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Book Rational Design of Non damaging Capacitively Coupled Plasma Etching and Photoresist Stripping Processes for Ultralow K Dielectric Materials

Download or read book Rational Design of Non damaging Capacitively Coupled Plasma Etching and Photoresist Stripping Processes for Ultralow K Dielectric Materials written by Ming-Shu Kuo and published by . This book was released on 2010 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Plasma Damaging Process of Porous Ultra low k Dielectrics and Dielectric Repair

Download or read book Plasma Damaging Process of Porous Ultra low k Dielectrics and Dielectric Repair written by Huai Huang (Ph. D.) and published by . This book was released on 2012 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Ultra-low-k material is required to reduce the RC time delay in the integrated circuits. However, the integration of the porous low-k material into the on-chip interconnects was impeded by the plasma induced damage during etching and photoresist stripping processes. This dissertation aims to study the mechanism of plasma damage to porous ultra-low-k dielectrics with the objective to minimize the damage and to develop methods and processes to restore the low-k dielectric after the plasma damage. First, the plasma etching induced surface roughening was studied on blanket porous SiCOH films in the fluorocarbon based plasma. Substantial surface roughening was found in the low polymerization region, where the surface roughening process was initiated by the unevenly distribution of surface fluorocarbon polymers in the pore structure and enhanced by ion induced surface densification. With oxygen addition, the surface densification layer increased the radial diffusion rate difference between the top and the bottom of the pits, resulting in further increase of the surface roughness. The best process optimization was found at a "threshold point" where the surface polymerization level is just high enough to suppress the roughness initiation. The second part of this dissertation investigates the mechanism of the oxygen plasma damaging process. The roles of plasma constituents (i.e. ions, radicals and photons with different wavelengths) were differentiated by an on-wafer filter system. Oxygen radical was identified as the most critical and its damage effect was enhanced by photons with wavelength smaller than 185nm. The oxygen radical kinetics in the porous structure of low-k, including diffusion, reaction and recombination, was described analytically with a plasma altered layer model and then simulated with a Monte Carlo computational method, which give guidelines to minimize the damage. The analytical model of oxygen radical kinetic process is also used to investigate the oxygen plasma damage to patterned low-k structure, which is confirmed by experiments. Finally, the dielectric recovery was studied using silylation and UV broadband thermal treatment, both individually and in combination. After both vapor and supercritical CO2 silylation, surface carbon and hydrophobicity were partially recovered. However, the recovery effect was limited to the surface. In comparison, UV treatment can effectively remove water from the bulk of the damaged film and consolidate the silanol bonds with the help of thermal activation. The combination of UV and silylation treatments is more effectively for dielectric recovery than UV or silylation alone. The "UV first" treatment provided a better recovery in sequential processes. Under the same conditions, simultaneous treatments by silylation and UV irradiation achieved better bulk and surface recovery than the sequential process.

Book Plasma Etching Processes for Interconnect Realization in VLSI

Download or read book Plasma Etching Processes for Interconnect Realization in VLSI written by Nicolas Posseme and published by Elsevier. This book was released on 2015-04-14 with total page 123 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.This book focuses on back end of line (BEOL) for high performance device realization and presents an overview of all etch challenges for interconnect realization as well as the current etch solutions proposed in the semiconductor industry. The choice of copper/low-k interconnect architecture is one of the keys for integrated circuit performance, process manufacturability and scalability. Today, implementation of porous low-k material is mandatory in order to minimize signal propagation delay in interconnections. In this context, the traditional plasma process issues (plasma-induced damage, dimension and profile control, selectivity) and new emerging challenges (residue formation, dielectric wiggling) are critical points of research in order to control the reliability and reduce defects in interconnects. These issues and potential solutions are illustrated by the authors through different process architectures available in the semiconductor industry (metallic or organic hard mask strategies). Presents the difficulties encountered for interconnect realization in very large-scale integrated (VLSI) circuits Focused on plasma-dielectric surface interaction Helps you further reduce the dielectric constant for the future technological nodes

Book Plasma Etching Processes for Sub quarter Micron Devices

Download or read book Plasma Etching Processes for Sub quarter Micron Devices written by G. S. Mathad and published by The Electrochemical Society. This book was released on 2000 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Coplanar Waveguide Circuits  Components  and Systems

Download or read book Coplanar Waveguide Circuits Components and Systems written by Rainee N. Simons and published by John Wiley & Sons. This book was released on 2004-04-07 with total page 461 pages. Available in PDF, EPUB and Kindle. Book excerpt: Up-to-date coverage of the analysis and applications of coplanar waveguides to microwave circuits and antennas The unique feature of coplanar waveguides, as opposed to more conventional waveguides, is their uniplanar construction, in which all of the conductors are aligned on the same side of the substrate. This feature simplifies manufacturing and allows faster and less expensive characterization using on-wafer techniques. Coplanar Waveguide Circuits, Components, and Systems is an engineer's complete resource, collecting all of the available data on the subject. Rainee Simons thoroughly discusses propagation parameters for conventional coplanar waveguides and includes valuable details such as the derivation of the fundamental equations, physical explanations, and numerical examples. Coverage also includes: Discontinuities and circuit elements Transitions to other transmission media Directional couplers, hybrids, and magic T Microelectromechanical systems based switches and phase shifters Tunable devices using ferroelectric materials Photonic bandgap structures Printed circuit antennas

Book Foundations for Microstrip Circuit Design

Download or read book Foundations for Microstrip Circuit Design written by Terry C. Edwards and published by John Wiley & Sons. This book was released on 2016-02-01 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt: Building on the success of the previous three editions, Foundations for Microstrip Circuit Design offers extensive new, updated and revised material based upon the latest research. Strongly design-oriented, this fourth edition provides the reader with a fundamental understanding of this fast expanding field making it a definitive source for professional engineers and researchers and an indispensable reference for senior students in electronic engineering. Topics new to this edition: microwave substrates, multilayer transmission line structures, modern EM tools and techniques, microstrip and planar transmision line design, transmission line theory, substrates for planar transmission lines, Vias, wirebonds, 3D integrated interposer structures, computer-aided design, microstrip and power-dependent effects, circuit models, microwave network analysis, microstrip passive elements, and slotline design fundamentals.

Book National Semiconductor Metrology Program

Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1995 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Power GaN Devices

Download or read book Power GaN Devices written by Matteo Meneghini and published by Springer. This book was released on 2016-09-08 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the first comprehensive overview of the properties and fabrication methods of GaN-based power transistors, with contributions from the most active research groups in the field. It describes how gallium nitride has emerged as an excellent material for the fabrication of power transistors; thanks to the high energy gap, high breakdown field, and saturation velocity of GaN, these devices can reach breakdown voltages beyond the kV range, and very high switching frequencies, thus being suitable for application in power conversion systems. Based on GaN, switching-mode power converters with efficiency in excess of 99 % have been already demonstrated, thus clearing the way for massive adoption of GaN transistors in the power conversion market. This is expected to have important advantages at both the environmental and economic level, since power conversion losses account for 10 % of global electricity consumption. The first part of the book describes the properties and advantages of gallium nitride compared to conventional semiconductor materials. The second part of the book describes the techniques used for device fabrication, and the methods for GaN-on-Silicon mass production. Specific attention is paid to the three most advanced device structures: lateral transistors, vertical power devices, and nanowire-based HEMTs. Other relevant topics covered by the book are the strategies for normally-off operation, and the problems related to device reliability. The last chapter reviews the switching characteristics of GaN HEMTs based on a systems level approach. This book is a unique reference for people working in the materials, device and power electronics fields; it provides interdisciplinary information on material growth, device fabrication, reliability issues and circuit-level switching investigation.

Book High k Gate Dielectric Materials

Download or read book High k Gate Dielectric Materials written by Niladri Pratap Maity and published by CRC Press. This book was released on 2020-12-18 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

Book Sol Gel Science

Download or read book Sol Gel Science written by C. Jeffrey Brinker and published by Academic Press. This book was released on 2013-10-22 with total page 925 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing presents the physical and chemical principles of the sol-gel process. The book emphasizes the science behind sol-gel processing with a chapter devoted to applications. The first chapter introduces basic terminology, provides a brief historical sketch, and identifies some excellent texts for background reading. Chapters 2 and 3 discuss the mechanisms of hydrolysis and condensation for nonsilicate and silicate systems. Chapter 4 deals with stabilization and gelation of sols. Chapter 5 reviews theories of gelation and examines the predicted and observed changes in the properties of a sol in the vicinity of the gel point. Chapter 6 describes the changes in structure and properties that occur during aging of a gel in its pore liquor (or some other liquid). The discussion of drying is divided into two parts, with the theory concentrated in Chapter 7 and the phenomenology in Chapter 8. The structure of dried gels is explored in Chapter 9. Chapter 10 shows the possibility of using the gel as a substrate for chemical reactions or of modifying the bulk composition of the resulting ceramic by performing a surface reaction (such as nitridation) on the gel. Chapter 11 reviews the theory and practice of sintering, describing the mechanisms that govern densification of amorphous and crystalline materials, and showing the advantages of avoiding crystallization before sintering is complete. The properties of gel-derived and conventional ceramics are discussed in Chapter 12. The preparation of films is such an important aspect of sol-gel technology that the fundamentals of film formation are treated at length in Chapter 13. Films and other applications are briefly reviewed in Chapter 14. Materials scientists and researchers in the field of sol-gel processing will find the book invaluable.

Book Advanced Techniques for Surface Engineering

Download or read book Advanced Techniques for Surface Engineering written by W. Gissler and published by Springer Science & Business Media. This book was released on 2013-04-17 with total page 402 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today's shortages of resources make the search for wear and corrosion resistant materials one of the most important tasks of the next century. Since the surface of a material is the location where any interaction occurs, it is that there the hardest requirements on the material are imposed: to be wear resistant for tools and bearings; to be corrosion resistant for turbine blades and tubes in the petrochemical industry; to be antireflecting for solar cells; to be decorative for architectural panels and to combine several of these properties in other applications. Surface engineering is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both coating and modification of the surface by ion implantation and laser beam melting. In recent years a continuously growing number of these techniques were developed to the extent that it became more and more difficult to maintain an overlook and to understand which of these highly differentiated techniques might be applied to resolve a given surface engineering problem. A similar development is also occuring for surface characterization techniques. This volume contains contributions from renowned scientists and engineers to the Eurocourse the aim of which was to inform about the various techniques and to give a comprehensive survey of the latest development on this subject.

Book Carbon Nanotube Electronics

Download or read book Carbon Nanotube Electronics written by Ali Javey and published by Springer Science & Business Media. This book was released on 2009-04-21 with total page 275 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a complete overview of the field of carbon nanotube electronics. It covers materials and physical properties, synthesis and fabrication processes, devices and circuits, modeling, and finally novel applications of nanotube-based electronics. The book introduces fundamental device physics and circuit concepts of 1-D electronics. At the same time it provides specific examples of the state-of-the-art nanotube devices.

Book Glassy Materials Based Microdevices

Download or read book Glassy Materials Based Microdevices written by Giancarlo C. Righini and published by MDPI. This book was released on 2019-02-28 with total page 284 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microtechnology has changed our world since the last century, when silicon microelectronics revolutionized sensor, control and communication areas, with applications extending from domotics to automotive, and from security to biomedicine. The present century, however, is also seeing an accelerating pace of innovation in glassy materials; as an example, glass-ceramics, which successfully combine the properties of an amorphous matrix with those of micro- or nano-crystals, offer a very high flexibility of design to chemists, physicists and engineers, who can conceive and implement advanced microdevices. In a very similar way, the synthesis of glassy polymers in a very wide range of chemical structures offers unprecedented potential of applications. The contemporary availability of microfabrication technologies, such as direct laser writing or 3D printing, which add to the most common processes (deposition, lithography and etching), facilitates the development of novel or advanced microdevices based on glassy materials. Biochemical and biomedical sensors, especially with the lab-on-a-chip target, are one of the most evident proofs of the success of this material platform. Other applications have also emerged in environment, food, and chemical industries. The present Special Issue of Micromachines aims at reviewing the current state-of-the-art and presenting perspectives of further development. Contributions related to the technologies, glassy materials, design and fabrication processes, characterization, and, eventually, applications are welcome.

Book Cellular Solids

    Book Details:
  • Author : Lorna J. Gibson
  • Publisher : Cambridge University Press
  • Release : 1997
  • ISBN : 9780521499118
  • Pages : 536 pages

Download or read book Cellular Solids written by Lorna J. Gibson and published by Cambridge University Press. This book was released on 1997 with total page 536 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this new edition of their classic work on Cellular Solids, the authors have brought the book completely up to date, including new work on processing of metallic and ceramic foams and on the mechanical, electrical and acoustic properties of cellular solids. Data for commercially available foams are presented on material property charts; two new case studies show how the charts are used for selection of foams in engineering design. Over 150 references appearing in the literature since the publication of the first edition are cited. The text summarises current understanding of the structure and mechanical behaviour of cellular materials, and the ways in which they can be exploited in engineering design. Cellular solids include engineering honeycombs and foams (which can now be made from polymers, metals, ceramics and composites) as well as natural materials, such as wood, cork and cancellous bone.

Book Micro and Nanomanufacturing Volume II

Download or read book Micro and Nanomanufacturing Volume II written by Mark J. Jackson and published by Springer. This book was released on 2017-10-28 with total page 566 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a comprehensive treatment of micro and nanofabrication techniques, and applies established and research laboratory manufacturing techniques to a wide variety of materials. It is a companion volume to “Micro and Nanomanufacturing” (2007) and covers new topics such as aligned nanowire growth, molecular dynamics simulation of nanomaterials, atomic force microscopy for microbial cell surfaces, 3D printing of pharmaceuticals, microvascular coaptation methods, and more. The chapters also cover a wide variety of applications in areas such as surgery, auto components, living cell detection, dentistry, nanoparticles in medicine, and aerospace components. This is an ideal text for professionals working in the field, and for graduate students in micro and nanomanufacturing courses.

Book Implantable Bioelectronics

Download or read book Implantable Bioelectronics written by Evgeny Katz and published by John Wiley & Sons. This book was released on 2014-02-27 with total page 566 pages. Available in PDF, EPUB and Kindle. Book excerpt: Here the renowned editor Evgeny Katz has chosen contributions that cover a wide range of examples and issues in implantable bioelectronics, resulting in an excellent overview of the topic. The various implants covered include biosensoric and prosthetic devices, as well as neural and brain implants, while ethical issues, suitable materials, biocompatibility, and energy-harvesting devices are also discussed. A must-have for both newcomers and established researchers in this interdisciplinary field that connects scientists from chemistry, material science, biology, medicine, and electrical engineering.

Book Liquid Crystals and Display Technology

Download or read book Liquid Crystals and Display Technology written by Morteza Sasani Ghamsari and published by BoD – Books on Demand. This book was released on 2020-10-07 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: Liquid crystals have attracted scientific attention for potential applications in advanced devices. Display technology is continuously growing and expanding and, as such, this book provides an overview of the most recent advances in liquid crystals and displays. Chapters cover such topics as nematic liquid crystals, active matrix organic light-emitting diodes, and tetradentate platinum(II) emitters, among others.