Download or read book Remote Plasma Enhanced Chemical Vapor Deposition of Silicon Based Dielectrics written by Aditi Banerjee and published by . This book was released on 1996 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Deposition of Silicon Based Dielectrics by Remote Plasma Enhanced Chemical Vapor Deposition written by David Vincent Tsu and published by . This book was released on 1989 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Deposition of Amorphous Silicon and Silicon Based Dielectrics by Remote Plasma Enhanced Chemical Vapor Deposition written by Sang Soo Kim and published by . This book was released on 1990 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Growth and Characterization of Silicon based Dielectrics Using Plasma Enhanced Chemical Vapor Deposition written by Daniel J. Carbaugh and published by . This book was released on 2014 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition written by Yi Ma and published by . This book was released on 1993 with total page 278 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma enhanced Chemical Vapor Deposition of Silicon Dioxide written by Arjen Boogaard and published by . This book was released on 2011 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Surface Reactions During Plasma Enhanced Chemical Vapor Deposition of Silicon and Silicon Based Dielectrics written by Atul Gupta and published by . This book was released on 2001 with total page 163 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: Plasma deposition, Surface chemistry, Ab-initio calculations, Reaction mechanisms, Kinetics, Amorphous silicon, Silicon dioxide.
Download or read book Remote plasma enhanced chemical vapor deposition of silicon on silicon written by Brian George Anthony and published by . This book was released on 1988 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Download or read book Plasma enhanced Chemical Vapor Deposition of Silicon Oxynitrides written by Joseph Edward Schoenholtz and published by . This book was released on 1986 with total page 390 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Film Materials written by Ashfaqul Islam Chowdhury and published by . This book was released on 1999 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Modelling and Characterization of Dielectric Barrier Discharge Based Cold Plasma Jets written by G Divya Deepak and published by Cambridge Scholars Publishing. This book was released on 2020-01-15 with total page 152 pages. Available in PDF, EPUB and Kindle. Book excerpt: Non-equilibrium atmospheric pressure plasma jets (APPJs) are of intense interest in current low-temperature plasma research because of their immense potential for material processing and biomedical applications. Depending on the jet configuration and the electrical excitation, plasma characteristics including heat, charged particle, electric field, and chemically active species may differ significantly. Other important parameters of importance in these studies are the kind of utilized working gas and gas flow rate. This book presents the electrical characterization of DBD-based APPJs for three electrode arrangements: ring electrode, pin electrode and floating helix electrode configurations. The analysis presented here will serve to help in establishing an optimum range of operation for a cold plasma jet without arcing and without any physical damage to the electrodes. Furthermore, the experimental results provided in the book establish the significance of the type of working gas on the power consumption and on the jet length obtained. These developed cold DBD-based APPJs of larger lengths may be useful for diverse biological applications and surface treatments.
Download or read book Chemical Vapor Deposition written by Srinivasan Sivaram and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Download or read book Plasma Deposition of Amorphous Silicon Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Download or read book Fundamental Aspects of Ultrathin Dielectrics on Si based Devices written by Eric Garfunkel and published by Springer Science & Business Media. This book was released on 1998-03-31 with total page 528 pages. Available in PDF, EPUB and Kindle. Book excerpt: An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
Download or read book The Physics and Chemistry of SiO2 and the Si SiO2 Interface written by B.E. Deal and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 543 pages. Available in PDF, EPUB and Kindle. Book excerpt: The properties of Si02 and the Si-Si02 interface provide the key foundation onto which the majority of semiconductor device technology has been built Their study has consumed countless hours of many hundreds of investigators over the years, not only in the field of semiconductor devices but also in ceramics, materials science, metallurgy, geology, and mineralogy, to name a few. These groups seldom have contact with each other even though they often investigate quite similar aspects of the Si02 system. Desiring to facilitate an interaction between these groups we set out to organize a symposium on the Physics and Chemistry of Si()z and the Si-Si()z Interface under the auspices of The Electrochemical Society, which represents a number of the appropriate groups. This symposium was held at the 173rd Meeting of The Electrochemical Society in Atlanta, Georgia, May 15-20, 1988. These dates nearly coincided with the ten year anniversary of the "International Topical Conference on the Physics of Si02 and its Interfaces" held at mM in 1978. We have modeled the present symposium after the 1978 conference as well as its follow on at North Carolina State in 1980. Of course, much progress has been made in that ten years and the symposium has given us the opportunity to take a multidisciplinary look at that progress.
