Download or read book Recrystallization and grain growth of polycrystalline silicon written by Wilhelmus J. Schins and published by . This book was released on 1952 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Recrystallization and Grain Growth of Polycrystalline Silicon written by Wilhelmus Jacobus Hubertus Schins and published by . This book was released on 1982 with total page 156 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Recrystallization of Amorphous and Small Grain Size Polycrystalline Silicon written by and published by . This book was released on 1981 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Recrystallization of Amorphous and Small Grain Size Polycrystalline Silicon written by and published by . This book was released on 1982 with total page 43 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Grain Growth in Polycrystalline Materials written by and published by . This book was released on 1992 with total page 982 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Recrystallization of Amorphous and Small Grain Size Polycrystalline Silicon written by and published by . This book was released on 1982 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Grain Growth in Polycrystalline Materials II written by Hideo Yoshinaga and published by . This book was released on 1996 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt: Grain Growth is one of the most fundamental microstructural changes, and occurs in all types of polycrystalline material. It is of major scientific interest, and of great importance in a wide range of industrial applications. This volume presents the most recent contributions to the research effort on the experimental study, theory and simulation of grain growth. Currently available experimental data are compared with recent theoretical results, and the most promising areas for future research are identified. Applications of the new findings to industrial experiences and problems are presented. The principal topics covered are normal and abnormal grain growth, texture, drag effects, topological aspects, grain size-effects, and boundary structure, mobility and interaction with particles and impurity atoms.
Download or read book Grain Growth in Polycrystalline Materials I written by Giuseppe Abbruzzese and published by Trans Tech Publications Ltd. This book was released on 1992-01-01 with total page 930 pages. Available in PDF, EPUB and Kindle. Book excerpt: The volumes present investigations on grain growth phenomena and their observation in various materials: metals and alloys, ceramics, sintered materials, thin films, etc.; normal and abnormal grain growth including twinning, texture, particle and other drag effects as well as analysis of topological aspects and grain size and grain orientation correlations; grain boundary structure, mobility and interaction with particles and impurity atoms. Experimental methods applicable to measurements of grain size, orientation of individual grains, etc.
Download or read book Recrystallization grain growth and textures written by and published by Taylor & Francis. This book was released on 1966 with total page 617 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Grain Growth in Polycrystalline Materials II written by H. Yoshinaga and published by Trans Tech Publications Ltd. This book was released on 1996-03-05 with total page 820 pages. Available in PDF, EPUB and Kindle. Book excerpt: Grain Growth is one of the most fundamental microstructural changes, and occurs in all types of polycrystalline material. It is of major scientific interest, and of great importance in a wide range of industrial applications.
Download or read book Polycrystalline Silicon for Integrated Circuits and Displays written by Ted Kamins and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 391 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of polycrystalline silicon and their relation to the deposition conditions, polysilicon can be designed to ensure optimum device and integrated-circuit performance. Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors. In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication. Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians working with polycrystalline silicon in the integrated circuit and display industries.
Download or read book Polycrystalline Silicon for Integrated Circuit Applications written by Ted Kamins and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have seen silicon integrated circuits enter into an increasing number of technical and consumer applications, until they now affect everyday life, as well as technical areas. Polycrystalline silicon has been an important component of silicon technology for nearly two decades, being used first in MOS integrated circuits and now becoming pervasive in bipolar circuits, as well. During this time a great deal of informa tion has been published about polysilicon. A wide range of deposition conditions has been used to form films exhibiting markedly different properties. Seemingly contradictory results can often be explained by considering the details of the structure formed. This monograph is an attempt to synthesize much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon so that it can be used most effectively to enhance device and integrated-circuit perfor mance. As device performance improves, however, some of the proper ties of polysilicon are beginning to restrict the overall performance of integrated circuits, and the basic limitations of the properties of polysili con also need to be better understood to minimize potential degradation of circuit behavior.
Download or read book Recrystallization and Grain Growth in Cold Worked Polycrystalline Metals written by Arthur Edwin Bousu and published by . This book was released on 1935 with total page 19 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Recrystallization and Related Annealing Phenomena written by F.J. Humphreys and published by Elsevier. This book was released on 2012-12-02 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt: The annealing of deformed materials is of both technological importance and scientific interest. The phenomena have been most widely studied in metals, although they occur in all crystalline materials such as the natural deformation of rocks and the processing of technical ceramics. Research is mainly driven by the requirements of industry, and where appropriate, the book discusses the extent to which we are able to formulate quantitative, physically-based models which can be applied to metal-forming processes. The subjects treated in this book are all active research areas, and form a major part of at least four regular international conference series. However, there have only been two monographs published in recent times on the subject of recrystallization, the latest nearly 20 years ago. Since that time, considerable advances have been made, both in our understanding of the subject and in the techniques available to the researcher. The book covers recovery, recrystallization and grain growth in depth including specific chapters on ordered materials, two-phase alloys, annealing textures and annealing during and after hot working. Also contained are treatments of the deformed state and the structure and mobility of grain boundaries, technologically important examples and a chapter on computer simulation and modelling. The book provides a scientific treatment of the subject for researchers or students in Materials Science, Metallurgy and related disciplines, who require a more detailed coverage than is found in textbooks on physical metallurgy, and a more coherent treatment than will be found in the many conference proceedings and review articles.
Download or read book Polycrystalline Semiconductors written by Hans J. Möller and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 399 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book summarizes the most recent aspects of polycrystalline semiconductors as presented at the conference Polycrystalline Semiconductors - Grain Boundaries and Interfaces. It contains 12 review articles on selected topics written by experts in their fields and 41 complementary contributed papers. The structure, chemistry and physics of grain boundaries and other interfaces are experimentally and theoretically studied. Aspects of the technologically important polycrystalline silicon are discussed in detail. Also covered are other polycrystalline semiconductors, germanium and compound semiconductors, that are currently of interest in fundamental research and in the technology of solar cells and thin film devices. Anyone interested in polycrystalline semiconductors will be able to use this comprehensive collection to advantage. It also suggests directions for new research and development.
Download or read book Kinetic Modeling of Grain Growth in Polycrystalline Silicon Films Doped with Phosphorus Or Boron written by H. J. Kim and published by . This book was released on 1987 with total page 27 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Recrystallization and Grain Growth III written by Suk Joong L. Kang and published by Trans Tech Publications Ltd. This book was released on 2007-10-15 with total page 1544 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recrystallization and grain-growth, together with phase transformations, are the fundamental processes of microstructural evolution which occur during the thermomechanical treatment of engineering materials. Volume is indexed by Thomson Reuters CPCI-S (WoS).
