologie, d’espèces métalliques ou gazeuses minoritaires (Cu, N2, O2) lors de la croissance de film Ag sur SiO2 est étudié. A partir de mesures ellipsométriques in situ, on constate que l'addition d'espèces minoritaires favorise une morphologie 2D, entravant le taux d'achèvement de la coalescence, mais donne également une résistivité accrue de la couche continue. Par conséquent, une stratégie de manipulation de la croissance est proposée dans laquelle des espèces minoritaires sont déployées avec une grande précision temporelle pour cibler sélectivement des stades de croissance de film spécifiques et obtenir une morphologie 2D, tout en conservant les propriétés optoélectroniques des films d’Ag pur. Dans la troisième partie, l'évolution des contraintes résiduelles lors de la croissance des films d'Ag et de Cu sur a-C et leur dépendance à la cinétique de croissance est systématiquement étudiée. On observe une tendance générale vers des amplitudes de contrainte de compression plus faibles avec une augmentation de la température/vitesse de dépôt, liée à l'augmentation de la taille des grains/à la diminution de la longueur de diffusion des adatomes. Également, l’ajout dans le plasma de N2 sur le type et l'amplitude des contraintes dans les films d'Ag est étudié. L'ajout de quelques pourcents de N2 en phase gaz donne lieu à un renversement de la contrainte de compression et une évolution en tension au-delà de la continuité du film. Cet effet est attribué à une croissance anormale des grains géants et le développement de rugosité de surface. L’ensemble des résultats obtenus dans cette thèse fournissent les bases pour: (i) déterminer les coefficients de diffusion sur une large gamme de systèmes films/SFI; (ii) concevoir des stratégies non invasives pour les contacts multifonctionnels dans les dispositifs optoélectroniques; (iii) apporter des éléments de compréhension à l’origine du développement de contrainte, qui permettent de prédire et contrôler le niveau de contrainte intrinsèque à la croissance de films minces polycristallins.

Book Chemisorption And Reactions On Metallic Films V2

Download or read book Chemisorption And Reactions On Metallic Films V2 written by J Anderson and published by Elsevier. This book was released on 2012-12-02 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemisorption and Reactions on Metallic Films, Volume 2 is a four-chapter text that describes the role of evaporated metal films in advancing the understanding of the metal-gas interface chemistry and in understanding of adsorption and catalysis at metal surfaces. This volume first describes film structure and properties, particularly of random polycrystalline films, as well as the concepts of the adsorption and kinetic phenomena. The topic is followed by an overview of the main classes of catalytic reactions that have been studied over evaporated metal film catalysts. A chapter explores the preparation, characterization, structure, and surface properties of alloy films. The theory of the oxidation of metals and the advantages and disadvantages of using thin metal films in oxidation work are considered in the concluding chapter, along with a brief discussion on their use in kinetic and mechanistic studies. Research scientists and graduate students who are interested in the fundamentals of adsorption and catalysis will find this volume invaluable.

Book Chemisorption And Reactions On Metallic Films V1

Download or read book Chemisorption And Reactions On Metallic Films V1 written by J Anderson and published by Elsevier. This book was released on 2012-12-02 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemisorption and Reactions on Metallic Films, Volume 1 is a six-chapter text that describes the role of evaporated metal films in advancing the understanding of the metal-gas interface chemistry. Chapter 1 presents electron microscopy and diffraction studies and their contributions in elucidating the growth and structure of polycrystalline and epitaxially grown films. Chapter 2 describes the techniques of preparation and characterization of metallic films and examines the heats of adsorption, electrical conductivity, surface area, and sticking probabilities of such films. Chapter 3 discusses the strength of pairwise interactions; the influence of the intermetallic bond on the equilibrium shape of metal crystallites; the bonding of individual metal atoms to different crystallographic planes; the interaction of metal atoms and crystallites with non-conducting substrates; and the effects of residual gases on this interaction. Chapters 4 and 5 address the adsorption of metallic films, with an emphasis on general trends in adsorptive and electronic properties of bulk metals. These chapters also discuss the effects of adsorption on the electrical conductance of island-like and coherent films and on the ferromagnetic properties of films. Chapter 6 evaluates the application of infrared spectroscopy to the studies of the surfaces of metal films and the use of the available infrared spectroscopic data in reconciling the results of adsorption studies on oxide-supported metal particles with those obtained with clean evaporated metal films prepared under ultra high vacuum conditions. Research scientists and graduate students who are interested in the fundamentals of adsorption and catalysis will find this volume invaluable.

Book Thin Films on Glass

Download or read book Thin Films on Glass written by Hans Bach and published by Springer Science & Business Media. This book was released on 2003-07-10 with total page 466 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, entitled Thin Films on Glass, is one of a series reporting on research and development activities on products and processes conducted by the Schott Group. The scientifically founded development of new products and technical pro cesses has traditionally been of vital importance to Schott and has always been performed on a scale determined by the prospects for application of our special glasses. Since the reconstruction of the Schott Glaswerke in Mainz, the scale has increased enormously. The range of expert knowledge required could never have been supplied by Schott alone. It is also a tradition in our company to cultivate collaboration with customers, universities, and research institutes. Publications in numerous technical journals, which since 1969 we have edited to a regular schedule as Forschungsberichte - 'research reports' - describe the results of these cooperations. They contain up-to-date infor mation on various topics for the expert but are not suited as survey material for those whose standpoint is more remote. This is the point where we would like to place our series, to stimulate the exchange of thoughts, so that we can consider from different points of view the possibilities offered by those incredibly versatile materials, glass and glass ceramics. We would like to share the knowledge won through our research and development at Schott in cooperation with the users of our materials with scientists and engineers, interested customers and friends, and with the employees of our firm.

Book Thin Film Reactions on Alloy Semiconductor Substrates

Download or read book Thin Film Reactions on Alloy Semiconductor Substrates written by Dale Abbott Olson and published by . This book was released on 1990 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Dissertation Abstracts International

Download or read book Dissertation Abstracts International written by and published by . This book was released on 2005 with total page 884 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Oxford Handbook of Nanoscience and Technology

Download or read book Oxford Handbook of Nanoscience and Technology written by A.V. Narlikar and published by Oxford University Press, USA. This book was released on 2010-02-11 with total page 931 pages. Available in PDF, EPUB and Kindle. Book excerpt: These three volumes are intended to shape the field of nanoscience and technology and will serve as anessential point of reference for cutting-edge research in the field.

Book Transparent Conducting Pure and Tin Doped Indium Oxide Films   Preparation and Characterization

Download or read book Transparent Conducting Pure and Tin Doped Indium Oxide Films Preparation and Characterization written by Dr. B. Radhakrishna and published by Lulu.com. This book was released on with total page 132 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Recent Awards in Engineering

Download or read book Recent Awards in Engineering written by and published by . This book was released on 1983 with total page 986 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Ceramic Materials

    Book Details:
  • Author : C. Barry Carter
  • Publisher : Springer Science & Business Media
  • Release : 2007-04-04
  • ISBN : 0387462708
  • Pages : 727 pages

Download or read book Ceramic Materials written by C. Barry Carter and published by Springer Science & Business Media. This book was released on 2007-04-04 with total page 727 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ceramic Materials: Science and Engineering is an up-to-date treatment of ceramic science, engineering, and applications in a single, integrated text. Building on a foundation of crystal structures, phase equilibria, defects and the mechanical properties of ceramic materials, students are shown how these materials are processed for a broad diversity of applications in today's society. Concepts such as how and why ions move, how ceramics interact with light and magnetic fields, and how they respond to temperature changes are discussed in the context of their applications. References to the art and history of ceramics are included throughout the text. The text concludes with discussions of ceramics in biology and medicine, ceramics as gemstones and the role of ceramics in the interplay between industry and the environment. Extensively illustrated, the text also includes questions for the student and recommendations for additional reading. KEY FEATURES: Combines the treatment of bioceramics, furnaces, glass, optics, pores, gemstones, and point defects in a single text Provides abundant examples and illustrations relating theory to practical applications Suitable for advanced undergraduate and graduate teaching and as a reference for researchers in materials science Written by established and successful teachers and authors with experience in both research and industry

Book Energy Research Abstracts

Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 1020 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Scientific and Technical Aerospace Reports

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1989 with total page 1134 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Surface effects in adhesion  friction  wear  and lubrication

Download or read book Surface effects in adhesion friction wear and lubrication written by Donald H. Buckley and published by Elsevier. This book was released on 1981-01-01 with total page 643 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface effects in adhesion, friction, wear, and lubrication

Book Surface   Coatings Technology

Download or read book Surface Coatings Technology written by B. D. Sartwell and published by Elsevier. This book was released on 2016-06-03 with total page 665 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface & Coatings Technology, Volumes 59–60 presents the proceedings of the Third International Conference on Plasma Surface Engineering, held in Garmisch-Partenkirchen, Germany, on October 26–29, 1992. This book discusses the widespread applications of plasma and particle beam assisted methods in surface and thin film technology. Volume 59 is organized into 11 parts encompassing 69 chapters while Volume 60 is comprised of eight parts encompassing 49 chapters. This compilation of papers begins with an overview of the kinetic modelling of low pressure high frequency discharges. This text then examines the effect of various deposition parameters on the growth of chamber wall deposits. Other chapters consider the physiochemical behavior of ceramic materials for space applications. This book discusses as well the economic aspects of the application of plasma surface technologies. The reader is also introduced to the environmental aspects of physical vapor deposition coating technology. This book is a valuable resource for plasma surface engineers, technologists, and researchers.