Download or read book Pulsed Excimer Laser Deposition of Ferroelectric Thin Films written by S. B. Krupanidhi and published by . This book was released on 1991 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pulsed UV excimer laser ablation was employed to deposit multi-axial, bi-axial and uni-axial ferroelectric compositions of PZT, bismuth titanate and lead germanate respectively. In general, a fluence lower than 2 J/cm2 caused a preferential evaporation of volatile components, resulting in stoichiometric imbalance. However, the fluences beyond 2 J/cm2 enabled the deposition of stoichiometric thin films of multi-component oxide systems. The intrinsic bombardment due to the energetic ablated species during the thin film deposition seemed to influence the composition, structure, orientation and the electrical properties. The electrical characterization of ferroelectric films indicated a dielectric constant of 800-1000, a P, of 32 micron C/cm2 and E sub c of 130KV/cm for polycrystalline PZT films and the corresponding quantities were measured to be 150, 7 micron C/cm2 and 20 KV/cm for in-situ crystallized c-axis preferred oriented bismuth titanate films. Lead germanate thin films oriented along c-axis (OO3) showed a dielectric constant of 30, a P sub r of 2.5 micron C/cm2 and E sub c of 55 KV/cm.

Download or read book Pulsed Laser Deposition of Thin Films written by Robert Eason and published by John Wiley & Sons. This book was released on 2007-12-14 with total page 754 pages. Available in PDF, EPUB and Kindle. Book excerpt: Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Download or read book Recent Advances in the Deposition of Ferroelectric Thin Films written by S. B. Krupanidhi and published by . This book was released on 1991 with total page 20 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent developments in ferroelectric thin film deposition involving plasma based approaches, are described, which include (a) multi-magnetron. sputter deposition, (b) Multi-ion-beam reactive sputter (MIBERS) deposition, (c) Pulsed excimer laser ablation and (d) ECR (Electron cyclotron resonance) plasma assisted deposition. These methods commonly prevailed intrinsic low energy ion bombardment during the growth process, which may be used for the control over composition, crystallization temperature and microstructure. A low energy (60 - 75 eV) ion bombardment of the ferroelectric Pb(Zr, Ti)03 thin films indicated a reduction in the phase formation/crystallization temperature, improved the electrical properties, microstructure and the surface smoothness. Discussion is presented emphasizing the effects of low energy bombardment in different deposition processes. Recent findings using rapid thermal annealing process are also described.

Download or read book Laser induced Thin Film Processing written by J. J. Dubowski and published by . This book was released on 1995 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Handbook of Laser Micro and Nano Engineering written by KOJI SUGIOKA. and published by . This book was released on 2019 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.

Download or read book Growth of Semiconductor Thin Films by Pulsed Laser Deposition written by Yilu Li and published by . This book was released on 2016 with total page 97 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pulsed ultraviolet light from a XeF excimer laser was used to grow thin films of zinc oxide and tin dioxide on (111) p-type silicon wafers within a versatile high vacuum laser deposition system. This pulsed laser deposition system was self-designed and self-built. Parameters such as pressure, target temperature, and distance from the target to the substrate can be adjusted in the system. Scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction spectroscopy, Raman spectroscopy and ellipsometry were used to analyze the structures and properties of ZnO and SnO2 thin films. The critical temperature required to fabricate a crystalline ZnO thin film by pulsed laser deposition was found and has been confirmed. For the SnO2 thin film, the critical temperature required to generate a crystalline structure could not be found because of the temperature limit of the substrate heater used in the experiment. In SnO2 thin films, thermal annealing has been used to convert into crystalline structure with (110), (101) and (211) orientations. After fabricating the amorphous SnO2 thin films, they were put into an oven with specific temperatures to anneal them. The minimum annealing temperature range was found for converting the amorphous SnO2 thin films into SnO2 thin films with a crystalline structure. Thermal annealing has also been applied to some amorphous ZnO thin films which were fabricated under the critical temperature required to produce crystalline ZnO thin films. The minimum annealing temperature range for amorphous ZnO thin films was found and only one orientation (002) shown after annealing. Laser annealing technology has also been applied for converting both amorphous ZnO and SnO2 thin films, and results show that this method was not well suited for this attempt. ZnO thin films and SnO2 thin films with a crystalline structure have inportant widely used in industry, for example, application in devices such as solar cells and UV or blue-light-emitting devices. The aim of this research is to help improving the manufacturing process of ZnO and SnO2 thin films.

Download or read book Femtosecond Pulsed Laser Deposition and Patterning of Thin Films for MEMS written by Michael Joseph Stock and published by . This book was released on 2003 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt: Procedural variables such as fluence, polarization, pulse width, machining speed, and material properties are investigated to determine their effects on the PLD and laser micromachining of aluminum magnesium boride. In this work, a 120-fs pulsed, 800-nm wavelength Ti: Sapphire laser was used for micromachining thin films of ultra-hard AlMgB14 and polysilicon thin films on silicon substrate. Polysilicon was first deposited by low-pressure chemical vapor deposition followed by boride using femtosecond pulsed laser deposition. Channels were then machined in thin films to pattern a device that would produce a linear resistance/deflection curve. Results show that the ultrafast laser has precisely ablated the thin films. However, the high-energy fluence used in single-pass surface micromachining enabled the formation of recast layer of molten silicon substrate ejected by vapor pressure, and conglomerates of re-condensed material at a distance from the feature. Multi-pass surface micromachining at low energy fluences eliminated the recast layers and produced clean features. Ultrafast laser micromachining is certainly beneficial over wet and dry etching in reproducibility, material choice, and minimal number of processing steps. Thin films of ultra-hard AlMgB14 were grown on Si (100) substrates at 300 K using femtosecond pulsed Ti:sapphire laser and subsequently annealed in argon gas up to 1373 K for two hours. X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscope, and nanoindentation were employed to study the composition, microstructure and hardness of thin films. Results were compared with nanosecond pulsed KrF excimer laser-deposited films. The as-deposited and post-annealed films (up to 1173 K), independent of the pulse width, exhibited amorphous structures with a hardness of 40 GPa. However, post-annealing at higher temperatures has varied effects on crystallization depending on the pulse width. The effect of pulse width on the microstructure and quality of thin films is discussed.

Download or read book Formation and Characterization of Ferroelectric Thin films Deposited by Pulsed laser Ablation written by Christopher Scarfone and published by . This book was released on 1991 with total page 208 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Pulsed Laser Crystallization of Ferroelectric Piezoelectric Oxide Thin Films written by Adarsh Rajashekhar and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Integration of ferroelectric/piezoelectric thin films, such as those of lead zirconate titanate (PZT), with temperature sensitive substrates (complementary metal oxide semiconductors (CMOS), or polymers) would benefit from growth at substrate temperatures below 400C. However, high temperatures are usually required for obtaining good quality PZT films via conventional routes like rapid thermal processing (>550C). Those conditions are not compatible either with polymer substrates or completed CMOS circuits and dictate exploration of alternative methods to realize integration with such substrates.In part of this work, factors influencing KrF excimer laser induced crystallization of amorphous sputtered Pb(Zr0.30Ti0.70)O3 thin films at substrate temperatures

Download or read book Ferroelectric Thin film Multilayers by Pulsed Laser Deposition written by Sang-Mo Koo and published by . This book was released on 1999 with total page 62 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Ferroelectric Thin Films Prepared by Pulsed Laser Deposition Processing and Characterization written by L. P. Cook and published by . This book was released on 1992 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Laser Applications in Microelectronic and Optoelectronic Manufacturing written by and published by . This book was released on 1997 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Laser Liftoff of Epitaxial Oxide Films written by Loucas Tsakalakos and published by . This book was released on 2000 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Laser Surface Interactions for New Materials Production written by Antonio Miotello and published by Springer Science & Business Media. This book was released on 2009-12-05 with total page 367 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an overview on nanosecond and ultra-short laser-induced phenomena and the related diagnostics. It grew from the lectures of the International School "Laser-surface interactions for new materials production" held in July 2008.

Download or read book Pulsed Laser Deposition of Tungsten Thin Films written by Wassim Mohammad Fa'ez Kassem and published by . This book was released on 2011 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt: We have developed a finite-volume MUSCL MATLAB code for the solution of 1D Euler fluid equations, and correspondingly the 1D two-fluid plasma equations with the intention of applying them to the expansion of laser induced plasmas. Numerical checks indicate that the code is valid and shows promise. However, no results on the intended application of the model are presented. Experimentally, thin coatings of Tungsten were deposited on substrates fabricated by pre-depositing graphite thin layers on Si(100) wafers. We ablate pure W target using a 20 ns KrF excimer laser (248 nm) in an Ar ambient. The effect of background gas pressure, substrate temperature, and laser energy, on the properties of the deposited W layers is studied using several techniques including X-Ray Diffraction, Atomic Force Microscopy, and Rutherford Back-Scattering spectroscopy. Our results indicate that the deposited layers consist of the well-crystallized body-centered-cubic alpha-W phase with bulk-like properties, particularly for films deposited at a substrate temperature of 450 C, laser energy greater than 400 mJ, and pressure of about 10mTorr. XRD and RBS measurements indicate the presence of carbide layers near the interface with prominent mixing between the Tungsten and Carbon indicating strong implantation and diffusion of the plume species. In addition, we were able to deposit Tungsten on fusion relevant Graphite pucks. Early results showed good crystalline compatibility to those deposited on Si substrates. Results also showed the Tungsten is diffusing well into the Graphite, and this will hopefully provide better adherence and thermal conductivity, though this was not proven or tested for.

Download or read book Advanced Nano Deposition Methods written by Yuan Lin and published by John Wiley & Sons. This book was released on 2016-08-29 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.

Download or read book Pulsed Laser Deposition of Ferroelectric Thin Films in Conjunction with Superconducting Oxides written by and published by . This book was released on 1994 with total page 18 pages. Available in PDF, EPUB and Kindle. Book excerpt: The possibility of combining ferroelectrics and superconductors has been of interest for use in memory storage devices. Additionally, superconductors offer crystal structures compatible to the epitaxial growth of the ferroelectric, Ba(0.6)Sr(0.4)TiO3 (BSTO), which is cubic at this stoichiometry. BSTO has a lattice constant of 3.94 A as compared to the superconducting Pr(2-x)Ce(x)CuO4 tetragonal single crystal which also has a lattice constant of a=3.94 A. (minor variations with Cerium content). In this study, ferroelectric thin films of BSTO were deposited on single crystals of Pr2CuO4 and Pr(2-x)Ce(x)CuO4. The optical constants of the substrates, single crystals of Pr2CuO4 and Pr(2-x)Ce(x)CuO4, were determined using Variable Angle Spectroscopic Ellipsometry (VASE) and the composition and crystal structure were examined using Rutherford Backscattering Spectrometry (RBS) with ion beam channeling. The substrate/film interfaces and the compositional variation in the films were also studied with RBS and with SEM/EDS. Glancing angle x-ray diffraction was used to verify the epitaxial nature of the films. The effect of the deposition parameters (laser repetition rate, oxygen backfill pressure, and deposition geometry) on the quality of the films was experimented with previously and only the optimized parameters were used. (jg).