Download or read book Reactor Analysis of Chemical Vapor Deposition of TiO2 and Cu Thin Films written by Wing-Cheong Gilbert Lai and published by . This book was released on 1994 with total page 466 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Metalorganic Chemical Vapor Deposition of Titanium Oxide Thin Films at Atmospheric Pressure with Analysis Via X ray Photoelectron Spectroscopy written by Anuj K. Basil and published by . This book was released on 2005 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films written by David Christopher Gilmer and published by . This book was released on 1998 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition of TiO2 Thin Films written by Qingming Zhang and published by . This book was released on 1993 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition of beta SiC Thin Films on Si 100 in a Hot Wall Reactor written by Chienchia Chiu and published by . This book was released on 1994 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition of TiO2 Thin Films at Room Temperature written by I. Thomas and published by . This book was released on 1988 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: Titania coatings were prepared using a chemical vapor deposition (CVD) apparatus at room temperature. Coating were deposited by the reaction of gaseous TiCl4 and H2O at the substrate surface. High refractive indices were obtained with damage thresholds to 12.9 J/cm2, at 1.06 ?m, 1 ns.
Download or read book Principles of Chemical Vapor Deposition written by Daniel Dobkin and published by Springer Science & Business Media. This book was released on 2003-04-30 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Download or read book Titanium Dioxide TiO2 Thin Film Deposition by Using Chemical vapor Deposition CVD Technique written by and published by . This book was released on 2014 with total page 49 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Clean by Light Irradiation written by Vincenzo Augugliaro and published by Royal Society of Chemistry. This book was released on 2010-08-24 with total page 283 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book deals with the environmentally friendly cleaning materials functionalized with TiO2, a widely known semiconductor giving rise to redox reactions under artificial or solar irradiation. The role of Titanium dioxide in the worldwide community is introduced first. The fundamental working principles of heterogeneous photocatalysis follow and a critical section on the semiconductor bulk and surface properties open the way to the differences between TiO2 blend features with respect to analogous thin film layouts. Then follows the main section of the book which deals with the techniques applied to manufactured commercial devices, ranging from glasses to textiles and from concrete and other construction materials to paintings. Also road asphalt and other devices, such as photocatalytic air conditioning machines are outlined. Last generation materials, not yet commercialized, and the deposition techniques applied to prepare them are also widely discussed. The final part of the book covers the difficult and modern topic of standardization and comparison of performance of photocatalytic processes and in particular the guidelines proposed by various worldwide organizations for standardization are discussed. The book covers the general matters as well as the practical applications with the supporting methods discussed in detail. This book brings together a team of highly experienced and well-published experts in the field, providing a comprehensive view of the applications of supported titanium dioxide.
Download or read book Low Pressure Metal Organic Chemical Vapor Deposition of Titanium Dioxide Thin Films in Conjunction with Photocatalytic Investigations written by Abon Jason Manuel del Rosario and published by . This book was released on 2003 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nucleation Promotion and Kinetics on Chemical Vapor Deposited Thin Films written by Kai-Ann Yang and published by . This book was released on 1999 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 702 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Catalytic Chemical Vapor Deposition written by Hideki Matsumura and published by John Wiley & Sons. This book was released on 2019-08-05 with total page 438 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Download or read book Phase Selective Synthesis of Tl Ba Ca Cu O Thin Films and Multilayer Structures by Metal organic Chemical Vapor Deposition written by Richard Joseph McNeely and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-organic chemical vapor deposition (MOCVD), utilizing volatile metalorganic sources Ba(hfa)2·mep, Ca(hfa)2·tet, and Cu(dpm)2 (hfa hexafluoroacetylacetonate, mep = methylethylpentaglyme, tet = tetraglyme, dpm dipivaloylmethanate) characterized by thermogravimetric analysis (TGA), is employed to grow BaCaCuO(F) thin films on crystalline (110) LaAlO3. An ex situ, bulk pellet equilibrium anneal incorporates thallium to form epitaxial, superconducting Tl2Ba 2CaCu2O8 (Tl-2212) and TlBa2Ca 2Cu3O9+x (Tl-1223) thin films. The film electrical properties are determined by transport and magnetic measurements, and the film microstructures are characterized by x-ray diffraction, electron microscopy, and profilometry. The Tl-2212 films, formed via a Tl2O3/Tl 2O anneal at temperatures of 720--890°C in flowing O2 /Ar (0--100%), exhibit Tc ∼ 105 K, Jc = 1.2 x 105 A/cm2 (77 K), and microwave surface resistance, Rs , as low as 400 muO (40 K; 10 GHz). These Tl-2212 films are also incorporated into an MOCVD process utilizing Mg(dPM)2 to form Tl-2212/MgO/Tl-2212 trilayer structures. However, rough surface morphology is found to affect the quality of the resulting trilayer structures by allowing pinhole defects that permit interlayer shorting. The Tl-1223 films are formed via a novel TlF annealing process that affords phase-selective nucleation under a wide range of conditions that produce multiple-phase samples when Tl2O3/Tl2O is employed as the thallium source. The microstructure and electrical properties of these TIF-annealed films are fully characterized, with typical values of Tc ∼ 103 K and Jc ∼ 2 x 105 A/cm2 (5 K). Calculated flux pinning activation energies of MOCVD-derived, TlF-annealed Bi- and Sr-substituted Tl-1223 analogs are found to agree with literature values. On unsubstituted TlF-annealed Tl-1223 thin films, a quenching study is undertaken to elucidate the function of fluoride in the TlF annealing process. X-ray diffraction and electron microscopy of thin films quenched at various stages in an optimized annealing schedule reveal the phase evolution and microstructural development of the resulting Tl-1223 thin films. It is proposed that TIF reacts with BaO in the bulk pellet and forms Tl2O early in the annealing process to thereby afford a higher Tl2O partial pressure during initial stages in superconducting phase formation.
Download or read book Fundamental Study on Chemical Vapor Deposition of Metal Thin Films written by Yong-Fa Wang and published by . This book was released on 1994 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Modeling and Control of Thin Film Growth in a Chemical Vapor Deposition Reactor written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This work describes the development of a mathematical model of ahigh-pressure chemical vapor deposition (HPCVD) reactor and nonlinearfeedback methodologies for control of the growth of thin films in thisreactor. Precise control of the film thickness and composition is highlydesirable, making real-time control of the deposition process veryimportant. The source vapor species transport is modeled by the standardgas dynamics partial differential equations, with species decomposition reactions, reduced down to a small number of ordinary differential equationsthrough use of the proper orthogonal decomposition technique. This systemis coupled with a reduced order model of the reactions on the surfaceinvolved in the source vapor decomposition and film deposition on thesubstrate wafer. Also modeled is the real-time observation technique usedto obtain a partial measurement of the deposition process. The utilization of reduced order models greatly simplifies the mathematical formulation of the physical process so it can be solved quickly enough to beused for real-time model-based feedback control. This control problem isfairly complicated, however, because the surface reactions render the modelnonlinear. Several control methodologies for nonlinear systems are studiedin this work to determine which performs best on test examples similar tothe HPCVD problem. One chosen method is extended to a tracking control toforce certain film growth properties to follow desired trajectories. Thenonlinear control method is used also in the development of a stateestimator which uses the nonlinear partial observation of the nonlinearsystem to create an estimate of the actual state, which the feedback controlformula then can use to guide the HPCVD system. The nonlinear trackingcontrol and estimator techniques are implemented on the HPCVD model and theresults analyzed as to the effectiveness of the reduced order model andnonlinear control.
Download or read book Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films written by Yu-Neng Chang and published by . This book was released on 1992 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt:
