Download or read book Some Aspects of Silicon Surface Modification and Oxide Removal written by John M. C. Thornton and published by . This book was released on 1990 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization and Chemical Modification of the Silica Surface written by E.F. Vansant and published by Elsevier. This book was released on 1995-04-25 with total page 573 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxide surface materials are widely used in many applications, in particular where chemically modified oxide surfaces are involved. Indeed, in disciplines such as separation, catalysis, bioengineering, electronics, ceramics, etc., modified oxide surfaces are very important. In all cases, the knowledge of their chemical and surface characteristics is of great importance for the understanding and eventual improvement of their performances. This book reviews the latest techniques and procedures in the characterization and chemical modification of the silica surface, presenting a unified and state-of-the-art approach to the relevant analysis techniques and modification procedures, covering 1000 references integrated into one clear concept.
Download or read book The Physics and Chemistry of SiO2 and the Si SiO2 Interface 2 written by B.E. Deal and published by Springer Science & Business Media. This book was released on 2013-11-09 with total page 505 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first international symposium on the subject "The Physics and Chemistry of Si02 and the Si-Si02 Interface," organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on "The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.
Download or read book Ultra Clean Processing of Silicon Surfaces VII written by Paul Mertens and published by Trans Tech Publications Ltd. This book was released on 2005-04-01 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume is indexed by Thomson Reuters CPCI-S (WoS). This book is sub-divided into 10 different topical sections; each dealing with important issues in surface cleaning and preparation.
Download or read book Handbook of Porous Silicon written by Leigh Canham and published by Springer. This book was released on 2021-01-14 with total page 1000 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Porous Silicon brings together the expertise of a large, international team of almost 100 academic researchers, engineers, and product developers from industry across electronics, medicine, nutrition and consumer care to summarize the field in its entirity with 150 chapters and 5000 references. The volume presents 5 parts which cover fabrication techniques, material properties, characterization techniques, processing and applications. Much attention was given in the the past to its luminescent properties, but increasingly it is the biodegradability, mechanical, thermal and sensing capabilities that are attracting attention. The volume is divided into focussed data reviews with, wherever possible, quantitative rather than qualitative descriptions of both properties and performance. The book is targeted at undergraduates, postgraduates, and experienced researchers.
Download or read book Ultra Clean Processing of Silicon Surfaces V written by Marc Heyns and published by Trans Tech Publications Ltd. This book was released on 2001-01-02 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume is indexed by Thomson Reuters CPCI-S (WoS). The proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
Download or read book Ultra Clean Processing of Silicon Surfaces VI written by Marc Heyns and published by Trans Tech Publications Ltd. This book was released on 2003-05-02 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issues addressed by the Sixth International Symposium on the Ultra Clean Processing of Silicon Surfaces included all aspects of ultra-clean Si-technology, cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing. Volume is indexed by Thomson Reuters CPCI-S (WoS). This covered studies of Si-surface chemistry and topography and its relationship to device performance and process yield, cleaning in relationship to new gate stacks, cleaning at the interconnect level, resist stripping and polymer removal, cleaning and contamination control of various new materials, wafer backside cleaning and cleaning following Chemical-Mechanical-Polishing (CMP).
Download or read book Covalent Surface Modification of Silicon Oxides written by Austin Woohyuk Lee and published by . This book was released on 2017 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microwave radiation was utilized as a tool to modify surface properties of silicon oxides. Covalent surface modification of silicon oxides has been widely pursued in the areas of material science, electronics, microfluidics, biology, and separation science. Chemical surface modifications are often achieved through the formation of organic monolayers, often referred to as self-assembled monolayers (SAMs). While these organic monolayers have been proposed as an effective surface modification strategy, the defects in these organic monolayers compromise the effectiveness on their ability to alter surface properties. For example, in the case of passivation of microscale electronic devices, the surfaces that are not covered by the organic monolayers are susceptible to environmental stress or corrosion, which can cause detrimental failures of the devices. Traditional methods of formation of monolayers often cause many defects including formation of multilayers or micelles, physically adsorbed organic film, and/or voids. In this thesis, microwave radiation is utilized as a tool to accelerate the formation of uniform monolayers. In particular, the formation of silane based monolayers and alcohol based monolayers on silicon oxide surfaces have been extensively studied. Microwave heating, unlike the traditional heating methods, delivers the thermal energy to the substrate surfaces. It can effectively accelerate the formation of both silane and alcohol based monolayers. Alcohol based reagents, in particular, is proposed as an alternative building blocks for their widespread availability and minimal reactivity with moisture. Tuning of surface chemistry of silicon oxides have been achieved with alcohol based regents with different functional groups. Furthermore, the formation of mixed monolayers has been proposed as means of controlling oleophobicity of the silicon oxide surfaces. Finally, the film thickness of the alcohol based monolayers has been characterized with angle-resolved X-ray photoelectron spectroscopy (ARXPS). The film thickness can be precisely tuned by choosing the alcohol based reactants with particular lengths of alkyl chains. A variety of surface chemistry can be designed towards many practical applications requiring surface functionalized silicon oxides using the research presented herein.
Download or read book Proceedings of the Second International Symposium on Ultra Clean Processing of Silicon Surfaces written by Marc Heyns and published by . This book was released on 1994 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Novel Thin Silicon Oxide Coating for Multielectrode Array Surface Modification written by John Chi-Hung Chang and published by . This book was released on 1997 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Surface Modification and Mechanisms written by George E. Totten and published by CRC Press. This book was released on 2004-04-30 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt: Leading readers through an extensive compilation of surface modification reactions and processes for specific tribological results, this reference compiles detailed studies on various residual stresses, reaction processes and mechanisms, heat treatment methods, plasma-based techniques, and more, for a solid understanding of surface structural changes that occur during various engineering procedures. This unique book explores topics previously ignored in other texts on surface engineering and tribology, offers guidelines for the consideration and design of wear life and frictional performance, and sections on laser impingement and nanometer scale surface modification.
Download or read book Handbook of Surfaces and Interfaces of Materials Five Volume Set written by Hari Singh Nalwa and published by Elsevier. This book was released on 2001-10-26 with total page 1915 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook brings together, under a single cover, all aspects of the chemistry, physics, and engineering of surfaces and interfaces of materials currently studied in academic and industrial research. It covers different experimental and theoretical aspects of surfaces and interfaces, their physical properties, and spectroscopic techniques that have been applied to a wide class of inorganic, organic, polymer, and biological materials. The diversified technological areas of surface science reflect the explosion of scientific information on surfaces and interfaces of materials and their spectroscopic characterization. The large volume of experimental data on chemistry, physics, and engineering aspects of materials surfaces and interfaces remains scattered in so many different periodicals, therefore this handbook compilation is needed.The information presented in this multivolume reference draws on two decades of pioneering research on the surfaces and interfaces of materials to offer a complete perspective on the topic. These five volumes-Surface and Interface Phenomena; Surface Characterization and Properties; Nanostructures, Micelles, and Colloids; Thin Films and Layers; Biointerfaces and Applications-provide multidisciplinary review chapters and summarize the current status of the field covering important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniques with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source long due for the scientific community. The complete reference on the topic of surfaces and interfaces of materialsThe information presented in this multivolume reference draws on two decades of pioneering researchProvides multidisciplinary review chapters and summarizes the current status of the fieldCovers important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniquesContributions from internationally recognized experts from all over the world
Download or read book Handbook of Silicon Wafer Cleaning Technology written by Karen Reinhardt and published by William Andrew. This book was released on 2018-03-16 with total page 794 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Download or read book Surface Chemical Functionalization of Oxide free Si 111 Surfaces and Silicon Nitride written by Tatiana Peixoto Chopra and published by . This book was released on 2015 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt: Amination of surfaces is useful in a variety of fields, ranging from device manufacturing to biological applications. Previous silicon amination studies have concentrated on the ammonia vapor dissociation on silicon surfaces, with considerably less work done using liquid phase ammonia. Bifunctional molecules such as diamines are particularly attractive for surface amination since they can form different surface structures. In contrast to ammonia modification of silicon surfaces, direct grafting of diamine molecules to silicon is almost nonexistent in literature. Therefore in this dissertation, the study of amination of silicon surfaces using liquid phase ammonia and diamine reactions will be done. The approach used to study these complex liquid systems involves a systematic set of well-defined surfaces (oxide-free H-, 1/3 monolayer (ML) F- and Cl-terminated Si(111)), chosen for their atomic roughness and single reaction site. This systematic set is instrumental for achieving our goal of fundamentally understanding the reaction mechanisms and surface reactions in liquid phase. Results show that amines and diamines physisorb on the H-terminated Si(111) surface and chemisorb on the 1/3 ML F- and Cl-terminated surfaces, with full removal of the chlorine observed. Both studies showed evidence of oxidation or oxynitride formation, and surprisingly, Si-H bond formation on the previously hydrogen-free Cl-terminated Si(111) surface, which is attributed to a step edge reaction in the case of ammonia and a chlorine-proton exchange in the case of ethylenediamine. On stoichiometric silicon nitride surfaces, we find that HF etching leads to etchant salt formation if not immediately water rinsed. A salt-free HF-etched silicon nitride surface contained coverages of various terminations including: ~70% ML fluorine, ~40% ML hydroxide and ~20% ML amine. Selective functionalization of silicon nitride over oxide surfaces was achieved by using a Schiff base reaction, involving the conversion of the amine surface groups to imines using undecanal. These results illustrate the need and relevance of in-situ characterization to fully exploit semiconductor and oxide surfaces. A better understanding of the surface reaction mechanisms can provide the scientific community a deeper understanding of the reaction outcomes on these different surfaces, and in the future could aid in the development of silicon surface modifications.
Download or read book Surface Modification to Improve Properties of Materials written by Miran Mozetič and published by MDPI. This book was released on 2019-04-16 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book contains selected contributions on surface modification to improve the properties of solid materials. The surface properties are tailored either by functionalization, etching, or deposition of a thin coating. Functionalization is achieved by a brief treatment with non-equilibrium gaseous plasma containing suitable radicals that interact chemically with the material surface and thus enable the formation of rather stable functional groups. Etching is performed in order to modify the surface morphology. The etching parameters are selected in such a way that a rich morphology of the surfaces is achieved spontaneously on the sub-micrometer scale, without using masks. The combination of adequate surface morphology and functionalization of materials leads to superior surface properties which are particularly beneficial for the desired response upon incubation with biological matter. Alternatively, the materials are coated with a suitable thin film that is useful in various applications from food to aerospace industries.
Download or read book Tribology Issues and Opportunities in MEMS written by Bharat Bhushan and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 652 pages. Available in PDF, EPUB and Kindle. Book excerpt: Micro Electro Mechanical Systems (MEMS) is already about a billion dollars a year industry and is growing rapidly. So far major emphasis has been placed on the fabrication processes for various devices. There are serious issues related to tribology, mechanics, surfacechemistry and materials science in the operationand manufacturingof many MEMS devices and these issues are preventing an even faster commercialization. Very little is understood about tribology and mechanical properties on micro- to nanoscales of the materials used in the construction of MEMS devices. The MEMS community needs to be exposed to the state-of-the-artoftribology and vice versa. Fundamental understanding of friction/stiction, wear and the role of surface contamination and environmental debris in micro devices is required. There are significantadhesion, friction and wear issues in manufacturing and actual use, facing the MEMS industry. Very little is understood about the tribology of bulk silicon and polysilicon films used in the construction ofthese microdevices. These issues are based on surface phenomenaand cannotbe scaled down linearly and these become increasingly important with the small size of the devices. Continuum theory breaks down in the analyses, e. g. in fluid flow of micro-scale devices. Mechanical properties ofpolysilicon and other films are not well characterized. Roughness optimization can help in tribological improvements. Monolayers of lubricants and other materials need to be developed for ultra-low friction and near zero wear. Hard coatings and ion implantation techniques hold promise.
Download or read book Istc cstic 2009 cistc written by David Huang and published by The Electrochemical Society. This book was released on 2009-03 with total page 1124 pages. Available in PDF, EPUB and Kindle. Book excerpt: ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
